SCHEMBL721026

SCHEMBL721026

C=C(C)C(=O)OCC(O)COc1ccc(C(C)C)cc1

nearest known ligand 0.70

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
MAPT P10636 4/20 0.51
POLB P06746 3/20 0.51
LMNA P02545 3/20 0.51
NPSR1 Q6W5P4 1/20 0.51
CYP1A2 P05177 2/20 0.49
KMT2A Q03164 3/20 0.48
SMN1; SMN2 Q16637 2/20 0.47
TSHR P16473 2/20 0.46
MEN1 O00255 2/20 0.46
MAPK1 P28482 2/20 0.43
HTT P42858 2/20 0.43
APEX1 P27695 1/20 0.43
TDP1 Q9NUW8 1/20 0.43
GAA P10253 1/20 0.43
ALDH1A1 P00352 1/20 0.42
RXRA P19793 1/20 0.42
RXRB P28702 1/20 0.42
ADRB2 P07550 1/20 0.41
ADRB1 P08588 1/20 0.41
ADRB3 P13945 1/20 0.41

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL13144353 0.90 POLB (0.53) MAPTPOLBLMNANPSR1CYP1A2
SCHEMBL819038 0.90 POLB (0.53) MAPTPOLBLMNANPSR1CYP1A2
SCHEMBL14565942 0.88 TSHR (0.51) MAPTPOLBLMNANPSR1CYP1A2
SCHEMBL10901654 0.88 POLB (0.50) MAPTPOLBLMNANPSR1CYP1A2
SCHEMBL1263765 0.87 POLB (0.53) MAPTPOLBLMNANPSR1CYP1A2
SCHEMBL11649744 0.87 CYP1A2 (0.65) MAPTPOLBLMNANPSR1CYP1A2
SCHEMBL14173320 0.87 POLB (0.55) MAPTPOLBLMNANPSR1CYP1A2
SCHEMBL15713256 0.87 POLB (0.55) MAPTPOLBLMNANPSR1CYP1A2
SCHEMBL14173333 0.87 POLB (0.55) MAPTPOLBLMNANPSR1CYP1A2
SCHEMBL21008347 0.87 POLB (0.47) MAPTPOLBLMNANPSR1CYP1A2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 66 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-5346805-A Initiator comprising an onium compound and an acridine derivative; printing plate, resist, photomask FUJI PHOTO FILM CO., LTD. (JP) 1994-09-13 US claimed
US-5250385-A Photosensitivity, storage stability FUJI PHOTO FILM CO., LTD. (JP) 1993-10-05 US claimed
US-11703728-B2 Black matrix composition and display device comprising the same SAMSUNG DISPLAY CO., LTD. (KR) 2023-07-18 US disclosed
US-20220118753-A1 ON-PRESS DEVELOPMENT TYPE LITHOGRAPHIC PRINTING PLATE PRECURSOR, METHOD FOR PREPARING LITHOGRAPHIC PRINTING PLATE, AND LITHOGRAPHIC PRINTING METHOD FUJIFILM CORPORATION (JP) 2022-04-21 US disclosed
US-20210221117-A1 PRINTING PLATE PRECURSOR, PRINTING PLATE PRECURSOR LAMINATE, METHOD FOR MAKING PRINTING PLATE, AND PRINTING METHOD FUJIFILM CORPORATION (JP) 2021-07-22 US disclosed
US-20210215980-A1 BLACK MATRIX COMPOSITION AND DISPLAY DEVICE COMPRISING THE SAME SAMSUNG DISPLAY CO., LTD. (KR) 2021-07-15 US disclosed
WO-2021059846-A1 NEAR-INFRARED ABSORPTION COMPOSITION, FILM, OPTICAL FILTER AND MANUFACTURING METHOD THEREOF, SOLID-STATE IMAGING ELEMENT, INFRARED SENSOR, CAMERA MODULE, AND INKJET INK 富士フイルム株式会社 2021-04-01 WO disclosed
WO-2021039253-A1 COMPOSITION, FILM, OPTICAL FILTER AND METHOD FOR PRODUCING SAME, SOLID-STATE IMAGING ELEMENT, INFRARED SENSOR AND SENSOR MODULE 富士フイルム株式会社 2021-03-04 WO disclosed
US-10780679-B2 Laminate, method for manufacturing laminate, semiconductor device, and method for manufacturing the semiconductor device FUJIFILM CORPORATION (JP) 2020-09-22 US disclosed
WO-2020067373-A1 ORIGINAL PLATE FOR PRINTING, LAMINATE OF ORIGINAL PLATE FOR PRINTING, METHOD FOR PLATEMAKING PRINTING PLATE, AND PRINTING METHOD 富士フイルム株式会社 2020-04-02 WO disclosed
WO-2020067374-A1 ORIGINAL PLATE FOR PRINTING, LAMINATE OF ORIGINAL PLATE FOR PRINTING, METHOD FOR MANUFACTURING PRINTING PLATE, AND PRINTING METHOD 富士フイルム株式会社 2020-04-02 WO disclosed
EP-1081552-A1 Lithographic printing plate precursor FUJI PHOTO FILM CO., LTD. (JP) 2001-03-07 EP disclosed
EP-1048982-A1 Photopolymerizable composition for short wavelenght semiconductor laser exposure, photosensitive composition and method for polymerizing photosensitive composition FUJI PHOTO FILM CO., LTD. (JP) 2000-11-02 EP disclosed
EP-0520364-B1 Photopolymerizable composition FUJI PHOTO FILM CO LTD (JP) 1997-09-17 EP disclosed
EP-0377321-B1 Photopolymerizable composition FUJI PHOTO FILM CO LTD (JP) 1995-03-22 EP disclosed
US-5385807-A Photopolymerizable composition FUJI PHOTO FILM CO., LTD. (JP) 1995-01-31 US disclosed
US-5346805-A Initiator comprising an onium compound and an acridine derivative; printing plate, resist, photomask FUJI PHOTO FILM CO., LTD. (JP) 1994-09-13 US disclosed
US-5250385-A Photosensitivity, storage stability FUJI PHOTO FILM CO., LTD. (JP) 1993-10-05 US disclosed
EP-0520364-A1 Photopolymerizable composition FUJI PHOTO FILM CO., LTD. (JP) 1992-12-30 EP disclosed
EP-0377321-A2 Photopolymerizable composition FUJI PHOTO FILM CO., LTD. (JP) 1990-07-11 EP disclosed