SCHEMBL7175114

SCHEMBL7175114

CC(C)(C)CCCCC(C(=O)OO)C(C)(C)C.CCCCC(CC)C(=O)OOC(C)(C)CCC(C)(C)OOC(=O)C(CC)CCCC

nearest known ligand 0.40

Predicted protein targets (top 8)

geneUniProtsupporting neighboursconfidence
CA2 P00918 6/20 0.40
CA1 P00915 4/20 0.40
MAPK1 P28482 1/20 0.34
GAA P10253 1/20 0.32
XBP1 P17861 1/20 0.32
ATM Q13315 1/20 0.32
NPSR1 Q6W5P4 1/20 0.32
L3MBTL1 Q9Y468 1/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL7209780 0.90 CA2 (0.44) CA2CA1MAPK1GAAXBP1
SCHEMBL57471 0.82 CA2 (0.58) CA2CA1MAPK1GAAXBP1
SCHEMBL10714547 0.81 CA2 (0.56) CA2CA1MAPK1GAAXBP1
Hydrogen Peroxide SCHEMBL15855960 0.81 CA2 (0.56) CA2CA1MAPK1GAAXBP1
SCHEMBL21081722 0.79 CA2 (0.50) CA2CA1MAPK1GAAXBP1
SCHEMBL168362 0.79 ACACB (0.34)
SCHEMBL12140593 0.78 CA2 (0.56) CA2CA1MAPK1GAAXBP1
SCHEMBL17923094 0.78 ACACB (0.37)
SCHEMBL31511951 0.77 CA2 (0.43) CA2CA1MAPK1GAAXBP1
SCHEMBL32681423 0.77 CA2 (0.40) CA2CA1MAPK1GAAXBP1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-0466359-B2 Process for making low optical density polymers and copolymers for photoresists and optical applications TRIQUEST L P (US) 2003-07-23 EP claimed
EP-0466359-B1 Process for making low optical density polymers and copolymers for photoresists and optical applications HOECHST CELANESE CORP (US) 2000-05-10 EP claimed
US-5239015-A Polymerization of 4-acetoxystyrene in presence of alcohol; transesterification HOECHST CELANESE CORPORATION (US) 1993-08-24 US claimed
EP-0466359-A2 Process for making low optical density polymers and copolymers for photoresists and optical applications HOECHST CELANESE CORPORATION (US) 1992-01-15 EP claimed