SCHEMBL718188

SCHEMBL718188

CC(CN(CC(=O)[O-])CC(=O)[O-])N(CC(=O)[O-])CC(=O)[O-].CC(CN(CC(=O)[O-])CC(=O)[O-])N(CC(=O)[O-])CC(=O)[O-].CC(CN(CC(=O)[O-])CC(=O)[O-])N(CC(=O)[O-])CC(=O)[O-].[Fe+3].[Fe+3].[Fe+3].[Fe+3]

nearest known ligand 0.37

Predicted protein targets (top 8)

geneUniProtsupporting neighboursconfidence
CA1 P00915 3/20 0.37
KDM4E B2RXH2 1/20 0.36
MAPT P10636 1/20 0.36
ALOX15 P16050 1/20 0.36
SMN1; SMN2 Q16637 1/20 0.36
CA2 P00918 2/20 0.33
CA12 O43570 1/20 0.30
CA9 Q16790 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Ammonia Solution, Strong SCHEMBL6800515 0.98 CA1 (0.35) CA1KDM4EMAPTALOX15SMN1; SMN2
SCHEMBL5150621 0.96 KDM4E (0.41) CA1KDM4EMAPTALOX15SMN1; SMN2
Potassium Ion SCHEMBL9421284 0.96 CA1 (0.37) CA1KDM4EMAPTALOX15SMN1; SMN2
SCHEMBL29393019 0.94 KDM4E (0.39) CA1KDM4EMAPTALOX15SMN1; SMN2
SCHEMBL7763056 0.86 KDM4E (0.37) CA1KDM4EMAPTALOX15SMN1; SMN2
SCHEMBL7520101 0.86 TDP1 (0.37) CA1KDM4EMAPTALOX15SMN1; SMN2
Potassium Ion SCHEMBL28574859 0.85 TDP1 (0.35) CA1KDM4EALOX15
Tetraphenylphosphonium SCHEMBL11315425 0.83 SLC6A9 (0.34) MAPT
SCHEMBL18980830 0.81 KDM4E (0.38) KDM4EMAPTALOX15SMN1; SMN2
SCHEMBL18983977 0.77 KDM4E (0.38) KDM4EMAPTALOX15SMN1; SMN2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 13 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20120052682-A1 POLISHING SLURRY AND METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE USING THE SAME SAMSUNG ELECTRONICS CO., LTD. (KR) 2012-03-01 US claimed
US-5356932-A Methods and compositions for controlling intraocular pressure with transition metal complexes ALCON LABORATORIES, INC. (US) 1994-10-18 US claimed
US-5177105-A Methods for controlling intraocular pressure with transition metal complexes ALCON LABORATORIES, INC. (US) 1993-01-05 US claimed
US-20120052682-A1 POLISHING SLURRY AND METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE USING THE SAME SAMSUNG ELECTRONICS CO., LTD. (KR) 2012-03-01 US disclosed
US-5776665-A BLEACH PROMOTERS FOR PHOTOGRAPHIC FILMS EASTMAN KODAK COMPANY (US) 1998-07-07 US disclosed
US-5691122-A REDOX SYSTEMS, COCATALYSTS, REHALOGENATION EASTMAN KODAK COMPANY (US) 1997-11-25 US disclosed
US-5656416-A REVERSE REDOX COUPLE; SYNERGISTIC BLEACHING EASTMAN KODAK COMPANY (US) 1997-08-12 US disclosed
US-5510232-A PRETREATING EXPOSED AND DEVELOPED FILM WITH CATIONIC HYDROQUINONE SOLUTION BEFORE BLEACHING EASTMAN KODAK COMPANY (US) 1996-04-23 US disclosed
EP-0329086-B1 Image forming method for silver halide light-sensitive materials KONISHIROKU PHOTO IND (JP) 1996-01-24 EP disclosed
US-5453348-A Silver halide color photographic light-sensitive material KONICA CORPORATION (JP) 1995-09-26 US disclosed
EP-0559276-A1 Processing photographic colour negative films KODAK LIMITED (GB) 1993-09-08 EP disclosed
US-4933266-A FERRIC COMPLEX OF PROPYLENEDIAMINETETRAACETIC ACID, HYDROXY-SUBSTITUTED CHELATING AGENT TO REDUCE FORMATION OF PRECIPITATES WITH PHOSPHATES AND ARSENATES EASTMAN KODAK COMPANY (US) 1990-06-12 US disclosed
EP-0329086-A2 Image forming method for silver halide light-sensitive materials KONICA CORPORATION (JP) 1989-08-23 EP disclosed