⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL6101053 | 0.92 | — | — | |
| SCHEMBL7739749 | 0.89 | TRIM24 (0.50) | — | |
| SCHEMBL4276887 | 0.89 | — | — | |
| SCHEMBL7738689 | 0.89 | TRIM24 (0.50) | — | |
| SCHEMBL6397913 | 0.81 | — | — | |
| SCHEMBL290556 | 0.81 | — | — | |
| SCHEMBL11285608 | 0.77 | — | — | |
| SCHEMBL446594 | 0.74 | — | — | |
| SCHEMBL28649337 | 0.74 | TRIM24 (0.61) | — | |
| SCHEMBL5812857 | 0.74 | TRIM24 (0.56) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Appears in 2428 patents — a generic fragment claimed broadly, so it's down-weighted as IP noise. Top by claim status then date:
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-116867782-A | Pyrazole amide derivative | 豪夫迈·罗氏有限公司 | 2023-10-10 | — | — | CN | claimed |
| CN-108885396-B | Positive working photosensitive material | 默克专利有限公司 | 2023-03-24 | — | — | CN | claimed |
| US-20220342308-A1 | POSITIVE WORKING PHOTOSENSITIVE MATERIALS | MERCK PATENT GMBH (DE) | 2022-10-27 | — | — | US | claimed |
| CN-114651212-A | Positive photosensitive material | 默克专利股份有限公司 | 2022-06-21 | — | — | CN | claimed |
| EP-2862024-B1 | POSITIVE PHOTOSENSITIVE MATERIAL | MERCK PATENT GMBH (DE) | 2021-12-01 | — | — | EP | claimed |
| EP-3019484-B1 | THERAPEUTICALLY ACTIVE COMPOUNDS AND THEIR METHODS OF USE | LES LABORATOIRES SERVIER SAS (FR) | 2021-09-08 | — | — | EP | claimed |
| EP-3847506-A1 | POSITIVE WORKING PHOTOSENSITIVE MATERIAL | Merck Patent GmbH (DE) | 2021-07-14 | — | — | EP | claimed |
| US-10976662-B2 | Positive working photosensitive material | MERCK PATENT GMBH (DE) | 2021-04-13 | — | — | US | claimed |
| CN-112654928-A | Positive photosensitive material | 默克专利股份有限公司 | 2021-04-13 | — | — | CN | claimed |
| EP-3446180-B1 | POSITIVE WORKING PHOTOSENSITIVE MATERIAL | AZ ELECTRONIC MAT LUXEMBOURG SARL (LU) | 2020-04-01 | — | — | EP | claimed |
| US-5738975-A | MIXTURE CONTAINING (METH)ACRYLATE TERPOLYMER HAVING GROUP WHICH REACTS WITH AN ACID TO CONVERT POLARITY OF POLYMER, PHOTO ACID GENERATING COMPOUND, SOLVENT | NEC CORPORATION (JP) | 1998-04-14 | — | — | US | claimed |
| US-5691111-A | SULFONIUM SALT, ACRYLATE ESTER POLYMER | NEC CORPORATION (JP) | 1997-11-25 | — | — | US | claimed |
| EP-0645679-B1 | Resist material and pattern forming process | FUJITSU LTD (JP) | 1997-10-01 | — | — | EP | claimed |
| WO-1997033198-A1 | PHOTORESIST COMPOSITIONS COMPRISING POLYCYCLIC POLYMERS WITH ACID LABILE PENDANT GROUPS | THE B.F. GOODRICH COMPANY (US) | 1997-09-12 | — | — | WO | claimed |
| EP-0794458-A2 | An energy-sensitive resist material and a process for device fabrication using an energy-sensitive resist material | LUCENT TECHNOLOGIES INC. (US) | 1997-09-10 | — | — | EP | claimed |
| US-5665518-A | CARBOXY-SUBSTITUTED, BRIDGED CARBOCYCLIC (METH)ACRYLATE DERIVATIVE MONOMERS; TRANSPARENCY, RESOLUTION, SOLUBILITY, AND DRY-ETCHING RESISTANCE; SEMICONDUCTORS | NEC CORPORATION (JP) | 1997-09-09 | — | — | US | claimed |
| US-5635332-A | MIXTURE WITH ULTRAVIOLET TRANSPARENT POLYMER HAVING GROUPS WHICH ARE UNSTABLE TO ACID | NEC CORPORATION (JP) | 1997-06-03 | — | — | US | claimed |
| EP-0663616-A2 | Radiation sensitive material and method for forming pattern | FUJITSU LIMITED (JP) | 1995-07-19 | — | — | EP | claimed |
| EP-0645679-A1 | Resist material and pattern forming process | FUJITSU LIMITED (JP) | 1995-03-29 | — | — | EP | claimed |
| US-4529737-A | Analgesic and anti-inflammatory arylalkanoic acid phthalidyl esters and pharmaceutical compositions thereof | RESFAR S.R.I. (IT) | 1985-07-16 | — | — | US | claimed |