⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Hydrochloric Acid SCHEMBL21494431 | 0.97 | — | — | |
| SCHEMBL1708961 | 0.79 | — | — | |
| SCHEMBL4773938 | 0.77 | TBXAS1 (0.75) | — | |
| SCHEMBL2143890 | 0.77 | TBXAS1 (0.67) | — | |
| SCHEMBL7278385 | 0.75 | — | — | |
| SCHEMBL27671718 | 0.74 | — | — | |
| SCHEMBL23818769 | 0.74 | — | — | |
| SCHEMBL20397469 | 0.74 | TBXAS1 (0.75) | — | |
| SCHEMBL11380366 | 0.72 | — | — | |
| SCHEMBL4684727 | 0.72 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 230 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-117555210-A | Photoresist stripping liquid composition, preparation method and application thereof | 成都三贡化工有限公司 | 2024-02-13 | — | — | CN | claimed |
| US-11897995-B2 | Allophanate based dispersing agent | BASF SE (DE) | 2024-02-13 | — | — | US | claimed |
| CN-116382046-A | Color photoresist stripper composition and stripper composition for silicon oxide film | 株式会社东进世美肯 | 2023-07-04 | — | — | CN | claimed |
| CN-115536634-A | Synthetic method of apatamide | 上海博悦生物科技有限公司 | 2022-12-30 | — | — | CN | claimed |
| US-20220275146-A1 | ALLOPHANATE BASED DISPERSING AGENT | BASF SE (DE) | 2022-09-01 | — | — | US | claimed |
| CN-114231289-A | Thin film etching solution, etching method and application thereof | TCL华星光电技术有限公司 | 2022-03-25 | — | — | CN | claimed |
| CN-114127150-A | Allophanate-based dispersants | 巴斯夫欧洲公司 | 2022-03-01 | — | — | CN | claimed |
| US-11092895-B2 | Peeling solution composition for dry film resist | LTC CO., LTD. (KR) | 2021-08-17 | — | — | US | claimed |
| CN-107924144-B | Photoresist stripper composition for manufacturing liquid crystal display | LTC有限公司 | 2020-12-29 | — | — | CN | claimed |
| US-10859917-B2 | Photoresist stripper composition for manufacturing liquid crystal display | LTC CO., LTD. (KR) | 2020-12-08 | — | — | US | claimed |
| US-20050048397-A1 | Composition and method for removing copper-compatible resist | LG.PHILIPS LCD CO., LTD. | 2005-03-03 | — | — | US | claimed |
| EP-0764048-B1 | CHROMATOGRAPHY ADSORBENTS UTILIZING MERCAPTO HETEROCYCLIC LIGANDS | BIOSEPRA INC (US) | 2003-09-24 | — | — | EP | claimed |
| US-20010014649-A1 | CHROMATOGRAPHY ADSORBENTS UTILIZING MERCAPTO HETEROCYCLIC LIGANDS | PALL CORPORATION | 2001-08-16 | — | — | US | claimed |
| EP-0764048-A4 | CHROMATOGRAPHY ADSORBENTS UTILIZING MERCAPTO HETEROCYCLIC LIGANDS | BIOSEPRA INC (US) | 1998-03-18 | — | — | EP | claimed |
| EP-0764048-A1 | CHROMATOGRAPHY ADSORBENTS UTILIZING MERCAPTO HETEROCYCLIC LIGANDS | BIOSEPRA INC. (US) | 1997-03-26 | — | — | EP | claimed |
| US-5502022-A | Chromatography adsorbents utilizing mercapto heterocyclic ligands | BIOSEPRA, INC. (US) | 1996-03-26 | — | — | US | claimed |
| WO-1995031279-A1 | CHROMATOGRAPHY ADSORBENTS UTILIZING MERCAPTO HETEROCYCLIC LIGANDS | BIOSEPRA INC. (US) | 1995-11-23 | — | — | WO | claimed |
| US-5244913-A | Gallstones, quaternaty ammonium salts | BAXTER INTERNATIONAL INC. (US) | 1993-09-14 | — | — | US | claimed |
| WO-1993012774-A1 | MICROEMULSIONS FOR GALLSTONE DISSOLUTION | BAXTER INTERNATIONAL INC. (US) | 1993-07-08 | — | — | WO | claimed |
| US-4447621-A | Use of N-cyano-N'-methyl-N\"-[2-(5-methyl-4-imidazolylmethyldithio)ethyl]guanidine in the preparation of cimetidine | SK&F LAB CO. (US) | 1984-05-08 | — | — | US | claimed |