⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL5697648 | 0.85 | OPRM1 (0.32) | — | |
| SCHEMBL580060 | 0.82 | — | — | |
| SCHEMBL1195620 | 0.79 | — | — | |
| SCHEMBL396769 | 0.78 | — | — | |
| SCHEMBL394788 | 0.74 | — | — | |
| SCHEMBL3476794 | 0.70 | CA1 (0.32) | — | |
| SCHEMBL140172 | 0.69 | — | — | |
| SCHEMBL8372327 | 0.69 | TSHR (0.31) | — | |
| SCHEMBL28058809 | 0.69 | TSHR (0.31) | — | |
| SCHEMBL17937712 | 0.67 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-6653043-B1 | Mixtures of photoresists, sensitizers and active materials such as silica sol modified by resorcin coupled to silanes, used to improve sensitivity and resolution | KANSAI RESEARCH INSTITUTE, INC. (JP) | 2003-11-25 | — | — | US | disclosed |
| EP-1096313-A1 | Active particle, photosensitive resin composition, and process for forming pattern | Kansai Research Institute, Inc. (JP) | 2001-05-02 | — | — | EP | disclosed |