SCHEMBL7202703

SCHEMBL7202703

O=C(O)CCCCC(=O)OC(=O)c1ccccc1

nearest known ligand 0.56

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
HDAC3 O15379 2/20 0.56
HDAC4 P56524 2/20 0.56
HDAC1 Q13547 2/20 0.56
HDAC7 Q8WUI4 2/20 0.56
HDAC2 Q92769 2/20 0.56
HDAC10 Q969S8 2/20 0.56
HDAC11 Q96DB2 2/20 0.56
HDAC8 Q9BY41 2/20 0.56
HDAC6 Q9UBN7 2/20 0.56
HDAC9 Q9UKV0 2/20 0.56
HDAC5 Q9UQL6 2/20 0.56
PPARA Q07869 1/20 0.50
TDP1 Q9NUW8 3/20 0.48
MAPT P10636 2/20 0.47
RXFP1 Q9HBX9 1/20 0.47
L3MBTL1 Q9Y468 2/20 0.47
LMNA P02545 2/20 0.47
NR4A2 P43354 1/20 0.47
F2 P00734 1/20 0.47
PRSS1 P07477 1/20 0.46

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL11469404 0.96 HDAC3 (0.52) HDAC3HDAC4HDAC1HDAC7HDAC2
SCHEMBL29172840 0.94 TDP1 (0.53) HDAC3HDAC4HDAC1HDAC7HDAC2
Hydrogen Peroxide SCHEMBL21612075 0.92 L3MBTL1 (0.55) HDAC3HDAC4HDAC1HDAC7HDAC2
SCHEMBL28654451 0.92 L3MBTL1 (0.55) HDAC3HDAC4HDAC1HDAC7HDAC2
SCHEMBL29089113 0.92 L3MBTL1 (0.55) HDAC3HDAC4HDAC1HDAC7HDAC2
SCHEMBL1134580 0.92 MAPK1 (0.46) HDAC3HDAC4HDAC1HDAC7HDAC2
Butadiene SCHEMBL9472552 0.92 HDAC3 (0.49) HDAC3HDAC4HDAC1HDAC7HDAC2
SCHEMBL29154817 0.91 MAPK1 (0.49) HDAC3HDAC4HDAC1HDAC7HDAC2
SCHEMBL8379024 0.91 MAPK1 (0.49) HDAC3HDAC4HDAC1HDAC7HDAC2
SCHEMBL27524321 0.91 MAPK1 (0.49) HDAC3HDAC4HDAC1HDAC7HDAC2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 13 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-105652592-B Photosensitive composition of urethane-modified phenolic resin 乐凯华光印刷科技有限公司 2020-02-21 CN claimed
CN-114450334-B Cellulose acetate particle 株式会社大赛璐 2024-02-06 CN disclosed
CN-111324008-B Photosensitive composition and application thereof 乐凯华光印刷科技有限公司 2023-04-14 CN disclosed
CN-109776737-B Solvent-resistant resin, photosensitive composition containing resin and application of composition 乐凯华光印刷科技有限公司 2023-01-06 CN disclosed
CN-114409848-A Dissolution inhibitor and preparation method and application thereof 乐凯华光印刷科技有限公司 2022-04-29 CN disclosed
CN-111324008-A Photosensitive composition and application thereof 乐凯华光印刷科技有限公司 2020-06-23 CN disclosed
CN-105652592-B Photosensitive composition of urethane-modified phenolic resin 乐凯华光印刷科技有限公司 2020-02-21 CN disclosed
US-6638854-B2 Semiconductor device and method for manufacturing the same HITACHI, LTD. (JP) 2003-10-28 US disclosed
US-20030003713-A1 Semiconductor device and method for manufacturing the same HITACHI, LTD. 2003-01-02 US disclosed
US-20020025605-A1 Semiconductor device and method for manufacturing the same HITACHI, LTD. 2002-02-28 US disclosed
US-6326299-B1 Method for manufacturing a semiconductor device HITACHI, LTD. (JP) 2001-12-04 US disclosed
US-5055346-A Glossy, clear thermoplastic overcoat, acrylic paint containing pigments, and flexible thermoforming layer ROHRBACHER FRANK (US) 1991-10-08 US disclosed
US-4587057-A &NTERMEDIATES FOR GLUTARALDEHYDE PRODUCTION NIPPON OIL CO., LTD. (JP) 1986-05-06 US disclosed