SCHEMBL723384

SCHEMBL723384

[SiH3]O[SiH2]O[SiH](CCC1CC2C=CC1C2)CCC1CC2C=CC1C2

nearest known ligand 0.33

Predicted protein targets (top 2)

geneUniProtsupporting neighboursconfidence
KDM4E B2RXH2 1/20 0.33
ALDH1A1 P00352 1/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL31031258 0.74 KDM4E (0.36) KDM4EALDH1A1
SCHEMBL1012047 0.70 KDM4E (0.48) KDM4EALDH1A1
SCHEMBL6063956 0.70 KDM4E (0.40) KDM4EALDH1A1
SCHEMBL19480321 0.70 KDM4E (0.43) KDM4EALDH1A1
SCHEMBL6063036 0.69 KDM4E (0.40) KDM4EALDH1A1
SCHEMBL24141597 0.67 KDM4E (0.45) KDM4EALDH1A1
SCHEMBL1760600 0.67 KDM4E (0.41) KDM4EALDH1A1
SCHEMBL1975023 0.66 KDM4E (0.46) KDM4EALDH1A1
SCHEMBL19689468 0.66 KDM4E (0.46) KDM4EALDH1A1
SCHEMBL24183355 0.65 KDM4E (0.42) KDM4EALDH1A1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
WO-2012048079-A2 COMPOSITION AND PROCESS FOR SELECTIVELY ETCHING METAL NITRIDES ADVANCED TECHNOLOGY MATERIALS, INC. (US) 2012-04-12 WO disclosed
WO-2012027667-A2 METHOD FOR PREVENTING THE COLLAPSE OF HIGH ASPECT RATIO STRUCTURES DURING DRYING ADVANCED TECHNOLOGY MATERIALS, INC. (US) 2012-03-01 WO disclosed