SCHEMBL728071

SCHEMBL728071

Nc1cccccc1=O

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL29291854 0.97 ALOX15 (0.50)
SCHEMBL727785 0.78 HSD17B10 (0.52)
SCHEMBL22003326 0.75 CYP3A4 (0.91)
Benzene SCHEMBL732720 0.75 CYP3A4 (0.91)
SCHEMBL11442581 0.75 DBH (0.56)
SCHEMBL11664208 0.73 CYP3A4 (0.60)
Hydrogen Peroxide SCHEMBL5481727 0.72 CYP3A4 (0.83)
Hydrogen Peroxide SCHEMBL296759 0.72 CYP3A4 (0.83)
SCHEMBL6187 0.71
SCHEMBL29351116 0.71

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 43 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
JP-64003172-A None JP disclosed
US-20260091612-A1 PRINTING INTAGLIO PLATE AND PRODUCTION METHOD THEREOF, AND PRINTING METHOD ASAHI KASEI KABUSHIKI KAISHA (JP) 2026-04-02 US disclosed
EP-4631736-A1 PRINTING INTAGLIO PLATE AND PRODUCTION METHOD THEREFOR, AND PRINTING METHOD Asahi Kasei Kabushiki Kaisha (JP) 2025-10-15 EP disclosed
WO-2024122603-A1 PRINTING INTAGLIO PLATE AND PRODUCTION METHOD THEREFOR, AND PRINTING METHOD 旭化成株式会社 2024-06-13 WO disclosed
US-10980754-B2 Anti-fungal compounds SAINT LOUIS UNIVERSITY (US) 2021-04-20 US disclosed
US-20190099385-A1 ANTI-FUNGAL COMPOUNDS SAINT LOUIS UNIVERSITY (US) 2019-04-04 US disclosed
WO-2017184752-A1 ANTI-FUNGAL COMPOUNDS SAINT LOUIS UNIVERSITY (US) 2017-10-26 WO disclosed
CN-101553549-B Photobase generator and photocurable resin composition ASAHI KASEI E MATERIALS CORP (JP) 2013-02-20 CN disclosed
US-8137892-B2 Photobase generator and photocurable resin composition ASAHI KASEI CHEMICALS CORPORATION (JP) 2012-03-20 US disclosed
JP-2010254593-A METHOD FOR PRODUCING 2-AMINOTROPONE DERIVATIVE ASAHI KASEI E-MATERIALS CORP 2010-11-11 JP disclosed
US-4739083-A REACTING 1,3-DIOXAN-4-ONE WITH (AMINE OR IMINE) SUBSTITUTED AMIDE DAICEL CHEMICAL INDUSTRIES LTD. (JP) 1988-04-19 US disclosed
US-4563453-A ANTIINFLAMMATORY, ANALGESIC FUJISAWA PHARMACEUTICAL CO., LTD. (JP) 1986-01-07 US disclosed
US-4540692-A Anti-inflammatory N-(1-oxo-2,4,6-cycloheptatrienyl)2H-1,2-benzothiazine-3-carboxamide 1,1-dioxide derivatives, compositions, and method of use FUJISAWA PHARMACEUTICAL CO., LTD. (JP) 1985-09-10 US disclosed
EP-0138223-A2 Thiazine derivatives, processes for preparation thereof and pharmaceutical conmposition comprising the same FUJISAWA PHARMACEUTICAL CO., LTD. (JP) 1985-04-24 EP disclosed
EP-0126894-A1 Tropone derivatives, processes for preparation thereof and pharmaceutical composition comprising the same FUJISAWA PHARMACEUTICAL CO., LTD. (JP) 1984-12-05 EP disclosed
US-4381304-A 4,9-Dihydro-4,9-dioxo-1H-cyclohepta[b]pyridine derivatives AYERST, MCKENNA & HARRISON, INC. (CA) 1983-04-26 US disclosed
US-4337265-A COMPLICATIONS OF DIABETES AYERST, MCKENNA & HARRISON INC. (CA) 1982-06-29 US disclosed
US-4183955-A Troponyl-oxamic acid derivatives for treating allergic conditions Ayerst. McKenna & Harrison Limited (CA) 1980-01-15 US disclosed
US-4125625-A ANTIALLERGENS AYERST, MCKENNA & HARRISON LIMITED (CA) 1978-11-14 US disclosed
US-4057556-A ANTIALLERGENS AYERST, MCKENNA & HARRISON LTD. (CA) 1977-11-08 US disclosed