Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | TSHR | P16473 | 3/20 | 0.44 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.41 |
| ▸ | MAPT | P10636 | 1/20 | 0.37 |
| ▸ | CACNA1B | Q00975 | 1/20 | 0.37 |
| ▸ | APBA1 | Q02410 | 1/20 | 0.37 |
| ▸ | ALDH1A1 | P00352 | 7/20 | 0.36 |
| ▸ | GAA | P10253 | 2/20 | 0.36 |
| ▸ | SMN1; SMN2 | Q16637 | 2/20 | 0.35 |
| ▸ | CYP3A4 | P08684 | 1/20 | 0.35 |
| ▸ | NPSR1 | Q6W5P4 | 2/20 | 0.35 |
| ▸ | PKM | P14618 | 1/20 | 0.34 |
| ▸ | L3MBTL1 | Q9Y468 | 1/20 | 0.33 |
| ▸ | MGAM | O43451 | 1/20 | 0.32 |
| ▸ | SI | P14410 | 1/20 | 0.32 |
| ▸ | MGAM2 | Q2M2H8 | 1/20 | 0.32 |
| ▸ | LMNA | P02545 | 1/20 | 0.32 |
| ▸ | EPHX2 | P34913 | 1/20 | 0.31 |
| ▸ | MEN1 | O00255 | 1/20 | 0.31 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.31 |
| ▸ | NPC1 | O15118 | 1/20 | 0.31 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL11667698 | 0.81 | TSHR (0.42) | TSHRTDP1MAPTCACNA1BAPBA1 | |
| SCHEMBL11667701 | 0.81 | TSHR (0.42) | TSHRTDP1MAPTCACNA1BAPBA1 | |
| SCHEMBL9513 | 0.79 | TSHR (0.50) | TSHRTDP1MAPTCACNA1BAPBA1 | |
| SCHEMBL57069 | 0.79 | TSHR (0.52) | TSHRTDP1MAPTCACNA1BAPBA1 | |
| SCHEMBL1616122 | 0.78 | TSHR (0.48) | TSHRTDP1MAPTCACNA1BAPBA1 | |
| SCHEMBL2221470 | 0.78 | TSHR (0.48) | TSHRTDP1MAPTCACNA1BAPBA1 | |
| Acetone SCHEMBL28861611 | 0.78 | TSHR (0.48) | TSHRTDP1MAPTCACNA1BAPBA1 | |
| SCHEMBL5702374 | 0.78 | TSHR (0.48) | TSHRTDP1MAPTCACNA1BAPBA1 | |
| SCHEMBL5134550 | 0.78 | TSHR (0.48) | TSHRTDP1MAPTCACNA1BAPBA1 | |
| SCHEMBL4195402 | 0.78 | TSHR (0.48) | TSHRTDP1MAPTCACNA1BAPBA1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 36 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| WO-2024128086-A1 | CURABLE COMPOSITION, LAMINATE, AND METHOD FOR PRODUCING LAMINATE | 富士フイルム株式会社 | 2024-06-20 | — | — | WO | disclosed |
| US-9389505-B2 | Polymerizable composition for solder resist, and solder resist pattern formation method | FUJIFILM CORPORATION (JP) | 2016-07-12 | — | — | US | disclosed |
| CN-102741751-B | Photosensitive composition, photosensitive film, photosensitive laminate, method for forming permanent pattern, and printed wiring board | FUJIFILM CORP | 2014-07-16 | — | — | CN | disclosed |
| US-8557948-B2 | Photosensitive composition, photosensitive film, photosensitive laminate, method of forming a permanent pattern, and printed board | FUJIFILM CORPORATION (JP) | 2013-10-15 | — | — | US | disclosed |
| US-20130034812-A1 | POLYMERIZABLE COMPOSITION FOR SOLDER RESIST, AND SOLDER RESIST PATTERN FORMATION METHOD | FUJIFILM CORPORATION (JP) | 2013-02-07 | — | — | US | disclosed |
| EP-2530523-A1 | POLYMERIZABLE COMPOSITION FOR SOLDER RESIST, AND SOLDER RESIST PATTERN FORMATION METHOD | FUJIFILM Corporation (JP) | 2012-12-05 | — | — | EP | disclosed |
| US-20120282549-A1 | PHOTOSENSITIVE COMPOSITION, PHOTOSENSITIVE FILM, PHOTOSENSITIVE LAMINATE, METHOD FOR FORMING PERMANENT PATTERN, AND PRINTED BOARD | FUJIFILM CORPORATION (JP) | 2012-11-08 | — | — | US | disclosed |
| CN-102741751-A | Photosensitive composition, photosensitive film, photosensitive laminate, method for forming permanent pattern, and printed wiring board | FUJIFILM CORP | 2012-10-17 | — | — | CN | disclosed |
| EP-2498130-A2 | Curable composition for solid-state imaging device, and photosensitive layer, permanent pattern, wafer-level lens, solid-state imaging device and pattern forming method each using the composition | Fujifilm Corporation (JP) | 2012-09-12 | — | — | EP | disclosed |
| US-20120183776-A1 | CURABLE COMPOSITION, CURABLE FILM, CURABLE LAMINATE, METHOD FOR FORMING A PERMANENT PATTERN, AND PRINTED SUBSTRATE | FUJIFILM CORPORATION (JP) | 2012-07-19 | — | — | US | disclosed |
| CN-101149562-A | Photosensitive composition, photosensitive film, permanent pattern forming method and printing circuit board | FUJIFILM CORP (JP) | 2008-03-26 | — | — | CN | disclosed |
| CN-101116035-A | Photosensitive composition, method for forming pattern, and permanent pattern | FUJI PHOTO FILM CO LTD (JP) | 2008-01-30 | — | — | CN | disclosed |
| CN-101107565-A | Pattern forming material, pattern forming apparatus and permanent pattern forming method | FUJI PHOTO FILM CO LTD (JP) | 2008-01-16 | — | — | CN | disclosed |
| CN-101084470-A | Material for pattern formation, apparatus for pattern formation, and method for pattern formation | FUJI PHOTO FILM CO LTD (JP) | 2007-12-05 | — | — | CN | disclosed |
| EP-1780599-A1 | PHOTOSENSITIVE COMPOSITION, PATTERN FORMING MATERIAL, PHOTOSENSITIVE LAMINATE, PATTERN FORMING APPARATUS AND METHOD OF PATTERN FORMATION | FUJIFILM Corporation (JP) | 2007-05-02 | — | — | EP | disclosed |
| WO-2005093793-A1 | PROCESS FOR FORMING PERMANENT PATTERN | FUJI PHOTO FILM CO., LTD. (JP) | 2005-10-06 | — | — | WO | disclosed |
| EP-0600262-B1 | Aqueous processable, multilayer photoimageable permanent coatings for printed circuits | DU PONT (US) | 1999-04-21 | — | — | EP | disclosed |
| US-5405731-A | Hydrophobic binder and addition polymer in protective layer with photoimageable coating containing carboxylic and unsaturated comonomers, photoinitiator and thermal crosslinking agent, for resistance to molten solder | E. I. DU PONT DE NEMOURS AND COMPANY (US) | 1995-04-11 | — | — | US | disclosed |
| EP-0600262-A2 | Aqueous processable, multilayer photoimageable permanent coatings for printed circuits | E.I. DU PONT DE NEMOURS AND COMPANY (US) | 1994-06-08 | — | — | EP | disclosed |
| US-5288589-A | Storage stability | E.I. DU PONT DE NEMOURS AND COMPANY | 1994-02-22 | — | — | US | disclosed |