SCHEMBL7249169

SCHEMBL7249169

CCCCCCCCCCCCOC(=O)CC(C(=O)Oc1ccccc1)S(=O)(=O)O

nearest known ligand 0.48

Predicted protein targets (top 17)

geneUniProtsupporting neighboursconfidence
FAAH O00519 6/20 0.48
TSHR P16473 3/20 0.46
ALDH1A1 P00352 2/20 0.46
LMNA P02545 1/20 0.46
TP53 P04637 2/20 0.43
CYP3A4 P08684 1/20 0.43
MAPK1 P28482 1/20 0.43
ZDHHC2 Q9UIJ5 1/20 0.43
NPC1 O15118 1/20 0.43
RAB9A P51151 1/20 0.43
SMN1; SMN2 Q16637 1/20 0.43
RECQL P46063 1/20 0.42
NAAA Q02083 1/20 0.42
LTA4H P09960 1/20 0.41
KDM4E B2RXH2 1/20 0.41
POLB P06746 1/20 0.41
HSD17B10 Q99714 1/20 0.41

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL26127105 1.00 FAAH (0.48) FAAHTSHRALDH1A1LMNATP53
SCHEMBL4371013 0.99 FAAH (0.47) FAAHTSHRALDH1A1LMNATP53
SCHEMBL28245138 0.90 TSHR (0.46) FAAHTSHRALDH1A1LMNATP53
SCHEMBL28245771 0.90 TSHR (0.46) FAAHTSHRALDH1A1LMNATP53
SCHEMBL28245130 0.90 TSHR (0.46) FAAHTSHRALDH1A1LMNATP53
SCHEMBL28245043 0.90 TSHR (0.46) FAAHTSHRALDH1A1LMNATP53
SCHEMBL28245117 0.90 TSHR (0.46) FAAHTSHRALDH1A1LMNATP53
SCHEMBL28245044 0.90 TSHR (0.46) FAAHTSHRALDH1A1LMNATP53
SCHEMBL27638641 0.90 TSHR (0.46) FAAHTSHRALDH1A1LMNATP53
SCHEMBL28083117 0.85 RECQL (0.44) FAAHTSHRALDH1A1LMNATP53

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-6635118-B2 Aqueous cleaning of polymer apply equipment INTERNATIONAL BUSINESS MACHINES CORPORATION 2003-10-21 US disclosed
US-20020094939-A1 Aqueous cleaning of polymer apply equipment INTERNATIONAL BUSINESS MACHINES CORPORATION (US) 2002-07-18 US disclosed
US-5888308-A Process for removing residue from screening masks with alkaline solution INTERNATIONAL BUSINESS MACHINES CORPORATION (US) 1999-03-30 US disclosed