SCHEMBL7265193

SCHEMBL7265193

C=C(C)C(=O)OCC[CH]C

nearest known ligand 0.53

Predicted protein targets (top 15)

geneUniProtsupporting neighboursconfidence
THRB P10828 1/20 0.53
TSHR P16473 3/20 0.52
ALDH1A1 P00352 3/20 0.50
POLB P06746 1/20 0.39
APEX1 P27695 1/20 0.39
HTT P42858 1/20 0.39
TDP1 Q9NUW8 1/20 0.39
CA1 P00915 1/20 0.34
CA2 P00918 1/20 0.34
ALOX15 P16050 1/20 0.32
CYP2D6 P10635 1/20 0.31
CYP2C19 P33261 1/20 0.31
CHRM5 P08912 1/20 0.30
CHRM1 P11229 1/20 0.30
CHRM3 P20309 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL27724501 0.86 TSHR (0.61) THRBTSHRALDH1A1POLBAPEX1
SCHEMBL5686543 0.84 TSHR (0.65) THRBTSHRALDH1A1POLBAPEX1
SCHEMBL673335 0.83 THRB (0.50) THRBTSHRALDH1A1POLBAPEX1
SCHEMBL809330 0.83 THRB (0.53) THRBTSHRALDH1A1POLBAPEX1
SCHEMBL1171477 0.83 TSHR (0.57) THRBTSHRALDH1A1POLBAPEX1
SCHEMBL2063995 0.83 THRB (0.53) THRBTSHRALDH1A1POLBAPEX1
Propene SCHEMBL156576 0.82 THRB (0.63) THRBTSHRALDH1A1POLBAPEX1
Propene SCHEMBL8851515 0.82 THRB (0.63) THRBTSHRALDH1A1POLBAPEX1
Propene SCHEMBL11112032 0.82 THRB (0.63) THRBTSHRALDH1A1POLBAPEX1
Propene SCHEMBL672400 0.82 THRB (0.63) THRBTSHRALDH1A1POLBAPEX1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 11 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-2875833-B1 Anti-thrombogenic medical devices and methods COVIDIEN LP (US) 2018-08-08 EP claimed
EP-2602244-B1 (Meth) Acrylic acid ester, activation energy ray curing composition, and inkjet recording ink RICOH CO LTD (JP) 2017-07-26 EP disclosed
CN-102967970-B The manufacture method of array base palte, liquid crystal display cells and array base palte JSR CO., LTD. (JP) 2016-05-25 CN disclosed
EP-2602244-A1 (Meth) Acrylic acid ester, activation energy ray curing composition, and inkjet recording ink Ricoh Company, Ltd. (JP) 2013-06-12 EP disclosed
CN-101359174-B Radiation-sensitive resin composition, layer insulation film and microlens and manufacture method thereof JSR CORP 2012-11-28 CN disclosed
CN-102243386-A Liquid crystal display device, positive radiation-sensitive composition, interlayer insulating film for liquid crystal display device and method for forming the same JSR CORP 2011-11-16 CN disclosed
CN-102221781-A Positive radiation sensitive composition, interlayer insulation film and forming method thereof JSR CORP 2011-10-19 CN disclosed
CN-102221782-A Positive radiation sensitive composition, interlayer insulation film and forming method thereof JSR CORP 2011-10-19 CN disclosed
CN-101359174-A Radiation-sensitive resin composition, layer insulation film and microlens and manufacture method thereof JSR CORP (JP) 2009-02-04 CN disclosed
US-6649416-B1 Comprising fluid-permeable, signal enhancing, porous, textured substrate with open pores; generates optical response when subjected to excitation light energy; enhanced responsivity and selectivity TRUSTEES OF TUFTS COLLEGE 2003-11-18 US disclosed
US-5811565-A TREATING MIXTURE WITH LEWIS ACID HALIDE DOW CORNING TORAY SILICONE CO., LTD. (JP) 1998-09-22 US disclosed