SCHEMBL7248403

SCHEMBL7248403

Cc1ccc(C(=NO)C(F)(F)F)c(C)c1

nearest known ligand 0.44

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
GAA P10253 3/20 0.43
ALDH1A1 P00352 2/20 0.43
ALOX15 P16050 1/20 0.43
HSD17B10 Q99714 1/20 0.43
TP53 P04637 2/20 0.38
TDP1 Q9NUW8 1/20 0.38
ALOX12 P18054 1/20 0.35
NFE2L2 Q16236 1/20 0.35
SMN1; SMN2 Q16637 5/20 0.34
HTT P42858 3/20 0.34
KMT2A Q03164 2/20 0.34
TSHR P16473 1/20 0.34
CYP1A1 P04798 1/20 0.34
CYP1B1 Q16678 1/20 0.34
LMNA P02545 2/20 0.33
NPC1 O15118 2/20 0.33
RAB9A P51151 2/20 0.33
KDM4E B2RXH2 1/20 0.33
PDK2 Q15119 1/20 0.33
HSD11B1 P28845 1/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL7248401 1.00 GAA (0.43) GAAALDH1A1ALOX15HSD17B10TP53
SCHEMBL30219413 1.00 GAA (0.43) GAAALDH1A1ALOX15HSD17B10TP53
SCHEMBL30219419 0.77 GAA (0.42) GAAALDH1A1ALOX15HSD17B10ALOX12
SCHEMBL7246688 0.77 GAA (0.42) GAAALDH1A1ALOX15HSD17B10ALOX12
SCHEMBL7246686 0.77 GAA (0.42) GAAALDH1A1ALOX15HSD17B10ALOX12
SCHEMBL4668500 0.76 ALDH1A1 (0.63) GAAALDH1A1ALOX15HSD17B10TDP1
SCHEMBL4668497 0.76 ALDH1A1 (0.63) GAAALDH1A1ALOX15HSD17B10TDP1
SCHEMBL7249033 0.75 ALDH1A1 (0.39) GAAALDH1A1ALOX15HSD17B10SMN1; SMN2
SCHEMBL7249031 0.75 ALDH1A1 (0.39) GAAALDH1A1ALOX15HSD17B10SMN1; SMN2
SCHEMBL20973136 0.73 TP53 (0.40) ALDH1A1TP53TDP1ALOX12NFE2L2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-6512020-B1 Photosensitive acid-donors in chemically amplified resist formulations. activated by irradiation with actinic electromagnetic radiation and electron beams. CIBA SPECIALTY CHEMICALS CORPORATION 2003-01-28 US disclosed
US-6261738-B1 LATENT CURING CATALYSTS FOR PHOTORESISTS SUCH AS 2,2,2-TRIFLUORO-1-PHENYL-ETHANONE OXIME-O-METHYL SULFONATE CIBA SPECIALTY CHEMICALS CORPORATION 2001-07-17 US disclosed