Predicted protein targets (top 14)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | HMGCR | P04035 | 1/20 | 0.38 |
| ▸ | CHRM1 | P11229 | 1/20 | 0.38 |
| ▸ | TBXA2R | P21731 | 1/20 | 0.38 |
| ▸ | ADRA1A | P35348 | 1/20 | 0.38 |
| ▸ | TSHR | P16473 | 2/20 | 0.36 |
| ▸ | CYP2D6 | P10635 | 1/20 | 0.36 |
| ▸ | CYP2C19 | P33261 | 1/20 | 0.36 |
| ▸ | HIF1A | Q16665 | 1/20 | 0.36 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.35 |
| ▸ | TDP1 | Q9NUW8 | 2/20 | 0.32 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.32 |
| ▸ | FFAR1 | O14842 | 1/20 | 0.32 |
| ▸ | CPT2 | P23786 | 1/20 | 0.32 |
| ▸ | TET2 | Q6N021 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL1419066 | 0.86 | HMGCR (0.52) | HMGCRCHRM1TBXA2RADRA1ATSHR | |
| SCHEMBL1335602 | 0.80 | HMGCR (0.52) | HMGCRCHRM1TBXA2RADRA1ATSHR | |
| SCHEMBL6363731 | 0.78 | — | — | |
| SCHEMBL14109353 | 0.78 | HMGCR (0.50) | HMGCRCHRM1TBXA2RADRA1ATSHR | |
| SCHEMBL17933420 | 0.74 | ALDH1A1 (0.42) | HMGCRCHRM1TBXA2RADRA1ATSHR | |
| SCHEMBL27647738 | 0.74 | TSHR (0.41) | HMGCRCHRM1TBXA2RADRA1ATSHR | |
| SCHEMBL1262330 | 0.73 | — | — | |
| SCHEMBL11922837 | 0.72 | HMGCR (0.44) | HMGCRCHRM1TBXA2RADRA1ATSHR | |
| SCHEMBL3495260 | 0.72 | HMGCR (0.44) | HMGCRCHRM1TBXA2RADRA1ATSHR | |
| SCHEMBL4783944 | 0.72 | HMGCR (0.44) | HMGCRCHRM1TBXA2RADRA1ATSHR |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-6602647-B2 | Photo acid generator with high transparency and excellent heat stability in a photoresist for lithography using far ultraviolet light, especially light of ArF excimer consists of a cyclic sulfonium compound with 2-oxo group | NEC CORPORATION (JP) | 2003-08-05 | — | — | US | disclosed |
| US-20020045122-A1 | Sulfonium salt compound and resist composition and pattern forming method using the same | NEC CORPORATION | 2002-04-18 | — | — | US | disclosed |
| EP-1113334-A1 | Sulfonium salt compound, resist composition comprising the same and pattern forming method using the composition | NEC CORPORATION (JP) | 2001-07-04 | — | — | EP | disclosed |