SCHEMBL7263293

SCHEMBL7263293

CC(C)(C)C(=O)OCc1c2ccccc2cc2ccccc12

nearest known ligand 0.50

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
EPHX1 P07099 1/20 0.50
ALDH1A1 P00352 5/20 0.48
KDM4E B2RXH2 4/20 0.48
GLA P06280 2/20 0.48
L3MBTL1 Q9Y468 2/20 0.42
HTR2A P28223 1/20 0.42
NPC1 O15118 1/20 0.42
TACR1 P25103 1/20 0.41
MEN1 O00255 4/20 0.41
KMT2A Q03164 4/20 0.41
HPGD P15428 4/20 0.41
CYP1A2 P05177 1/20 0.41
CYP2C19 P33261 1/20 0.41
HSD17B10 Q99714 1/20 0.41
MAPT P10636 3/20 0.40
RECQL P46063 2/20 0.40
GBA1 P04062 1/20 0.40
POLB P06746 2/20 0.40
GPR35 Q9HC97 2/20 0.40
GAA P10253 2/20 0.39

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL14863734 0.89 EPHX1 (0.49) EPHX1ALDH1A1KDM4EGLAL3MBTL1
SCHEMBL13814122 0.88 EPHX1 (0.48) EPHX1ALDH1A1KDM4EGLAL3MBTL1
SCHEMBL12128718 0.88 EPHX1 (0.48) EPHX1ALDH1A1KDM4EGLAL3MBTL1
SCHEMBL2735484 0.86 EPHX1 (0.47) EPHX1ALDH1A1KDM4EGLAL3MBTL1
SCHEMBL20609465 0.86 EPHX1 (0.47) EPHX1ALDH1A1KDM4EGLAL3MBTL1
SCHEMBL25473178 0.85 EPHX1 (0.46) EPHX1ALDH1A1KDM4EGLAL3MBTL1
SCHEMBL12133800 0.84 EPHX1 (0.50) EPHX1ALDH1A1KDM4EGLAL3MBTL1
SCHEMBL13749702 0.83 EPHX1 (0.44) EPHX1ALDH1A1KDM4EGLAL3MBTL1
SCHEMBL25470360 0.83 EPHX1 (0.44) EPHX1ALDH1A1KDM4EGLAL3MBTL1
SCHEMBL15356651 0.83 EPHX1 (0.44) EPHX1ALDH1A1KDM4EGLANPC1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20230203229-A1 COMPOSITION, UNDERLAYER FILM, AND DIRECTED SELF-ASSEMBLY LITHOGRAPHY PROCESS JSR CORPORATION (JP) 2023-06-29 US disclosed
US-6656660-B1 Resist composition SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2003-12-02 US disclosed
EP-1024406-A1 Resist composition WAKO PURE CHEMICAL INDUSTRIES LTD (JP) 2000-08-02 EP disclosed