Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | EPHX1 | P07099 | 1/20 | 0.47 |
| ▸ | RIPK1 | Q13546 | 1/20 | 0.41 |
| ▸ | TACR1 | P25103 | 1/20 | 0.39 |
| ▸ | L3MBTL1 | Q9Y468 | 2/20 | 0.39 |
| ▸ | HTR2A | P28223 | 1/20 | 0.39 |
| ▸ | NPC1 | O15118 | 1/20 | 0.38 |
| ▸ | ALDH1A1 | P00352 | 4/20 | 0.38 |
| ▸ | KDM4E | B2RXH2 | 4/20 | 0.38 |
| ▸ | MEN1 | O00255 | 3/20 | 0.38 |
| ▸ | HPGD | P15428 | 3/20 | 0.38 |
| ▸ | KMT2A | Q03164 | 3/20 | 0.38 |
| ▸ | GLA | P06280 | 2/20 | 0.38 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.38 |
| ▸ | CYP1A2 | P05177 | 1/20 | 0.38 |
| ▸ | CYP2C19 | P33261 | 1/20 | 0.38 |
| ▸ | HSD17B10 | Q99714 | 1/20 | 0.38 |
| ▸ | POLB | P06746 | 1/20 | 0.37 |
| ▸ | GPR35 | Q9HC97 | 1/20 | 0.37 |
| ▸ | MAPT | P10636 | 1/20 | 0.36 |
| ▸ | EDNRA | P25101 | 1/20 | 0.36 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL20609465 | 0.88 | EPHX1 (0.47) | EPHX1TACR1L3MBTL1HTR2ANPC1 | |
| SCHEMBL7263293 | 0.86 | EPHX1 (0.50) | EPHX1TACR1L3MBTL1HTR2ANPC1 | |
| SCHEMBL14863734 | 0.85 | EPHX1 (0.49) | EPHX1TACR1L3MBTL1HTR2ANPC1 | |
| SCHEMBL15356651 | 0.85 | EPHX1 (0.44) | EPHX1TACR1NPC1ALDH1A1KDM4E | |
| SCHEMBL12128718 | 0.84 | EPHX1 (0.48) | EPHX1TACR1L3MBTL1HTR2ANPC1 | |
| SCHEMBL13814122 | 0.84 | EPHX1 (0.48) | EPHX1TACR1L3MBTL1HTR2ANPC1 | |
| SCHEMBL13592565 | 0.82 | EPHX1 (0.38) | EPHX1RIPK1TACR1L3MBTL1HTR2A | |
| SCHEMBL13292523 | 0.82 | MTNR1A (0.42) | EPHX1RIPK1ALDH1A1KDM4EMEN1 | |
| SCHEMBL15356656 | 0.81 | EPHX1 (0.42) | EPHX1TACR1L3MBTL1HTR2ANPC1 | |
| SCHEMBL25473178 | 0.81 | EPHX1 (0.46) | EPHX1TACR1L3MBTL1HTR2ANPC1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 62 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20240219834-A1 | METHOD FOR FORMING A RESIST PATTERN | NISSAN CHEMICAL CORPORATION (JP) | 2024-07-04 | — | — | US | disclosed |
| US-20240219834-A1 | METHOD FOR FORMING A RESIST PATTERN | NISSAN CHEMICAL CORPORATION (JP) | 2024-07-04 | — | — | US | disclosed |
| US-20230242467-A1 | HIGH PURITY 4-HYDROXYSTYRENE SOLUTION, METHOD OF PRODUCING THE SAME, AND METHOD OF PRODUCING 4-HYDROXYSTYRENE POLYMER | MARUZEN PETROCHEMICAL CO., LTD. (JP) | 2023-08-03 | — | — | US | disclosed |
| US-11675269-B2 | Composition for forming resist overlayer film for EUV lithography | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2023-06-13 | — | — | US | disclosed |
| US-20230131253-A1 | RESIST UNDERLAYER FILM-FORMING COMPOSITION WITH SUPPRESSED DEGENERATION OF CROSSLINKING AGENT | NISSAN CHEMICAL CORPORATION (JP) | 2023-04-27 | — | — | US | disclosed |
| US-20180081274-A1 | CATIONICALLY POLYMERIZABLE RESIST UNDERLAYER FILM-FORMING COMPOSITION | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2018-03-22 | — | — | US | disclosed |
| US-9805943-B2 | Polymer for resist under layer film composition, resist under layer film composition, and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2017-10-31 | — | — | US | disclosed |
| US-9546133-B2 | Method for producing copolymer for semiconductor lithography containing reduced amount of metal impurities, and method for purifying polymerization initiator for production of copolymer | MARUZEN PETROCHEMICAL CO., LTD. (JP) | 2017-01-17 | — | — | US | disclosed |
| US-9465290-B2 | Near-infrared absorbing film compositions | GLOBALFOUNDRIES INC. (KY) | 2016-10-11 | — | — | US | disclosed |
| US-20160284559-A1 | POLYMER FOR RESIST UNDER LAYER FILM COMPOSITION, RESIST UNDER LAYER FILM COMPOSITION, AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2016-09-29 | — | — | US | disclosed |
| US-20090311624-A1 | RESIST UNDERLAYER FILM FORMING COMPOSITION CONTAINING LIQUID ADDITIVE | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2009-12-17 | — | — | US | disclosed |
| US-20090306328-A1 | COPOLYMER FOR SEMICONDUCTOR LITHOGRAPHY AND PROCESS FOR PRODUCING THE SAME | MARUZEN PETROCHEMICAL CO., LTD. (JP) | 2009-12-10 | — | — | US | disclosed |
| US-20090280435-A1 | Antireflective coating composition | MERCK PATENT GMBH (DE) | 2009-11-12 | — | — | US | disclosed |
| US-20090253076-A1 | Coating-type underlayer coating forming composition for lithography containing vinylnaphthalene resin derivative | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2009-10-08 | — | — | US | disclosed |
| US-7425399-B2 | Composition for forming anti-reflective coating for use in lithography | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2008-09-16 | — | — | US | disclosed |
| US-20080206680-A1 | Composition for forming anti-reflective coating for use in lithography | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2008-08-28 | — | — | US | disclosed |
| US-20080138744-A1 | Anti-Reflective Coating Forming Composition Containing Vinyl Ether Compound | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2008-06-12 | — | — | US | disclosed |
| US-20080102649-A1 | Underlayer Coating Forming Composition For Lythography Containing Compound Having Protected Carboxyl Group | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2008-05-01 | — | — | US | disclosed |
| US-20070238029-A1 | Underlayer Coating Forming Composition for Lithography Containing Naphthalene Ring Having Halogen Atom | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2007-10-11 | — | — | US | disclosed |
| US-7226721-B2 | Underlayer coating forming composition for lithography containing compound having protected carboxyl group | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2007-06-05 | — | — | US | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20230242467-A1 | HIGH PURITY 4-HYDROXYSTYRENE SOLUTION, METHOD OF PRODUCING THE SAME, AND METHOD OF PRODUCING 4-HYDROXYSTYRENE POLYMER | HAAO, HPD, IL4 | EPHX1 267/4885RIPK1 4116/4885TACR1 685/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.