Known targets — ChEMBL curated mechanism
The experimentally established mechanism targets of Adipic Acid. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.
Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | SLC6A3 known ✓ | Q01959 | 1/20 | 0.56 |
| ▸ | HDAC3 | O15379 | 2/20 | 0.69 |
| ▸ | HDAC4 | P56524 | 2/20 | 0.69 |
| ▸ | HDAC1 | Q13547 | 2/20 | 0.69 |
| ▸ | HDAC7 | Q8WUI4 | 2/20 | 0.69 |
| ▸ | HDAC2 | Q92769 | 2/20 | 0.69 |
| ▸ | HDAC10 | Q969S8 | 2/20 | 0.69 |
| ▸ | HDAC11 | Q96DB2 | 2/20 | 0.69 |
| ▸ | HDAC8 | Q9BY41 | 2/20 | 0.69 |
| ▸ | HDAC6 | Q9UBN7 | 2/20 | 0.69 |
| ▸ | HDAC9 | Q9UKV0 | 2/20 | 0.69 |
| ▸ | HDAC5 | Q9UQL6 | 2/20 | 0.69 |
| ▸ | TSHR | P16473 | 3/20 | 0.67 |
| ▸ | DAO | P14920 | 1/20 | 0.67 |
| ▸ | NAPRT | Q6XQN6 | 1/20 | 0.67 |
| ▸ | LMNA | P02545 | 3/20 | 0.58 |
| ▸ | L3MBTL1 | Q9Y468 | 2/20 | 0.58 |
| ▸ | MAPT | P10636 | 2/20 | 0.58 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.58 |
| ▸ | NR4A2 | P43354 | 1/20 | 0.58 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Adipic Acid SCHEMBL11024842 | 1.00 | HDAC3 (0.69) | HDAC3HDAC4HDAC1HDAC7HDAC2 | |
| Adipic Acid SCHEMBL31750523 | 0.98 | HDAC3 (0.67) | HDAC3HDAC4HDAC1HDAC7HDAC2 | |
| Sebacic Acid SCHEMBL3695791 | 0.98 | HDAC3 (0.73) | HDAC3HDAC4HDAC1HDAC7HDAC2 | |
| Sebacic Acid SCHEMBL27709538 | 0.98 | HDAC3 (0.73) | HDAC3HDAC4HDAC1HDAC7HDAC2 | |
| Glutarate SCHEMBL7758803 | 0.95 | TSHR (0.67) | HDAC3HDAC4HDAC1HDAC7HDAC2 | |
| Adipic Acid SCHEMBL9065164 | 0.94 | HDAC3 (0.62) | HDAC3HDAC4HDAC1HDAC7HDAC2 | |
| Terephthalic Acid SCHEMBL9859986 | 0.90 | TSHR (0.63) | HDAC3HDAC4HDAC1HDAC7HDAC2 | |
| Terephthalic Acid SCHEMBL17727985 | 0.90 | TSHR (0.63) | HDAC3HDAC4HDAC1HDAC7HDAC2 | |
| Terephthalic Acid SCHEMBL10927542 | 0.90 | TSHR (0.63) | HDAC3HDAC4HDAC1HDAC7HDAC2 | |
| Terephthalic Acid SCHEMBL9739994 | 0.90 | TSHR (0.63) | HDAC3HDAC4HDAC1HDAC7HDAC2 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 18 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-105652592-B | Photosensitive composition of urethane-modified phenolic resin | 乐凯华光印刷科技有限公司 | 2020-02-21 | — | — | CN | claimed |
| CN-1025207-C | Aqueous emulsion type leather top coating material | LUZHOU CITY LEATHER CHEMICAL I (CN) | 1994-06-29 | — | — | CN | claimed |
| CN-1047683-A | Aqueous emulsion type leather top finishing material | LEATHER CHEMICAL INDUSTRY FACT (CN) | 1990-12-12 | — | — | CN | claimed |
| CN-111324008-B | Photosensitive composition and application thereof | 乐凯华光印刷科技有限公司 | 2023-04-14 | — | — | CN | disclosed |
| CN-109776737-B | Solvent-resistant resin, photosensitive composition containing resin and application of composition | 乐凯华光印刷科技有限公司 | 2023-01-06 | — | — | CN | disclosed |
| CN-114409848-A | Dissolution inhibitor and preparation method and application thereof | 乐凯华光印刷科技有限公司 | 2022-04-29 | — | — | CN | disclosed |
| CN-111324008-A | Photosensitive composition and application thereof | 乐凯华光印刷科技有限公司 | 2020-06-23 | — | — | CN | disclosed |
| CN-105652592-B | Photosensitive composition of urethane-modified phenolic resin | 乐凯华光印刷科技有限公司 | 2020-02-21 | — | — | CN | disclosed |
| CN-107250281-A | Modified asphaltic method | 纳幕尔杜邦公司 | 2017-10-13 | — | — | CN | disclosed |
| US-6638854-B2 | Semiconductor device and method for manufacturing the same | HITACHI, LTD. (JP) | 2003-10-28 | — | — | US | disclosed |
| US-20030003713-A1 | Semiconductor device and method for manufacturing the same | HITACHI, LTD. | 2003-01-02 | — | — | US | disclosed |
| US-20020025605-A1 | Semiconductor device and method for manufacturing the same | HITACHI, LTD. | 2002-02-28 | — | — | US | disclosed |
| US-6326299-B1 | Method for manufacturing a semiconductor device | HITACHI, LTD. (JP) | 2001-12-04 | — | — | US | disclosed |
| CN-1025207-C | Aqueous emulsion type leather top coating material | LUZHOU CITY LEATHER CHEMICAL I (CN) | 1994-06-29 | — | — | CN | disclosed |
| US-5055346-A | Glossy, clear thermoplastic overcoat, acrylic paint containing pigments, and flexible thermoforming layer | ROHRBACHER FRANK (US) | 1991-10-08 | — | — | US | disclosed |
| CN-1047683-A | Aqueous emulsion type leather top finishing material | LEATHER CHEMICAL INDUSTRY FACT (CN) | 1990-12-12 | — | — | CN | disclosed |
| US-4587057-A | &NTERMEDIATES FOR GLUTARALDEHYDE PRODUCTION | NIPPON OIL CO., LTD. (JP) | 1986-05-06 | — | — | US | disclosed |
| US-4087479-A | A POLYESTER AND A POLYEPOXIDE COMPOUND | NIPPON ESTER CO., LTD. (JA) | 1978-05-02 | — | — | US | disclosed |