SCHEMBL7181835

SCHEMBL7181835

O=C(O)OC1CCCC2CCCCC21

nearest known ligand 0.37

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
NPC1 O15118 1/20 0.33
RAB9A P51151 1/20 0.33
NPSR1 Q6W5P4 1/20 0.33
L3MBTL1 Q9Y468 1/20 0.33
ALDH1A1 P00352 3/20 0.32
MEN1 O00255 2/20 0.32
KMT2A Q03164 2/20 0.32
CYP2D6 P10635 1/20 0.32
MAPT P10636 3/20 0.31
SERPINE1 P05121 2/20 0.31
CA12 O43570 2/20 0.31
GMNN O75496 2/20 0.31
CA1 P00915 2/20 0.31
CA2 P00918 2/20 0.31
LMNA P02545 2/20 0.31
BLM P54132 2/20 0.31
CA9 Q16790 2/20 0.31
TDP1 Q9NUW8 2/20 0.31
SGMS1 Q86VZ5 1/20 0.31
SGMS2 Q8NHU3 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL6021828 0.92 ALDH1A1 (0.35) NPC1RAB9ANPSR1L3MBTL1ALDH1A1
SCHEMBL8043444 0.92 ALDH1A1 (0.35) NPC1RAB9ANPSR1L3MBTL1ALDH1A1
SCHEMBL5932631 0.86 MAPT (0.33) ALDH1A1MEN1KMT2ACYP2D6MAPT
SCHEMBL11072360 0.85 SGMS1 (0.35) NPC1RAB9ANPSR1L3MBTL1ALDH1A1
SCHEMBL5933295 0.83 ALDH1A1 (0.32) ALDH1A1MEN1KMT2ACYP2D6MAPT
SCHEMBL10960388 0.82 ALDH1A1 (0.31) ALDH1A1MEN1KMT2ACYP2D6MAPT
SCHEMBL873495 0.82 MEN1 (0.44) ALDH1A1MEN1KMT2ACYP2D6
SCHEMBL7735027 0.82 MEN1 (0.44) ALDH1A1MEN1KMT2ACYP2D6
SCHEMBL873494 0.82 MEN1 (0.44) ALDH1A1MEN1KMT2ACYP2D6
SCHEMBL28527755 0.80 SLC18A3 (0.36) ALDH1A1MEN1KMT2ACYP2D6LMNA

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-105829375-B Allophanate-isocyanurateing catalyst, polyisocyanate composition, method for producing the composition, and two-component coating composition 东曹株式会社 2019-09-20 CN disclosed
CN-106488938-B UV resistant absorbent polyurethane urea resin composition, the formed body and coating material for having used the composition 东曹株式会社 2019-05-10 CN disclosed
CN-107207901-A Coating urethane resin compositions and the feel coating using said composition 东曹株式会社 2017-09-26 CN disclosed
CN-106488938-A UV resistant absorbent polyurethane urea resin compositionss, the formed body employing said composition and coating material 东曹株式会社 2017-03-08 CN disclosed
CN-105829375-A Allophanate-isocyanurateing catalyst, polyisocyanate composition, method for producing the composition, and two-component coating composition 东曹株式会社 2016-08-03 CN disclosed
US-6586154-B1 Photoresist polymer of following formula 1, and a photoresist composition comprising photoresist composition has excellent transparency in deep ultraviolet region, etching resistance and heat resistance, and can form a good pattern without HYUNDAI ELECTRONICS INDUSTRIES CO., LTD. (KR) 2003-07-01 US disclosed