SCHEMBL724229

SCHEMBL724229

CCCCOCNc1nc(N)nc(-c2ccccc2)n1

nearest known ligand 0.57

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
NPSR1 Q6W5P4 1/20 0.57
TPH1 P17752 6/20 0.46
GPR68 Q15743 4/20 0.45
HTR1A P08908 1/20 0.45
POLB P06746 3/20 0.45
ADORA2A P29274 2/20 0.45
ADORA1 P30542 2/20 0.45
ADORA3 P0DMS8 1/20 0.45
ADORA2B P29275 1/20 0.45
TLR8 Q9NR97 1/20 0.42
GBA1 P04062 1/20 0.41
MEN1 O00255 1/20 0.41
ALDH1A1 P00352 1/20 0.41
LMNA P02545 1/20 0.41
GLA P06280 1/20 0.41
GAA P10253 1/20 0.41
MAPT P10636 1/20 0.41
HPGD P15428 1/20 0.41
TSHR P16473 1/20 0.41
KMT2A Q03164 1/20 0.41

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL723591 0.92 NPSR1 (0.59) NPSR1TPH1GPR68HTR1APOLB
SCHEMBL723370 0.87 NPSR1 (0.62) NPSR1TPH1GPR68HTR1APOLB
SCHEMBL11303621 0.83 NPSR1 (0.58) NPSR1TPH1GPR68HTR1APOLB
SCHEMBL4027047 0.82 NPSR1 (0.64) NPSR1TPH1GPR68HTR1APOLB
SCHEMBL13241909 0.82 IDH1 (0.48) NPSR1POLBADORA2AADORA1ADORA3
SCHEMBL408240 0.82 TLR8 (0.40) POLBTLR8MEN1ALDH1A1LMNA
SCHEMBL19579565 0.81 NPSR1 (0.62) NPSR1TPH1GPR68HTR1APOLB
SCHEMBL724054 0.81 NPSR1 (0.66) NPSR1TPH1GPR68HTR1APOLB
SCHEMBL13140700 0.81 POLB (0.39) NPSR1POLBADORA1ADORA3GBA1
SCHEMBL13140029 0.79 NPSR1 (0.68) NPSR1TPH1GPR68HTR1APOLB

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 183 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-105575775-B Layer structure and the method and semiconductor device for manufacturing its method, forming pattern 三星SDI株式会社 2019-08-13 CN claimed
CN-106610567-A Method for producing layer structure, and method for forming patterns 三星SDI株式会社 2017-05-03 CN claimed
CN-105575775-A Method of producing layer structure, layer structure, a method of forming patterns and a semiconductor device SAMSUNG SDI CO LTD 2016-05-11 CN claimed
US-20240199924-A1 LAMINATE, RELEASE AGENT COMPOSITION, AND METHOD FOR MANUFACTURING PROCESSED SEMICONDUCTOR SUBSTRATE NISSAN CHEMICAL CORPORATION (JP) 2024-06-20 US disclosed
CN-117882172-A Adhesive composition, laminate, and method for producing processed semiconductor substrate 日产化学株式会社 2024-04-12 CN disclosed
CN-117716474-A Method for producing laminate and kit of adhesive composition 日产化学株式会社 2024-03-15 CN disclosed
CN-117157738-A Laminate, stripper composition, and method for producing processed semiconductor substrate 日产化学株式会社 2023-12-01 CN disclosed
CN-117157739-A Laminate, stripper composition, and method for producing processed semiconductor substrate 日产化学株式会社 2023-12-01 CN disclosed
CN-117098824-A Adhesive composition, laminate, method for producing laminate, and method for producing processed substrate 日产化学株式会社 2023-11-21 CN disclosed
CN-117083697-A Laminate, stripper composition, and method for producing processed semiconductor substrate 日产化学株式会社 2023-11-17 CN disclosed
CN-116157898-A Laminate, stripper composition, and method for producing processed semiconductor substrate 日产化学株式会社 2023-05-23 CN disclosed
EP-0903626-B1 Amino-triazine compounds for (photo)thermographic materials AGFA GEVAERT (BE) 2004-02-04 EP disclosed
EP-0839856-B1 Polyester film for decorative plate or decorative sheet MITSUBISHI POLYESTER FILM CORP (JP) 2003-12-17 EP disclosed
EP-1057852-A2 Polyester film for decorative plate or decorative sheet Mitsubishi Polyester Film Corporation (JP) 2000-12-06 EP disclosed
US-6063559-A HIGH MAXIMUM DENSITY AND LOW MINIMUM DENSITY LEVELS AND IMPROVED ARCHIVABILITY AND/OR IMPROVED LIGHT STABILITY AGFA-GEVAERT (BE) 2000-05-16 US disclosed
US-5932320-A Polyester film for decorative plate or decorative sheet MITSUBISHI POLYESTER FILM CORPORATION (JP) 1999-08-03 US disclosed
EP-0903626-A1 Amino-triazine compounds for (photo)thermographic materials AGFA-GEVAERT N.V. (BE) 1999-03-24 EP disclosed
EP-0839856-A2 Polyester film for decorative plate or decorative sheet Mitsubishi Polyester Film Corporation (JP) 1998-05-06 EP disclosed
US-4231910-A ALKOXYMETHYLTRIAZINE AND ALKOXYSILANE COMPOUND DOW CORNING CORPORATION (US) 1980-11-04 US disclosed
US-4086206-A FLAME RETARDANTS, DEHYDROCONDENSATION SANKO KAIHATSU KAGAKU KENKYOSHO (JA) 1978-04-25 US disclosed