SCHEMBL7188065

SCHEMBL7188065

CC(N)C1CCCN1.CCO[SiH2]OCC

nearest known ligand 0.33

Predicted protein targets (top 3)

geneUniProtsupporting neighboursconfidence
SLC6A2 P23975 10/20 0.33
SLC6A3 Q01959 10/20 0.33
SLC6A4 P31645 9/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL239625 0.82
SCHEMBL7185219 0.81 SLC6A3 (0.33) SLC6A2SLC6A3SLC6A4
Hydrochloric Acid SCHEMBL7021992 0.80 SLC6A2 (0.38) SLC6A2SLC6A3SLC6A4
SCHEMBL2456761 0.76
SCHEMBL4370072 0.74 SLC6A3 (0.44) SLC6A2SLC6A3SLC6A4
SCHEMBL28350197 0.70
SCHEMBL7620430 0.70
SCHEMBL551715 0.70 KCNH2 (0.31)
SCHEMBL28529030 0.69 SLC6A2 (0.37) SLC6A2SLC6A3SLC6A4
SCHEMBL4651632 0.69

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-6579936-B1 Dramatically improved adhesion strength, acrylic impact resistance-improving resin; polymer of 2-vinyloxazoline and styrene DAINIPPON INK AND CHEMICALS, INC. (JP) 2003-06-17 US disclosed
US-5300362-A Blend with conjugated diene-vinyl aromatic block polymer; improved elongation HOECHST CELANESE CORPORATION (US) 1994-04-05 US disclosed
EP-0487191-A2 Impact modified polyphenylene sulfide HOECHST CELANESE CORPORATION (US) 1992-05-27 EP disclosed
US-5070127-A ENGINEERING THERMOPLASTICS, BLENDS, BLOCK POLYMERS, GRAFT POLY MERS HOECHST CELANESE CORPORATION (US) 1991-12-03 US disclosed