⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL8790789 | 0.90 | — | — | |
| SCHEMBL10774831 | 0.71 | — | — | |
| SCHEMBL14937326 | 0.69 | — | — | |
| SCHEMBL28508335 | 0.68 | — | — | |
| SCHEMBL1929946 | 0.63 | — | — | |
| SCHEMBL10482115 | 0.63 | — | — | |
| SCHEMBL1929947 | 0.63 | — | — | |
| SCHEMBL10482114 | 0.63 | — | — | |
| SCHEMBL7493669 | 0.63 | — | — | |
| SCHEMBL3297566 | 0.62 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 94 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-11119408-B2 | Compound, resin and photoresist composition | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2021-09-14 | — | — | US | disclosed |
| CN-105733295-B | Compounds useful as dyes | 住友化学株式会社 | 2020-04-17 | — | — | CN | disclosed |
| US-10209618-B2 | Photoresist composition | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2019-02-19 | — | — | US | disclosed |
| US-10168616-B2 | Photoresist composition and process of producing photoresist pattern | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2019-01-01 | — | — | US | disclosed |
| US-20180031969-A1 | COMPOUND, RESIN AND PHOTORESIST COMPOSITION | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2018-02-01 | — | — | US | disclosed |
| US-20170329219-A1 | PHOTORESIST COMPOSITION | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2017-11-16 | — | — | US | disclosed |
| US-9740102-B2 | Photoresist composition and method for producing photoresist pattern | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2017-08-22 | — | — | US | disclosed |
| US-9671692-B2 | Compound, resin and photoresist composition | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2017-06-06 | — | — | US | disclosed |
| US-9644056-B2 | Compound, resin and photoresist composition | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2017-05-09 | — | — | US | disclosed |
| US-9638996-B2 | Resist composition and method for producing resist pattern | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2017-05-02 | — | — | US | disclosed |
| US-20110200936-A1 | SALT AND PHOTORESIST COMPOSITION CONTAINING THE SAME | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2011-08-18 | — | — | US | disclosed |
| US-20110171576-A1 | SALT AND PHOTORESIST COMPOSITION CONTAINING THE SAME | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2011-07-14 | — | — | US | disclosed |
| US-20080227946-A1 | Thermosetting Composition and Curing Method Thereof | SHOWA DENKO K.K. | 2008-09-18 | — | — | US | disclosed |
| EP-1732980-A1 | THERMOSETTING COMPOSITION AND CURING METHOD THEREOF | SHOWA DENKO KABUSHIKI KAISHA (JP) | 2006-12-20 | — | — | EP | disclosed |
| WO-2005097882-A1 | THERMOSETTING COMPOSITION AND CURING METHOD THEREOF | SHOWA DENKO K.K. (JP) | 2005-10-20 | — | — | WO | disclosed |
| US-6080833-A | BIS(HYDROXYALKOXYLATED) 1,1'-SPIROBIINDAN POLYCARBONATES AND POLYESTERS POLYMERS AND CURABLE COMPOUNDS SUCH AS BIS(ACRYLATED ALKOXY)SPIROBIINDANS; ALSO POLYAMIDES AND POLYIMIDES CONTAINING SPIROBIINDAN GROUPS | MITSUI CHEMICALS, INC. (JP) | 2000-06-27 | — | — | US | disclosed |
| EP-0822545-A2 | Optical component and spirobiindan polymer therefor | MITSUI TOATSU CHEMICALS, INCORPORATED (JP) | 1998-02-04 | — | — | EP | disclosed |
| EP-0409840-A4 | BENZOTRIAZOLE AND OXANILIDE UV ABSORBER HYDRAZIDES | — | 1991-09-04 | — | — | EP | disclosed |
| EP-0409840-A1 | BENZOTRIAZOLE AND OXANILIDE UV ABSORBER HYDRAZIDES | ELF ATOCHEM NORTH AMERICA, INC. (US) | 1991-01-30 | — | — | EP | disclosed |
| WO-1990009369-A1 | BENZOTRIAZOLE AND OXANILIDE UV ABSORBER HYDRAZIDES | ATOCHEM NORTH AMERICA, INC. (US) | 1990-08-23 | — | — | WO | disclosed |