SCHEMBL725306

SCHEMBL725306

c1cc(CCCCCCc2ccncc2)ccn1

nearest known ligand 0.77

Predicted protein targets (top 17)

geneUniProtsupporting neighboursconfidence
HRH1 P35367 4/20 0.77
NAAA Q02083 1/20 0.61
LOXL2 Q9Y4K0 2/20 0.59
HRH3 Q9Y5N1 3/20 0.52
HRH4 Q9H3N8 2/20 0.52
CYP1A2 P05177 4/20 0.48
CYP3A4 P08684 4/20 0.48
CYP2D6 P10635 3/20 0.48
CYP2C9 P11712 3/20 0.48
CYP2C19 P33261 3/20 0.48
ALDH1A1 P00352 1/20 0.48
HSD17B10 Q99714 1/20 0.48
TDP1 Q9NUW8 1/20 0.46
L3MBTL1 Q9Y468 1/20 0.46
HIF1A Q16665 1/20 0.45
NPC1 O15118 1/20 0.44
KMT2A Q03164 1/20 0.44

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL4413800 1.00 HRH1 (0.77) HRH1NAAALOXL2HRH3HRH4
SCHEMBL2841394 1.00 HRH1 (0.77) HRH1NAAALOXL2HRH3HRH4
SCHEMBL726645 0.97 HRH1 (0.73) HRH1NAAALOXL2HRH3HRH4
SCHEMBL351920 0.91 HRH1 (0.65) HRH1NAAALOXL2HRH3HRH4
SCHEMBL9587455 0.90 HRH1 (0.65) HRH1NAAACYP1A2CYP3A4CYP2D6
SCHEMBL12040597 0.90 HRH1 (0.65) HRH1NAAACYP1A2CYP3A4CYP2D6
SCHEMBL9588693 0.90 HRH1 (0.65) HRH1NAAACYP1A2CYP3A4CYP2D6
SCHEMBL31673871 0.88 HRH1 (0.62) HRH1NAAALOXL2HRH3HRH4
SCHEMBL28055322 0.88 HRH1 (0.62) HRH1NAAALOXL2HRH3HRH4
SCHEMBL25379522 0.88 HRH1 (0.63) HRH1NAAALOXL2CYP3A4ALDH1A1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 30 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-11697884-B2 Copper deposition in wafer level packaging of integrated circuits MACDERMID ENTHONE INC. (US) 2023-07-11 US disclosed
CN-114420633-A Copper deposition in wafer level packaging of integrated circuits 麦克德米德乐思公司 2022-04-29 CN disclosed
US-20210388519-A1 Copper Deposition in Wafer Level Packaging of Integrated Circuits MACDERMID ENTHONE INC. 2021-12-16 US disclosed
US-11124888-B2 Copper deposition in wafer level packaging of integrated circuits MACDERMID ENTHONE INC. (US) 2021-09-21 US disclosed
EP-3504186-A1 COPPER DEPOSITION IN WAFER LEVEL PACKAGING OF INTEGRATED CIRCUITS MacDermid Enthone Inc. (US) 2019-07-03 EP disclosed
US-10221496-B2 Copper filling of through silicon vias MACDERMID ENTHONE INC. (US) 2019-03-05 US disclosed
US-20190003068-A9 COPPER FILLING OF THROUGH SILICON VIAS ENTHONE INC. (US) 2019-01-03 US disclosed
US-20180355502-A1 PROCESS FOR METALIZATION OF COPPER PILLARS IN THE MANUFACTURE OF MICROELECTRONICS CITIBANK, N.A. 2018-12-13 US disclosed
WO-2018226988-A1 PROCESS FOR FILLING VIAS IN THE MANUFACTURE OF MICROELECTRONICS MACDERMID ENTHONE INC. (US) 2018-12-13 WO disclosed
US-10103029-B2 Process for filling vias in the microelectronics MACDERMID ENTHONE INC. (US) 2018-10-16 US disclosed
US-20130199935-A1 COPPER FILLING OF THROUGH SILICON VIAS ENTHONE INC. (US) 2013-08-08 US disclosed
US-8388824-B2 Method and composition for electrodeposition of copper in microelectronics with dipyridyl-based levelers ENTHONE INC. (US) 2013-03-05 US disclosed
WO-2012103357-A1 PROCESS FOR FILLING VIAS IN THE MICROELECTRONICS ENTHONE INC. (US) 2012-08-02 WO disclosed
WO-2011149965-A2 COPPER FILLING OF THROUGH SILICON VIAS ENTHONE INC. (US) 2011-12-01 WO disclosed
EP-2358926-A2 ELECTRODEPOSITION OF COPPER IN MICROELECTRONICS WITH DIPYRIDYL-BASED LEVELERS Enthone, Inc. (US) 2011-08-24 EP disclosed
WO-2010062822-A2 ELECTRODEPOSITION OF COPPER IN MICROELECTRONICS WITH DIPYRIDYL-BASED LEVELERS ENTHONE INC. (US) 2010-06-03 WO disclosed
US-20100126872-A1 ELECTRODEPOSITION OF COPPER IN MICROELECTRONICS WITH DIPYRIDYL-BASED LEVELERS ENTHONE, INC. (US) 2010-05-27 US disclosed
EP-0676437-B1 USE OF POLYCATIONIC POLYMER AS BACTERICIDAL/ALGICIDAL AGENT SAGAMI CHEM RES (JP) 1999-09-08 EP disclosed
US-5616317-A HETEROCYCLIC NITROGEN POLYMER SAGAMI CHEMICAL RESEARCH CENTER (JP) 1997-04-01 US disclosed
EP-0676437-A1 POLYCATIONIC POLYMER AND POLYCATIONIC BACTERICIDAL/ALGICIDAL AGENT SAGAMI CHEMICAL RESEARCH CENTER (JP) 1995-10-11 EP disclosed