SCHEMBL723875

SCHEMBL723875

CCCCOCCOCCOC(C)=O.CCOCCOC(C)=O

nearest known ligand 0.76

Predicted protein targets (top 18)

geneUniProtsupporting neighboursconfidence
TSHR P16473 5/20 0.76
ALDH1A1 P00352 3/20 0.76
THRB P10828 2/20 0.50
HSD17B10 Q99714 2/20 0.44
LMNA P02545 1/20 0.44
CYP3A4 P08684 1/20 0.44
CES2 O00748 1/20 0.42
KMT2A Q03164 2/20 0.41
ATM Q13315 1/20 0.41
MEN1 O00255 1/20 0.41
HTT P42858 1/20 0.41
MAPT P10636 1/20 0.41
DGKA P23743 1/20 0.39
L3MBTL1 Q9Y468 1/20 0.39
HPGD P15428 1/20 0.38
ACHE P22303 1/20 0.38
RARB P10826 1/20 0.38
PTGS2 P35354 1/20 0.38

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL25319556 1.00 TSHR (0.76) TSHRALDH1A1THRBHSD17B10LMNA
SCHEMBL7594603 1.00 TSHR (0.76) TSHRALDH1A1THRBHSD17B10LMNA
SCHEMBL29101370 1.00 TSHR (0.76) TSHRALDH1A1THRBHSD17B10LMNA
SCHEMBL29179720 1.00 TSHR (0.76) TSHRALDH1A1THRBHSD17B10LMNA
SCHEMBL29171212 1.00 TSHR (0.76) TSHRALDH1A1THRBHSD17B10LMNA
Ether SCHEMBL28145030 0.96 TSHR (0.69) TSHRALDH1A1THRBHSD17B10LMNA
Acetic Acid Butyl Ester SCHEMBL9157937 0.94 TSHR (0.79) TSHRALDH1A1THRBHSD17B10LMNA
Acetic Acid Butyl Ester SCHEMBL1357782 0.94 ALDH1A1 (0.75) TSHRALDH1A1THRBHSD17B10LMNA
SCHEMBL2702326 0.94 ALDH1A1 (0.74) TSHRALDH1A1THRBHSD17B10LMNA
SCHEMBL22372 0.94 ALDH1A1 (0.74) TSHRALDH1A1THRBHSD17B10LMNA

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-107615168-B Radiation-sensitive composition 日产化学工业株式会社 2023-12-19 CN disclosed
EP-2609468-A1 METHOD OF FORMING PATTERN AND DEVELOPER FOR USE IN THE METHOD FUJIFILM Corporation (JP) 2013-07-03 EP disclosed
WO-2012026622-A1 METHOD OF FORMING PATTERN AND DEVELOPER FOR USE IN THE METHOD FUJIFILM CORPORATION (JP) 2012-03-01 WO disclosed
US-6454817-B1 IMMERSING ROLLED ALUMINUM ELECTROLYTIC CAPACITOR IN CONDUCTIVE POLYANILINE EMERALDINE BASE POWDER SOLUTION, DRYING TO FULLY REMOVE THE SOLVENT, SEALING ALUMINUM CAN WITH EPOXY RESIN SAMWHA ELECTRIC CO., LTD. (KR) 2002-09-24 US disclosed