SCHEMBL7218355

SCHEMBL7218355

CC(OC=O)Oc1ccc(C(C)(C)C)cc1

nearest known ligand 0.42

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
TSHR P16473 3/20 0.42
TP53 P04637 1/20 0.42
NR1H4 Q96RI1 1/20 0.41
CA1 P00915 1/20 0.41
CA2 P00918 1/20 0.41
CA9 Q16790 1/20 0.41
MAPT P10636 3/20 0.39
ALDH1A1 P00352 2/20 0.39
MAPK1 P28482 2/20 0.39
RAB9A P51151 2/20 0.39
ALDH1A3 P47895 1/20 0.39
NPC1 O15118 1/20 0.39
HPGD P15428 1/20 0.39
SMN1; SMN2 Q16637 1/20 0.39
TDP1 Q9NUW8 2/20 0.37
L3MBTL1 Q9Y468 1/20 0.37
MAOB P27338 1/20 0.36
AOC3 Q16853 1/20 0.36
LMNA P02545 1/20 0.36
ALOX15 P16050 1/20 0.36

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL10063722 0.87 ALDH1A3 (0.48) ALDH1A1ALDH1A3POLB
SCHEMBL18222954 0.84 MAPT (0.40) TSHRTP53NR1H4CA1CA2
SCHEMBL11789502 0.82 MAPT (0.39) TSHRTP53NR1H4CA1CA2
SCHEMBL14227022 0.79 MAPT (0.45) TSHRNR1H4CA1CA2CA9
SCHEMBL3364531 0.77 KDM4E (0.41) TP53ALDH1A1ALDH1A3HPGDMAOB
SCHEMBL17790003 0.76 NR1H4 (0.44) TSHRNR1H4CA1CA2CA9
SCHEMBL5285132 0.76 MAPT (0.51) NR1H4CA1CA2CA9MAPT
SCHEMBL5283068 0.76 MAPT (0.47) TSHRTP53NR1H4CA1CA2
SCHEMBL3366044 0.75 NR1H4 (0.41) TSHRTP53NR1H4CA1CA2
SCHEMBL3366006 0.75 TP53 (0.50) TSHRTP53NR1H4CA1CA2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-6623907-B2 Chemical amplified photoresist JSR CORPORATION (JP) 2003-09-23 US disclosed
US-20010023050-A1 Radiation-sensitive resin composition JSR CORPORATION (JP) 2001-09-20 US disclosed
EP-1122605-A2 Radiation-sensitive resin composition JSR Corporation (JP) 2001-08-08 EP disclosed