SCHEMBL718393

SCHEMBL718393

CCCc1nccn1C(C)C#N

nearest known ligand 0.37

Predicted protein targets (top 2)

geneUniProtsupporting neighboursconfidence
KCNH2 Q12809 2/20 0.32
SMN1; SMN2 Q16637 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL10824696 0.89 TLR7 (0.35) KCNH2
SCHEMBL27497320 0.88 TLR7 (0.36) KCNH2
SCHEMBL9231228 0.88 TLR7 (0.36) KCNH2
SCHEMBL83433 0.88 TLR7 (0.36) KCNH2
Hydrochloric Acid SCHEMBL28733891 0.86 TLR7 (0.35) KCNH2
SCHEMBL3420913 0.86 MAPT (0.32)
SCHEMBL28241666 0.86 MAPT (0.32)
SCHEMBL7165333 0.82 ALDH1A1 (0.40)
SCHEMBL16412168 0.81 TLR7 (0.32)
SCHEMBL14254645 0.80 KCNH2 (0.35) KCNH2SMN1; SMN2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 95 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
WO-2003051955-A1 EPOXIDIZED ACETALS AND THIOACETALS, EPISULFIDIZED ACETALS AND THIOACETALS, AND REWORKABLE THERMOSETTING RESIN COMPOSITIONS FORMULATED THEREFROM HENKEL CORPORATION (US) 2003-06-26 WO claimed
JP-56163119-A None JP disclosed
WO-2025046304-A1 METHODS OF PRODUCING COATED OPTICAL SUBSTRATES FLO OPTICS LTD. (IL) 2025-03-06 WO disclosed
EP-3526306-B1 PHOTOCHROMIC ARTICLE SDC TECH INC (US) 2025-02-26 EP disclosed
CN-114040950-B Composition for forming hard coating layer of resin base material and laminate using same 日本精化株式会社 2023-06-02 CN disclosed
CN-110431213-B Photochromic articles SDC 科技有限公司 2023-05-09 CN disclosed
US-20220380562-A1 COMPOSITION FOR FORMING HARD COAT OF RESIN SUBSTRATE AND LAMINATE USING THE SAME NIPPON FINE CHEMICAL CO., LTD. (JP) 2022-12-01 US disclosed
CN-114040950-A Composition for forming hard coat layer on resin substrate and laminate using same 日本精化株式会社 2022-02-11 CN disclosed
US-11168223-B2 Photochromic article SDC TECHNOLOGIES, INC. (US) 2021-11-09 US disclosed
WO-2020255958-A1 COMPOSITION FOR FORMING HARD COAT FOR RESIN BASE MATERIAL, AND MULTILAYER BODY USING SAME 日本精化株式会社 2020-12-24 WO disclosed
EP-0407174-B1 Highly tintable abrasion resistant coatings PILKINGTON AEROSPACE INC (US) 1994-10-12 EP disclosed
US-5322888-A Curable mixture of hydrolyzable silicate, epoxy-containing silane, dicarboxylic acid or anhydride, and imidazole catalyst; protective coating for optical substrate having a high refractive index; radiation resistance ITOH OPTICAL INDUSTRIAL CO., LTD. (JP) 1994-06-21 US disclosed
EP-0526975-A2 Coating composition for optical plastic moldings ITOH OPTICAL INDUSTRIAL CO., LTD. (JP) 1993-02-10 EP disclosed
EP-0486196-A2 Highly tintable abrasion resistant coatings SWEDLOW, INC. (US) 1992-05-20 EP disclosed
US-5102695-A Blend of colloidal silica, polysiloxane and alkylated amine formaldehyde compound SWEDLOW, INC. (US) 1992-04-07 US disclosed
US-5013608-A Polysilsesquioxanes, coatings for eyeglasses, windows, ultraviolet radiation protection SWEDLOW, INC. (US) 1991-05-07 US disclosed
EP-0407174-A2 Highly tintable abrasion resistant coatings Pilkington Aerospace Inc. (US) 1991-01-09 EP disclosed
US-4355135-A SILOXANE, SILICA COATING RESINS DOW CORNING CORPORATION (US) 1982-10-19 US disclosed
JP-S56163119-A POWDERY EPOXY RESIN COMPOSITION HITACHI CHEM CO LTD 1981-12-15 JP disclosed
US-4294950-A POLYVALENT CARBOXYLIC ACID BONDED THERETO ITO OPTICAL INDUSTRIAL CO., LTD. (JP) 1981-10-13 US disclosed