Predicted protein targets (top 19)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | NPSR1 | Q6W5P4 | 1/20 | 0.62 |
| ▸ | ADORA2A | P29274 | 3/20 | 0.50 |
| ▸ | ADORA1 | P30542 | 2/20 | 0.50 |
| ▸ | POLB | P06746 | 1/20 | 0.50 |
| ▸ | ADORA3 | P0DMS8 | 1/20 | 0.50 |
| ▸ | ADORA2B | P29275 | 1/20 | 0.50 |
| ▸ | GPR68 | Q15743 | 5/20 | 0.49 |
| ▸ | HTR1A | P08908 | 1/20 | 0.49 |
| ▸ | TPH1 | P17752 | 6/20 | 0.46 |
| ▸ | HSP90AA1 | P07900 | 1/20 | 0.44 |
| ▸ | HSP90AB1 | P08238 | 1/20 | 0.44 |
| ▸ | HRH4 | Q9H3N8 | 1/20 | 0.43 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.42 |
| ▸ | TP53 | P04637 | 1/20 | 0.42 |
| ▸ | RAB9A | P51151 | 1/20 | 0.42 |
| ▸ | HSD17B10 | Q99714 | 1/20 | 0.42 |
| ▸ | GBA1 | P04062 | 1/20 | 0.41 |
| ▸ | IDH1 | O75874 | 1/20 | 0.41 |
| ▸ | HTR2B | P41595 | 1/20 | 0.41 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL11303621 | 0.93 | NPSR1 (0.58) | NPSR1ADORA2AADORA1POLBADORA3 | |
| SCHEMBL13241908 | 0.90 | IDH1 (0.50) | NPSR1POLBKDM4ETP53RAB9A | |
| SCHEMBL723591 | 0.89 | NPSR1 (0.59) | NPSR1ADORA2AADORA1POLBADORA3 | |
| SCHEMBL724229 | 0.87 | NPSR1 (0.57) | NPSR1ADORA2AADORA1POLBADORA3 | |
| SCHEMBL724054 | 0.85 | NPSR1 (0.66) | NPSR1ADORA2AADORA1POLBADORA3 | |
| SCHEMBL6269189 | 0.83 | NPSR1 (0.71) | NPSR1ADORA2AADORA1POLBADORA3 | |
| SCHEMBL10746793 | 0.82 | NPSR1 (0.54) | NPSR1ADORA2AADORA1POLBADORA3 | |
| SCHEMBL724904 | 0.82 | NPSR1 (0.61) | NPSR1ADORA2AADORA1POLBADORA3 | |
| SCHEMBL723446 | 0.82 | NPSR1 (0.61) | NPSR1ADORA2AADORA1POLBADORA3 | |
| Benzoguanamine SCHEMBL11620035 | 0.81 | ADORA2A (0.70) | NPSR1ADORA2AADORA1POLBADORA3 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 18 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-10079118-B2 | Electrode for an electric-energy storage system with collector including a protective conductive layer and corresponding manufacturing method | HUTCHINSON (FR) | 2018-09-18 | — | — | US | claimed |
| US-20170011861-A1 | ELECTRODE FOR AN ELECTRIC-ENERGY STORAGE SYSTEM WITH COLLECTOR INCLUDING A PROTECTIVE CONDUCTIVE LAYER AND CORRESPONDING MANUFACTURING METHOD | HUTCHINSON (FR) | 2017-01-12 | — | — | US | claimed |
| US-10079118-B2 | Electrode for an electric-energy storage system with collector including a protective conductive layer and corresponding manufacturing method | HUTCHINSON (FR) | 2018-09-18 | — | — | US | disclosed |
| US-20170011861-A1 | ELECTRODE FOR AN ELECTRIC-ENERGY STORAGE SYSTEM WITH COLLECTOR INCLUDING A PROTECTIVE CONDUCTIVE LAYER AND CORRESPONDING MANUFACTURING METHOD | HUTCHINSON (FR) | 2017-01-12 | — | — | US | disclosed |
| EP-3100293-A1 | ELECTRODE FOR AN ELECTRIC-ENERGY STORAGE SYSTEM WITH COLLECTOR INCLUDING A PROTECTIVE CONDUCTIVE LAYER AND CORRESPONDING MANUFACTURING METHOD | Hutchinson (FR) | 2016-12-07 | — | — | EP | disclosed |
| EP-2609468-A1 | METHOD OF FORMING PATTERN AND DEVELOPER FOR USE IN THE METHOD | FUJIFILM Corporation (JP) | 2013-07-03 | — | — | EP | disclosed |
| WO-2013065878-A1 | METHOD OF FORMING PATTERN AND COMPOSITION FOR CROSSLINKED LAYER FORMATION TO BE USED IN THE METHOD | FUJIFILM CORPORATION (JP) | 2013-05-10 | — | — | WO | disclosed |
| WO-2012026622-A1 | METHOD OF FORMING PATTERN AND DEVELOPER FOR USE IN THE METHOD | FUJIFILM CORPORATION (JP) | 2012-03-01 | — | — | WO | disclosed |
| EP-2084051-A1 | EXPANDABLE FILLER INSERT AND METHODS OF PRODUCING THE EXPANDABLE FILLER INSERT | Henkel AG & Co. KGaA (DE) | 2009-08-05 | — | — | EP | disclosed |
| EP-1429185-B1 | ETCHING METHOD AND USE OF A COMPOSITION FOR FORMING ETCHING PROTECTIVE LAYER | AZ ELECTRONIC MATERIALS USA (US) | 2009-05-13 | — | — | EP | disclosed |
| WO-2008065049-A1 | EXPANDABLE FILLER INSERT AND METHODS OF PRODUCING THE EXPANDABLE FILLER INSERT | HENKEL AG & CO. KGAA (DE) | 2008-06-05 | — | — | WO | disclosed |
| US-7141177-B2 | Etching method and composition for forming etching protective layer | AZ ELECTRONIC MATERIALS USA CORP. (US) | 2006-11-28 | — | — | US | disclosed |
| US-20040238486-A1 | Etching method and composition for forming etching protective layer | MERCK PATENT GMBH (DE) | 2004-12-02 | — | — | US | disclosed |
| EP-1429185-A1 | ETCHING METHOD AND COMPOSITION FOR FORMING ETCHING PROTECTIVE LAYER | Clariant International Ltd. (CH) | 2004-06-16 | — | — | EP | disclosed |
| EP-0903626-B1 | Amino-triazine compounds for (photo)thermographic materials | AGFA GEVAERT (BE) | 2004-02-04 | — | — | EP | disclosed |
| US-6479103-B1 | BLOCKED POLYURETHANE RESINS, EPOXY RESINS, TOGETHER WITH CURING AGENTS CONTAINING NITROGEN AND CONDUCTIVE EXTENDERS ARE SUITABLE FOR COATING METAL SURFACES, IN PARTICULAR SHEET STEEL IN THE COIL COATING PROCESS | HENKEL KOMMANDITGESELLSCHAFT AUF AKTIEN (DE) | 2002-11-12 | — | — | US | disclosed |
| US-6063559-A | HIGH MAXIMUM DENSITY AND LOW MINIMUM DENSITY LEVELS AND IMPROVED ARCHIVABILITY AND/OR IMPROVED LIGHT STABILITY | AGFA-GEVAERT (BE) | 2000-05-16 | — | — | US | disclosed |
| EP-0903626-A1 | Amino-triazine compounds for (photo)thermographic materials | AGFA-GEVAERT N.V. (BE) | 1999-03-24 | — | — | EP | disclosed |