Known targets — ChEMBL curated mechanism
ADORA1ADORA2AADORA2BADORA3PDE3APDE3BPDE4APDE4BPDE4CPDE4D
The experimentally established mechanism targets of Ethylenediamine. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.
⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Ethylenediamine SCHEMBL28330282 | 1.00 | — | — | |
| Ethylenediamine SCHEMBL1053605 | 1.00 | NFKB1 (0.44) | — | |
| Ethylenediamine SCHEMBL2112422 | 1.00 | NFKB1 (0.44) | — | |
| Ethylenediamine SCHEMBL28876766 | 0.93 | — | — | |
| Ethylenediamine SCHEMBL28200650 | 0.93 | — | — | |
| Ethylenediamine SCHEMBL30253568 | 0.91 | — | — | |
| Ethylenediamine SCHEMBL7085968 | 0.91 | NFKB1 (0.50) | — | |
| Ethylenediamine SCHEMBL28924405 | 0.91 | NFKB1 (0.50) | — | |
| Ethylenediamine SCHEMBL3083 | 0.91 | — | — | |
| Ethylenediamine SCHEMBL37647 | 0.91 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 102 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-8313662-B2 | Methods for globally treating silica optics to reduce optical damage | LAWRENCE LIVERMORE NATIONAL SECURITY, LLC (US) | 2012-11-20 | — | — | US | claimed |
| EP-2483213-A2 | METHODS FOR GLOBALLY TREATING SILICA OPTICS TO REDUCE OPTICAL DAMAGE | Lawrence Livermore National Security, LLC (US) | 2012-08-08 | — | — | EP | claimed |
| US-20110079931-A1 | METHODS FOR GLOBALLY TREATING SILICA OPTICS TO REDUCE OPTICAL DAMAGE | LAWRENCE LIVERMORE NATIONAL SECURITY, LLC (US) | 2011-04-07 | — | — | US | claimed |
| WO-2011041188-A2 | METHODS FOR GLOBALLY TREATING SILICA OPTICS TO REDUCE OPTICAL DAMAGE | LAWRENCE LIVERMORE NATIONAL SECURITY, LLC (US) | 2011-04-07 | — | — | WO | claimed |
| EP-1124912-B1 | A CHEMICAL MECHANICAL POLISHING SLURRY SYSTEM HAVING AN ACTIVATOR SOLUTION | FUJIFILM ELECTRONIC MATERIALS (US) | 2010-07-21 | — | — | EP | claimed |
| EP-1080170-B1 | CLEANING COMPOSITION AND METHOD FOR REMOVING RESIDUES | ARCH SPEC CHEM INC (US) | 2005-10-19 | — | — | EP | claimed |
| EP-1354017-A4 | READY-TO-USE STABLE CHEMICAL-MECHANICAL POLISHING SLURRIES | PLANAR SOLUTIONS LLC (US) | 2005-09-07 | — | — | EP | claimed |
| EP-1124912-A4 | A CHEMICAL MECHANICAL POLISHING SLURRY SYSTEM HAVING AN ACTIVATOR SOLUTION | ARCH SPEC CHEM INC (US) | 2004-09-01 | — | — | EP | claimed |
| EP-1354017-A2 | READY-TO-USE STABLE CHEMICAL-MECHANICAL POLISHING SLURRIES | Planar Solutions LLC (US) | 2003-10-22 | — | — | EP | claimed |
| US-6468913-B1 | ABRASIVE PARTICLES AND AN OXIDIZING AGENT, STABILITY HAVING SHELF LIFE OF AT LEAST 30 DAYS; FUMED SILICA (SIO2) PARTICLES WITH HYDROGEN PEROXIDE (H2O2) | ARCH SPECIALTY CHEMICALS, INC. | 2002-10-22 | — | — | US | claimed |
| JP-2002515537-A | — | — | 2002-05-28 | — | — | JP | claimed |
| WO-2002004573-A2 | READY-TO-USE STABLE CHEMICAL-MECHANICAL POLISHING SLURRIES | ARCH SPECIALTY CHEMICALS, INC. (US) | 2002-01-17 | — | — | WO | claimed |
| EP-1080170-A4 | CLEANING COMPOSITION AND METHOD FOR REMOVING RESIDUES | ARCH SPEC CHEM INC (US) | 2001-10-24 | — | — | EP | claimed |
| EP-1124912-A1 | A CHEMICAL MECHANICAL POLISHING SLURRY SYSTEM HAVING AN ACTIVATOR SOLUTION | ARCH SPECIALTY CHEMICALS, INC. (US) | 2001-08-22 | — | — | EP | claimed |
| EP-1080170-A1 | CLEANING COMPOSITION AND METHOD FOR REMOVING RESIDUES | ARCH SPECIALTY CHEMICALS, INC. (US) | 2001-03-07 | — | — | EP | claimed |
| WO-2000024842-A1 | A CHEMICAL MECHANICAL POLISHING SLURRY SYSTEM HAVING AN ACTIVATOR SOLUTION | ARCH SPECIALTY CHEMICALS, INC. (US) | 2000-05-04 | — | — | WO | claimed |
| US-6030932-A | Cleaning composition and method for removing residues | OLIN MICROELECTRONIC CHEMICALS (US) | 2000-02-29 | — | — | US | claimed |
| WO-1999067056-A1 | COMPOSITION FOR THE CHEMICAL MECHANICAL POLISHING OF METAL LAYERS | ARCH SPECIALTY CHEMICALS, INC. (US) | 1999-12-29 | — | — | WO | claimed |
| WO-1999060083-A1 | CLEANING COMPOSITION AND METHOD FOR REMOVING RESIDUES | ARCH SPECIALTY CHEMICALS, INC. (US) | 1999-11-25 | — | — | WO | claimed |
| US-4921572-A | Etchant solutions containing hydrogen fluoride and a polyammonium fluoride salt | OLIN CORPORATION (US) | 1990-05-01 | — | — | US | claimed |