⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL28277758 | 0.58 | — | — | |
| SCHEMBL28276641 | 0.58 | — | — | |
| SCHEMBL11604300 | 0.55 | — | — | |
| SCHEMBL639659 | 0.55 | — | — | |
| SCHEMBL821396 | 0.55 | — | — | |
| SCHEMBL7538357 | 0.50 | — | — | |
| SCHEMBL3672524 | 0.50 | — | — | |
| SCHEMBL29369330 | 0.47 | — | — | |
| Ethylene SCHEMBL10456493 | 0.47 | — | — | |
| SCHEMBL3403275 | 0.47 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-6652087-B2 | Image formation | BIG PICTURE GROUP JAPAN LLC (JP) | 2003-11-25 | — | — | US | disclosed |
| US-6649680-B2 | Thermoplastic resin; liquid crystal polymer; silicone compound as a flame retardant; good fluidity and excellent recycling property, can give a molded article having excellent rigidity | DAICEL CHEMICAL INDUSTRIES, LTD. (JP) | 2003-11-18 | — | — | US | disclosed |
| EP-1302330-A1 | IMAGE FORMING METHOD | Furukawa, Ken-ichi (JP) | 2003-04-16 | — | — | EP | disclosed |
| US-20020149658-A1 | Image formation | BIG PICTURE GROUP JAPAN LLC (JP) | 2002-10-17 | — | — | US | disclosed |
| US-20020055563-A1 | Flame retardant resin composition | DAICEL CHEMICAL INDUSTRIES, LTD. (JP) | 2002-05-09 | — | — | US | disclosed |
| US-5004674-A | Organic compound which releases a free radical on contact with light rays and a compound which changes in absorption spectra due to free radical in a layer on a support | FUJI PHOTO FILM CO., LTD. (JP) | 1991-04-02 | — | — | US | disclosed |