Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | TDP1 | Q9NUW8 | 2/20 | 0.52 |
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.48 |
| ▸ | HPGD | P15428 | 1/20 | 0.48 |
| ▸ | ALOX15 | P16050 | 1/20 | 0.48 |
| ▸ | ALOX12 | P18054 | 1/20 | 0.48 |
| ▸ | CASP1 | P29466 | 1/20 | 0.48 |
| ▸ | HSD17B10 | Q99714 | 1/20 | 0.48 |
| ▸ | CA1 | P00915 | 1/20 | 0.46 |
| ▸ | CA2 | P00918 | 1/20 | 0.46 |
| ▸ | KEAP1 | Q14145 | 1/20 | 0.46 |
| ▸ | SMN1; SMN2 | Q16637 | 2/20 | 0.46 |
| ▸ | CYP2A6 | P11509 | 1/20 | 0.46 |
| ▸ | HTR2A | P28223 | 1/20 | 0.46 |
| ▸ | TAAR1 | Q96RJ0 | 1/20 | 0.46 |
| ▸ | LOXL2 | Q9Y4K0 | 1/20 | 0.46 |
| ▸ | CYP1A2 | P05177 | 1/20 | 0.44 |
| ▸ | CYP2C9 | P11712 | 1/20 | 0.44 |
| ▸ | CYP2C19 | P33261 | 1/20 | 0.44 |
| ▸ | CES1 | P23141 | 1/20 | 0.44 |
| ▸ | TSHR | P16473 | 1/20 | 0.43 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL29281939 | 0.85 | HDAC3 (0.50) | TDP1ALOX15SMN1; SMN2HTR2AHDAC3 | |
| SCHEMBL8935412 | 0.83 | MAOA (0.52) | TDP1ALOX15SMN1; SMN2CES1HDAC3 | |
| SCHEMBL272368 | 0.80 | TDP1 (0.48) | TDP1ALDH1A1HPGDALOX15ALOX12 | |
| SCHEMBL28112277 | 0.80 | TDP1 (0.48) | TDP1ALDH1A1HPGDALOX15ALOX12 | |
| SCHEMBL3146570 | 0.80 | TDP1 (0.48) | TDP1ALDH1A1HPGDALOX15ALOX12 | |
| SCHEMBL251220 | 0.80 | TDP1 (0.48) | TDP1ALDH1A1HPGDALOX15ALOX12 | |
| SCHEMBL28681602 | 0.80 | SMN1; SMN2 (0.48) | TDP1ALDH1A1HPGDALOX15ALOX12 | |
| Phenethylamine SCHEMBL7785159 | 0.80 | HTR2A (0.67) | TDP1ALDH1A1SMN1; SMN2CYP2A6HTR2A | |
| SCHEMBL7277595 | 0.78 | TDP1 (0.52) | TDP1ALDH1A1HPGDALOX15ALOX12 | |
| SCHEMBL8658859 | 0.78 | TDP1 (0.52) | TDP1ALDH1A1HPGDALOX15ALOX12 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 15 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-115141464-A | Resin composition for optical semiconductor sealing, resin molded article, optical semiconductor sealing material, and optical semiconductor device | 日东电工株式会社 | 2022-10-04 | — | — | CN | disclosed |
| CN-103597006-B | Photochromic polymer | ADVANCED POLYMERIK PTY LTD. (GB) | 2016-05-11 | — | — | CN | disclosed |
| CN-103597006-A | Photochromic polymers | ADVANCED POLYMERIK PTY LTD | 2014-02-19 | — | — | CN | disclosed |
| US-6512031-B1 | First curing agent for polymerizing the epoxy resin into a linear polymer, and a second curing agent for crosslinking the linear polymer into a three-dimensional polymer. The use of two curing agents corresponding to straight chain growth | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2003-01-28 | — | — | US | disclosed |
| US-6383659-B1 | AUTOPOLYMERIZABLE EPOXY RESIN OR CURABLE PHENOLIC RESIN; SEMICONDUCTOR PACKAGING; FILLER, CURING CATALYST, AND THERMOPLASTIC RESIN | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2002-05-07 | — | — | US | disclosed |
| US-6210811-B1 | IMPROVED HEAT RESISTANCE, IMPROVED MOISTURE RESISTANCE, LOW STRESS PROPERTY | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2001-04-03 | — | — | US | disclosed |
| US-5739100-A | Cis-3-hexenal-cis-3-hexenyl acetal compound, process for preparing same, and fragrance-or flavor-imparting or fragrance-or flavor-retaining agent and perfume composition containing same | NIPPON ZEON CO., LTD. (JP) | 1998-04-14 | — | — | US | disclosed |
| US-5107036-A | A mixture of the compound or novolak produced by condensing a phenol and hydroxybenzaldehyde and a polyhydric phenol; heat and moisture resistance; dimensional stability; molding materials | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 1992-04-21 | — | — | US | disclosed |
| EP-0424872-A2 | Curing agent for epoxy resin | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 1991-05-02 | — | — | EP | disclosed |
| EP-0415437-A2 | Curing agent for epoxy resins | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 1991-03-06 | — | — | EP | disclosed |
| US-4707705-A | APERTURES, DIAMETERS, CONTROLLING | CANON KABUSHIKI KAISHA (JP) | 1987-11-17 | — | — | US | disclosed |
| US-4642281-A | CORE OF POLYMER AND HIGH BOILING SOLVENT; SHELL POLYMER BY IN-SITU POLYMERIZATION | FUJI PHOTO FILM CO., LTD. (JP) | 1987-02-10 | — | — | US | disclosed |
| US-4465755-A | Pressure fixable electrostatographic toner material comprising encapsulated particles containing curing agent | FUJI PHOTO FILM CO., LTD. | 1984-08-14 | — | — | US | disclosed |
| US-4178280-A | Stabilized polyolefin composition | R. T. VANDERBILT COMPANY, INC. (US) | 1979-12-11 | — | — | US | disclosed |
| US-4100132-A | RESISTANCE TO METAL-CATALYZED OXIDATIVE DEGRADATION | R. T. VANDERBILT COMPANY, INC. (US) | 1978-07-11 | — | — | US | disclosed |