SCHEMBL7219206

SCHEMBL7219206

CN(C)c1cccc2c(S(=O)(=O)NS(=O)(=O)O)cccc12

nearest known ligand 0.62

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
F2 P00734 3/20 0.62
PRSS1 P07477 3/20 0.62
PRSS2 P07478 3/20 0.62
PRSS3 P35030 3/20 0.62
EDNRA P25101 10/20 0.59
CA2 P00918 1/20 0.59
KDM4E B2RXH2 2/20 0.56
TSHR P16473 2/20 0.56
HSD17B10 Q99714 2/20 0.56
NSD2 O96028 1/20 0.56
MEN1 O00255 1/20 0.55
CYP3A4 P08684 1/20 0.55
CYP2C9 P11712 1/20 0.55
HPGD P15428 1/20 0.55
EDNRB P24530 1/20 0.55
KMT2A Q03164 1/20 0.55
HDAC4 P56524 1/20 0.55
HDAC10 Q969S8 1/20 0.55
HDAC6 Q9UBN7 1/20 0.55
HDAC5 Q9UQL6 1/20 0.55

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL28938897 0.84 CA2 (0.69) F2PRSS1PRSS2PRSS3EDNRA
SCHEMBL8906934 0.82 CA2 (0.65) F2PRSS1PRSS2PRSS3EDNRA
SCHEMBL29367067 0.82 CA2 (0.69) F2PRSS1PRSS2PRSS3EDNRA
SCHEMBL133520 0.82 CA2 (0.69) F2PRSS1PRSS2PRSS3EDNRA
SCHEMBL29941705 0.82 CA2 (0.69) F2PRSS1PRSS2PRSS3EDNRA
SCHEMBL2373089 0.81 CA2 (0.63) F2PRSS1PRSS2PRSS3EDNRA
SCHEMBL235824 0.81 CA2 (0.68) F2PRSS1PRSS2PRSS3EDNRA
SCHEMBL6464819 0.81 EDNRA (0.56) F2PRSS1PRSS2PRSS3EDNRA
Water SCHEMBL29242598 0.80 CA2 (0.67) F2PRSS1PRSS2PRSS3EDNRA
SCHEMBL2131462 0.80 CA2 (0.67) F2PRSS1PRSS2PRSS3EDNRA

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-RE38256-E1 Safe slurry photosensitive composition superior in image formation capabilities such as resolution and sensitivity and containing no harmful compound KABUSHIKI KAISHA TOSHIBA (JP) 2003-09-23 US disclosed
US-5691101-A NONTOXIC PHOTORESISTS FOR MANUFACTURE OF CATHODE RAY TUBES AND IMAGE PICKUP DEVICES, ACID GENERATING COMPOUND WHICH CATALYZES CROSSLINKING OR DECOMPOSITION OF RESIN KABUSHIKI KAISHA TOSHIBA (JP) 1997-11-25 US disclosed