SCHEMBL7198010

SCHEMBL7198010

COC(=O)C(C)SCC(CSC(C)C(=O)OC)SC(C)C(=O)OC

nearest known ligand 0.39

Predicted protein targets (top 8)

geneUniProtsupporting neighboursconfidence
SMN1; SMN2 Q16637 2/20 0.39
ALDH1A1 P00352 2/20 0.38
CA14 Q9ULX7 2/20 0.32
KDM4E B2RXH2 1/20 0.32
HPGD P15428 1/20 0.32
APOBEC3G Q9HC16 1/20 0.32
CA12 O43570 1/20 0.31
POLB P06746 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL112203 0.78 ALDH1A1 (0.48) SMN1; SMN2ALDH1A1CA14KDM4EHPGD
SCHEMBL13313611 0.74
SCHEMBL13348564 0.72
SCHEMBL5276974 0.71 SMN1; SMN2 (0.46) SMN1; SMN2ALDH1A1CA14KDM4EHPGD
SCHEMBL2134774 0.71 SMN1; SMN2 (0.38) SMN1; SMN2ALDH1A1CA14KDM4EHPGD
SCHEMBL18312129 0.69
SCHEMBL283731 0.68 ALDH1A1 (0.48) SMN1; SMN2ALDH1A1CA14KDM4EHPGD
SCHEMBL2136559 0.67 EPHX1 (0.39) SMN1; SMN2ALDH1A1KDM4EHPGDAPOBEC3G
SCHEMBL10784477 0.67 ALDH1A1 (0.40) SMN1; SMN2ALDH1A1CA14KDM4EHPGD
SCHEMBL2136066 0.67 EPHX1 (0.38) SMN1; SMN2ALDH1A1CA14KDM4EHPGD

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-6596836-B2 1,2,3-tris(isocyanatoalkylthio)propane; intermediate for forming polyurethane or polythiourethane optical materials, such as spectacle lenses having a high refractive index and a low dispersion HOYA CORPORATION (JP) 2003-07-22 US disclosed
EP-0976728-B1 Polyisocyanate compound, process for the production thereof and optical resin material comprising the same HOYA CORP (JP) 2002-12-04 EP disclosed
US-20020151669-A1 Polyisocyanate compounds, process for producing the same, and optical materials using the same KITAHARA YOSHITAKA (JP) 2002-10-17 US disclosed
US-6455729-B1 SUCH AS 1,2,3-TRIS(ISOCYANATOETHYLTHIO)PROPANE; SOLVENT RESISTANCE AND WEATHERABILITY; HIGH REFRACTIVE INDEX HOYA CORPORATION (JP) 2002-09-24 US disclosed
US-20020107353-A1 Polyisocyanate compounds, process for producing the same, and optical materials using the same KITAHARA YOSHITAKA (JP) 2002-08-08 US disclosed
EP-0976728-A1 Polyisocyanate compound, process for the production thereof and optical resin material comprising the same HOYA CORPORATION (JP) 2000-02-02 EP disclosed