Methacrylic Acid

Methacrylic Acid

SCHEMBL7207924

C=C(C)C(=O)O.C=C(C)C(=O)OCC(F)(F)F

nearest known ligand 0.44

Full drug profile on Sugi Atlas →

Predicted protein targets (top 11)

geneUniProtsupporting neighboursconfidence
TSHR P16473 4/20 0.44
HTT P42858 3/20 0.42
THRB P10828 1/20 0.41
ALDH1A1 P00352 3/20 0.39
POLB P06746 1/20 0.34
APEX1 P27695 1/20 0.34
TDP1 Q9NUW8 1/20 0.34
FABP7 O15540 1/20 0.32
MEN1 O00255 1/20 0.30
KMT2A Q03164 1/20 0.30
HSD17B10 Q99714 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL8519549 0.94 TSHR (0.42) TSHRHTTTHRBALDH1A1POLB
Acetic Acid SCHEMBL28980670 0.94 TSHR (0.45) TSHRHTTTHRBALDH1A1POLB
SCHEMBL28031899 0.94 TSHR (0.48) TSHRHTTTHRBALDH1A1POLB
SCHEMBL36595 0.94 TSHR (0.48) TSHRHTTTHRBALDH1A1POLB
Fluoride SCHEMBL28255897 0.92 TSHR (0.47) TSHRHTTTHRBALDH1A1POLB
Trifluoroethanol SCHEMBL28451939 0.88 TSHR (0.44) TSHRHTTTHRBALDH1A1POLB
SCHEMBL6865188 0.88 HTT (0.40) TSHRHTTTHRBALDH1A1POLB
Methacrylic Acid SCHEMBL28912866 0.87 THRB (0.37) TSHRHTTTHRBALDH1A1
Methacrylic Acid SCHEMBL11198261 0.87 HTT (0.38) TSHRHTTTHRBALDH1A1
Acrylic Acid SCHEMBL7176178 0.87 TSHR (0.40) TSHRHTTTHRBALDH1A1POLB

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 9 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20030235773-A1 Carrier compositions XEROX CORPORATION 2003-12-25 US claimed
CN-1419568-A Rod type polymer preform having radically-varying proprietes, process for the preparation thereof and apparatus therefor OPTIMEDIA INC (KR) 2003-05-21 CN claimed
CN-112925167-A Photoresist resin with photoacid activity and photoresist 宁波南大光电材料有限公司 2021-06-08 CN disclosed
CN-107417922-A A kind of mixed with polymers graft modification magnetic Nano silica and its application 苏州科技大学 2017-12-01 CN disclosed
CN-106488961-A Conformal coating compositions comprising fluorinated copolymers 3M创新有限公司 2017-03-08 CN disclosed
CN-1419568-A Rod type polymer preform having radically-varying proprietes, process for the preparation thereof and apparatus therefor OPTIMEDIA INC (KR) 2003-05-21 CN disclosed
US-4886864-A Silymethylene methacrylate contact lens and polymer JOHN D. MCCARRY (US) 1989-12-12 US disclosed
US-4780516-A WETTABILITY; HARDNESS BIOMEDICS 1988-10-25 US disclosed
US-4433125-A COPOLYMER OF SILICON CONTAINING ACRYLATE OR METHACRYLATE, AND FLUOROALKYL ACRYLATE OR METHACRYLATE SHIN-ETSU CHEMICAL CO., LTD. (JP) 1984-02-21 US disclosed