⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL7211725 | 0.97 | CES2 (0.37) | — | |
| SCHEMBL11842299 | 0.92 | CES2 (0.32) | — | |
| SCHEMBL420741 | 0.92 | — | — | |
| SCHEMBL3618765 | 0.89 | CES2 (0.38) | — | |
| SCHEMBL30179276 | 0.89 | — | — | |
| SCHEMBL23718170 | 0.86 | CES2 (0.46) | — | |
| SCHEMBL13493937 | 0.86 | CES2 (0.46) | — | |
| SCHEMBL28415322 | 0.86 | CES2 (0.41) | — | |
| SCHEMBL29116236 | 0.85 | CES2 (0.40) | — | |
| SCHEMBL3008834 | 0.85 | FOLH1 (0.32) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 15 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-1314746-A2 | Polymerizable compositions for making thio containing resins including a salt catalyst | ESSILOR INTERNATIONAL COMPAGNIE GENERALE D'OPTIQUE (FR) | 2003-05-28 | — | — | EP | claimed |
| CN-118103775-A | Composition for forming resist underlayer film | 日产化学株式会社 | 2024-05-28 | — | — | CN | disclosed |
| CN-117539127-A | Composition for forming resist underlayer film containing amide solvent | 日产化学株式会社 | 2024-02-09 | — | — | CN | disclosed |
| CN-117321502-A | Composition for forming resist underlayer film | 日产化学株式会社 | 2023-12-29 | — | — | CN | disclosed |
| CN-116997861-A | Composition for forming resist underlayer film | 日产化学株式会社 | 2023-11-03 | — | — | CN | disclosed |
| CN-110192152-B | Composition for forming resist underlayer film containing amide solvent | 日产化学株式会社 | 2023-11-03 | — | — | CN | disclosed |
| CN-110546570-B | Composition for forming resist underlayer film using fluorene compound | 日产化学株式会社 | 2023-07-25 | — | — | CN | disclosed |
| CN-116419937-A | Composition for forming resist underlayer film | 日产化学株式会社 | 2023-07-11 | — | — | CN | disclosed |
| CN-116057095-A | Composition for forming resist underlayer film | 日产化学株式会社 | 2023-05-02 | — | — | CN | disclosed |
| CN-116057104-A | Composition for forming resist underlayer film | 日产化学株式会社 | 2023-05-02 | — | — | CN | disclosed |
| CN-111065640-B | Material for organic electroluminescent device | 默克专利有限公司 | 2023-04-18 | — | — | CN | disclosed |
| CN-114231078-A | Metal oxide microparticle dispersion and curable composition containing same | 山阳色素株式会社 | 2022-03-25 | — | — | CN | disclosed |
| CN-107037689-B | Colored curable resin composition | 住友化学株式会社 | 2020-06-16 | — | — | CN | disclosed |
| EP-1314746-A2 | Polymerizable compositions for making thio containing resins including a salt catalyst | ESSILOR INTERNATIONAL COMPAGNIE GENERALE D'OPTIQUE (FR) | 2003-05-28 | — | — | EP | disclosed |
| US-4335126-A | SEDATIVES, TRANQUILIZERS, AND ANTIPYRETICS; NEUROLEPTIC AND ANTIEDEMIC AGENTS | DEGUSSA AKTIENGESELLSCHAFT (DE) | 1982-06-15 | — | — | US | disclosed |