Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ALDH1A1 | P00352 | 3/20 | 0.42 |
| ▸ | CYP3A4 | P08684 | 2/20 | 0.40 |
| ▸ | MAPT | P10636 | 2/20 | 0.40 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.40 |
| ▸ | MEN1 | O00255 | 1/20 | 0.40 |
| ▸ | LMNA | P02545 | 1/20 | 0.40 |
| ▸ | TTR | P02766 | 1/20 | 0.40 |
| ▸ | TP53 | P04637 | 1/20 | 0.40 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.40 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.40 |
| ▸ | TDP1 | Q9NUW8 | 2/20 | 0.38 |
| ▸ | CYP19A1 | P11511 | 1/20 | 0.37 |
| ▸ | F3 | P13726 | 1/20 | 0.35 |
| ▸ | TAS1R3 | Q7RTX0 | 2/20 | 0.35 |
| ▸ | TAS1R1 | Q7RTX1 | 2/20 | 0.35 |
| ▸ | HIF1A | Q16665 | 1/20 | 0.35 |
| ▸ | EPAS1 | Q99814 | 1/20 | 0.35 |
| ▸ | GLA | P06280 | 1/20 | 0.34 |
| ▸ | TRPA1 | O75762 | 1/20 | 0.34 |
| ▸ | CA12 | O43570 | 1/20 | 0.34 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Styrene SCHEMBL9350030 | 0.91 | ALDH1A1 (0.48) | ALDH1A1CYP3A4MAPTKDM4EMEN1 | |
| SCHEMBL434268 | 0.82 | CA12 (0.52) | ALDH1A1CYP3A4MAPTKDM4EMEN1 | |
| SCHEMBL28124453 | 0.82 | ALDH1A1 (0.48) | ALDH1A1CYP3A4MAPTKDM4EMEN1 | |
| Propene SCHEMBL27727109 | 0.81 | GLA (0.48) | ALDH1A1MAPTMEN1LMNAKMT2A | |
| SCHEMBL8767176 | 0.81 | ALDH1A1 (0.42) | ALDH1A1CYP3A4MAPTKDM4EMEN1 | |
| SCHEMBL10416320 | 0.81 | KDM4E (0.40) | CYP3A4MAPTKDM4EMEN1LMNA | |
| Styrene SCHEMBL27739898 | 0.81 | GLA (0.38) | ALDH1A1CYP3A4MAPTKDM4EMEN1 | |
| SCHEMBL19923136 | 0.80 | GLA (0.55) | ALDH1A1MAPTMEN1LMNAKMT2A | |
| SCHEMBL58005 | 0.80 | GLA (0.55) | ALDH1A1MAPTMEN1LMNAKMT2A | |
| SCHEMBL2985370 | 0.80 | GLA (0.55) | ALDH1A1MAPTMEN1LMNAKMT2A |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 101 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-121586750-A | Composition for forming silicon-containing underlayer film for directional self-assembly | 日产化学株式会社 | 2026-02-27 | — | — | CN | disclosed |
| US-20250206901-A1 | BRUSH MATERIAL FOR SELF-ASSEMBLED FILM | NISSAN CHEMICAL CORPORATION (JP) | 2025-06-26 | — | — | US | disclosed |
| CN-120019330-A | Underlying film material for self-assembled materials | 日产化学株式会社 | 2025-05-16 | — | — | CN | disclosed |
| US-20250147413-A1 | METHOD FOR PRODUCING STRUCTURE HAVING PHASE-SEPARATED STRUCTURE | TOKYO OHKA KOGYO CO., LTD. (JP) | 2025-05-08 | — | — | US | disclosed |
| US-20250101145-A1 | BLOCK COPOLYMERS AND METHODS OF MANUFACTURING INTEGRATED CIRCUIT DEVICES USING THE SAME | KOREA ADVANCED INSTITUTE OF SCIENCE AND TECHNOLOGY (KR) | 2025-03-27 | — | — | US | disclosed |
| WO-2025047871-A1 | UNDERLAYER FILM MATERIAL FOR SELF-ASSEMBLED MATERIALS | 日産化学株式会社 | 2025-03-06 | — | — | WO | disclosed |
| WO-2025041813-A1 | COMPOSITION FOR FORMING SILICON-CONTAINING UNDERLAYER FILM FOR INDUCED SELF-ASSEMBLY | 日産化学株式会社 | 2025-02-27 | — | — | WO | disclosed |
| US-20250011622-A1 | BLOCK COPOLYMER, UNDERCOAT AGENT, RESIN COMPOSITION FOR FORMING PHASE-SEPARATED STRUCTURE, AND METHOD FOR PRODUCING STRUCTURE BODY INCLUDING PHASE-SEPARATED STRUCTURE | TOKYO OHKA KOGYO CO LTD (JP) | 2025-01-09 | — | — | US | disclosed |
| US-20250011616-A1 | METHOD FOR PRODUCING STRUCTURE BODY INCLUDING PHASE-SEPARATED STRUCTURE, AND COMPOSITION | TOKYO OHKA KOGYO CO LTD (JP) | 2025-01-09 | — | — | US | disclosed |
| US-20240425694-A1 | RESIN COMPOSITION FOR FORMING PHASE-SEPARATED STRUCTURE, AND METHOD FOR PRODUCING STRUCTURE BODY INCLUDING PHASE-SEPARATED STRUCTURE | TOKYO OHKA KOGYO CO., LTD. (JP) | 2024-12-26 | — | — | US | disclosed |
| US-20140234589-A1 | METHODS OF PATTERNING BLOCK COPOLYMER LAYERS AND PATTERNED STRUCTURES | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2014-08-21 | — | — | US | disclosed |
| US-20140193614-A1 | METHOD OF PATTERNING BLOCK COPOLYMER LAYER AND PATTERNED STRUCTURE | Yonsei University, University - Industry Foundation(UIF) (KR) | 2014-07-10 | — | — | US | disclosed |
| US-20140187054-A1 | METHODS OF PATTERNING BLOCK COPOLYMER LAYERS | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2014-07-03 | — | — | US | disclosed |
| US-20140127626-A1 | RESIST COMPOSITION FOR NEGATIVE DEVELOPMENT WHICH IS USED FOR FORMATION OF GUIDE PATTERN, GUIDE PATTERN FORMATION METHOD, AND METHOD FOR FORMING PATTERN ON LAYER CONTAINING BLOCK COPOLYMER | RIKEN (JP) | 2014-05-08 | — | — | US | disclosed |
| US-20140113236-A1 | SOLVENT DEVELOPABLE NEGATIVE RESIST COMPOSITION, RESIST PATTERN FORMATION METHOD, AND METHOD FOR FORMING PATTERN OF LAYER INCLUDING BLOCK COPOLYMER | RIKEN (JP) | 2014-04-24 | — | — | US | disclosed |
| US-20140030652-A1 | PRIMER AND PATTERN FORMING METHOD FOR LAYER INCLUDING BLOCK COPOLYMER | RIKEN (JP) | 2014-01-30 | — | — | US | disclosed |
| US-20130313223-A1 | METHOD FOR PRODUCING SUBSTRATE HAVING SURFACE NANOSTRUCTURE | TOKYO OHKA KOGYO CO., LTD. (JP) | 2013-11-28 | — | — | US | disclosed |
| US-20130240481-A1 | BLOCK COPOLYMER-CONTAINING COMPOSITION AND METHOD OF REDUCING PATTERN | TOKYO OHKA KOGYO CO., LTD. (JP) | 2013-09-19 | — | — | US | disclosed |
| US-20130210231-A1 | METHOD OF FORMING CONTACT HOLE PATTERN | RIKEN (JP) | 2013-08-15 | — | — | US | disclosed |
| US-20120048738-A1 | SUBSTRATE PROVIDED WITH METAL NANOSTRUCTURE ON SURFACE THEREOF AND METHOD OF PRODUCING THE SAME | TOKYO OHKA KOGYO CO., LTD. (JP) | 2012-03-01 | — | — | US | disclosed |