Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ALDH1A1 | P00352 | 5/20 | 0.60 |
| ▸ | KDM4E | B2RXH2 | 4/20 | 0.58 |
| ▸ | DAGLA | Q9Y4D2 | 1/20 | 0.54 |
| ▸ | TSHR | P16473 | 5/20 | 0.53 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.53 |
| ▸ | L3MBTL1 | Q9Y468 | 1/20 | 0.53 |
| ▸ | SMN1; SMN2 | Q16637 | 4/20 | 0.50 |
| ▸ | MAPT | P10636 | 4/20 | 0.50 |
| ▸ | KMT2A | Q03164 | 2/20 | 0.50 |
| ▸ | CYP3A4 | P08684 | 2/20 | 0.50 |
| ▸ | CYP1A2 | P05177 | 1/20 | 0.50 |
| ▸ | CYP2C9 | P11712 | 1/20 | 0.50 |
| ▸ | HPGD | P15428 | 1/20 | 0.50 |
| ▸ | CYP2C19 | P33261 | 1/20 | 0.50 |
| ▸ | RAB9A | P51151 | 2/20 | 0.49 |
| ▸ | LMNA | P02545 | 2/20 | 0.49 |
| ▸ | NPC1 | O15118 | 1/20 | 0.49 |
| ▸ | HSD17B10 | Q99714 | 1/20 | 0.49 |
| ▸ | XDH | P47989 | 2/20 | 0.48 |
| ▸ | SPHK2 | Q9NRA0 | 1/20 | 0.48 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL4296230 | 0.85 | HSD17B10 (0.61) | ALDH1A1KDM4EDAGLASMN1; SMN2MAPT | |
| SCHEMBL28433099 | 0.81 | ALDH1A1 (0.60) | ALDH1A1KDM4EDAGLATSHRTDP1 | |
| SCHEMBL11831259 | 0.80 | SMYD3 (0.51) | KDM4EDAGLAL3MBTL1SMN1; SMN2MAPT | |
| SCHEMBL28244885 | 0.78 | ALDH1A1 (0.58) | ALDH1A1KDM4EDAGLASMN1; SMN2MAPT | |
| SCHEMBL30723157 | 0.78 | ALDH1A1 (0.76) | ALDH1A1KDM4ETDP1SMN1; SMN2MAPT | |
| SCHEMBL27573148 | 0.78 | DAGLA (0.76) | ALDH1A1KDM4EDAGLASMN1; SMN2MAPT | |
| SCHEMBL11865449 | 0.77 | NPC1 (0.65) | ALDH1A1KDM4ETSHRSMN1; SMN2MAPT | |
| SCHEMBL1793179 | 0.77 | SMN1; SMN2 (0.60) | ALDH1A1KDM4ESMN1; SMN2MAPTKMT2A | |
| SCHEMBL21240753 | 0.77 | DAGLA (0.54) | ALDH1A1KDM4EDAGLATDP1SMN1; SMN2 | |
| SCHEMBL11702338 | 0.77 | NPC1 (0.60) | ALDH1A1TSHRTDP1L3MBTL1SMN1; SMN2 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 29 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| WO-2024024801-A1 | RADIATION-SENSITIVE COMPOSITION, METHOD FOR FORMING RESIST PATTERN, AND RADIATION-SENSITIVE ACID GENERATOR | JSR株式会社 | 2024-02-01 | — | — | WO | disclosed |
| WO-2023228847-A1 | RADIATION-SENSITIVE RESIN COMPOSITION AND PATTERN FORMATION METHOD | JSR株式会社 | 2023-11-30 | — | — | WO | disclosed |
| WO-2023228842-A1 | RADIATION-SENSITIVE RESIN COMPOSITION AND PATTERN FORMATION METHOD | JSR株式会社 | 2023-11-30 | — | — | WO | disclosed |
| WO-2023153294-A1 | RADIATION-SENSITIVE RESIN COMPOSITION AND PATTERN FORMATION METHOD | JSR株式会社 | 2023-08-17 | — | — | WO | disclosed |
| WO-2023095563-A1 | RADIATION-SENSITIVE RESIN COMPOSITION AND PATTERN FORMATION METHOD | JSR株式会社 | 2023-06-01 | — | — | WO | disclosed |
| WO-2023095561-A1 | RADIATION-SENSITIVE RESIN COMPOSITION AND PATTERN FORMATION METHOD | JSR株式会社 | 2023-06-01 | — | — | WO | disclosed |
| WO-2023276538-A1 | RADIATION-SENSITIVE COMPOSITION, RESIST PATTERN FORMATION METHOD, POLYMER, AND COMPOUND | JSR株式会社 | 2023-01-05 | — | — | WO | disclosed |
| WO-2022209816-A1 | METHOD FOR PRODUCING SEMICONDUCTOR SUBSTRATE AND COMPOSITION FOR FORMING RESIST UNDERLAYER FILM | JSR株式会社 | 2022-10-06 | — | — | WO | disclosed |
| WO-2022202402-A1 | SEMICONDUCTOR SUBSTRATE PRODUCTION METHOD AND COMPOSITION FOR FORMING RESIST UNDERLAYER FILM | JSR株式会社 | 2022-09-29 | — | — | WO | disclosed |
| WO-2022190964-A1 | RADIATION-SENSITIVE RESIN COMPOSITION AND PATTERN FORMATION METHOD | JSR株式会社 | 2022-09-15 | — | — | WO | disclosed |
| CN-102030714-B | Method for preparing water soluble bis-benzimidazole salt | UNIV XI AN MEDICAL | 2013-06-26 | — | — | CN | disclosed |
| WO-2013065878-A1 | METHOD OF FORMING PATTERN AND COMPOSITION FOR CROSSLINKED LAYER FORMATION TO BE USED IN THE METHOD | FUJIFILM CORPORATION (JP) | 2013-05-10 | — | — | WO | disclosed |
| WO-2012026622-A1 | METHOD OF FORMING PATTERN AND DEVELOPER FOR USE IN THE METHOD | FUJIFILM CORPORATION (JP) | 2012-03-01 | — | — | WO | disclosed |
| CN-102030714-A | Method for preparing water soluble bis-benzimidazole salt | UNIV XI AN MEDICAL | 2011-04-27 | — | — | CN | disclosed |
| EP-1641849-A1 | PHOTORESIST POLYMERS AND COMPOSITIONS HAVING ACRYLIC- OR METHACRYLIC-BASED POLYMERIC RESIN PREPARED BY A LIVING FREE RADICAL PROCESS | Symyx Technologies, Inc. (US) | 2006-04-05 | — | — | EP | disclosed |
| EP-1641848-A1 | PHOTORESIST POLYMER COMPOSITIONS | JSR Corporation (JP) | 2006-04-05 | — | — | EP | disclosed |
| WO-2005003198-A1 | PHOTORESIST POLYMER COMPOSITIONS | JSR CORPORATION (JP) | 2005-01-13 | — | — | WO | disclosed |
| WO-2005000923-A1 | PHOTORESIST POLYMERS AND COMPOSITIONS HAVING ACRYLIC- OR METHACRYLIC-BASED POLYMERIC RESIN PREPARED BY A LIVING FREE RADICAL PROCESS | SYMYX TECHNOLOGIES, INC. (US) | 2005-01-06 | — | — | WO | disclosed |
| EP-1165514-A1 | 3-(ANILINOMETHYLENE) OXINDOLES AS PROTEIN TYROSINE KINASE AND PROTEIN SERINE/THREONINE KINASE INHIBITORS | GLAXO GROUP LIMITED (GB) | 2002-01-02 | — | — | EP | disclosed |
| WO-2000056710-A1 | 3-(ANILINOMETHYLENE) OXINDOLES AS PROTEIN TYROSINE KINASE AND PROTEIN SERINE/THREONINE KINASE INHIBITORS | GLAXO GROUP LIMITED (GB) | 2000-09-28 | — | — | WO | disclosed |