SCHEMBL7180910

SCHEMBL7180910

C=C(C)C(=O)OC.C=C(C)C(=O)OC1CCCCO1

nearest known ligand 0.47

Predicted protein targets (top 4)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 3/20 0.47
SLC6A3 Q01959 6/20 0.33
MEN1 O00255 1/20 0.32
KMT2A Q03164 1/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL219412 0.94 ALDH1A1 (0.40) ALDH1A1SLC6A3MEN1KMT2A
SCHEMBL76505 0.89 ALDH1A1 (0.41) ALDH1A1KMT2A
Acrylic Acid SCHEMBL9715438 0.85 ALDH1A1 (0.34) ALDH1A1MEN1KMT2A
SCHEMBL9461096 0.84 ALDH1A1 (0.33) ALDH1A1
SCHEMBL685088 0.83 ALDH1A1 (0.44) ALDH1A1
Acrylonitrile SCHEMBL7041528 0.82 ALDH1A1 (0.33) ALDH1A1
SCHEMBL7028621 0.79 ALDH1A1 (0.39) ALDH1A1SLC6A3MEN1KMT2A
SCHEMBL8395626 0.78 MEN1 (0.38) SLC6A3MEN1KMT2A
SCHEMBL1225091 0.78 MEN1 (0.35) MEN1KMT2A
SCHEMBL7173632 0.78 MEN1 (0.35) MEN1KMT2A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-1004936-B1 RESIST RESIN, RESIST RESIN COMPOSITION, AND PROCESS FOR PATTERNING THEREWITH SHOWA DENKO KK (JP) 2003-10-08 EP disclosed
US-6303268-B1 SENSITIVITY TO RADIATION SHOWA DENKO K.K. (JP) 2001-10-16 US disclosed
EP-1004936-A1 RESIST RESIN, RESIST RESIN COMPOSITION, AND PROCESS FOR PATTERNING THEREWITH Showa Denko K K (JP) 2000-05-31 EP disclosed