SCHEMBL729470

SCHEMBL729470

O=C(O)CN(CCN(CC(=O)O)C(P(=O)(O)O)P(=O)(O)O)C(P(=O)(O)O)P(=O)(O)O

nearest known ligand 0.50

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
FDPS P14324 2/20 0.50
TDP1 Q9NUW8 3/20 0.39
BLM P54132 3/20 0.39
LMNA P02545 2/20 0.39
TSHR P16473 2/20 0.39
MEN1 O00255 1/20 0.39
HPGD P15428 1/20 0.39
KMT2A Q03164 1/20 0.39
EYA2 O00167 1/20 0.39
APP P05067 1/20 0.39
ACE P12821 1/20 0.39
PMP22 Q01453 2/20 0.37
KDM4E B2RXH2 1/20 0.37
CHRM2 P08172 1/20 0.37
ADRA2A P08913 1/20 0.37
ALOX15 P16050 1/20 0.37
DRD1 P21728 1/20 0.37
SLC6A2 P23975 1/20 0.37
SLC6A4 P31645 1/20 0.37
CYP2C19 P33261 1/20 0.37

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL8594922 0.91 FDPS (0.52) FDPSTDP1BLMLMNATSHR
SCHEMBL6428955 0.90 TDP1 (0.52) FDPSTDP1BLMLMNATSHR
Nitrilotriacetic Acid SCHEMBL2786138 0.81 FDPS (0.46) FDPSTDP1BLMLMNATSHR
Pentetic Acid SCHEMBL11176016 0.78 TDP1 (0.50) FDPSTDP1BLMLMNATSHR
SCHEMBL11306537 0.77 FDPS (0.56) FDPSTDP1BLMLMNATSHR
SCHEMBL635134 0.76 TDP1 (0.42) FDPSTDP1BLMLMNATSHR
SCHEMBL3838114 0.73 TDP1 (0.39) FDPSTDP1BLMLMNATSHR
SCHEMBL407450 0.72 TDP1 (0.50) TDP1BLMLMNATSHRMEN1
Pentetic Acid SCHEMBL9551876 0.72 TDP1 (0.60) FDPSTDP1BLMLMNATSHR
SCHEMBL12231173 0.72 TDP1 (0.54) FDPSTDP1BLMLMNATSHR

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 72 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-9150758-B2 Polishing composition, polishing method using same, and method for producing semiconductor device FUJIMI INCORPORATED (JP) 2015-10-06 US claimed
US-20140141612-A1 POLISHING COMPOSITION, POLISHING METHOD USING SAME, AND METHOD FOR PRODUCING SEMICONDUCTOR DEVICE FUJIMI CORPORATION 2014-05-22 US claimed
EP-2693460-A1 POLISHING COMPOSITION, POLISHING METHOD USING SAME, AND METHOD FOR PRODUCING SEMICONDUCTOR DEVICE Fujimi Incorporated (JP) 2014-02-05 EP claimed
US-4285575-A USING AN ELECTROCHROMIC ELECTROLYTE CONTAINING A CARBOXYLIC-CONTAINING COMPLEXING AGENT, A FERROUS SALT, A METAL SALT, AND A CHROMOGEN; DURABILITY CANON KABUSHIKI KAISHA (JP) 1981-08-25 US claimed
US-4212518-A ELECTROCHROMIC CELL CANON KABUSHIKI KAISHA (JP) 1980-07-15 US claimed
US-4073700-A FROM GOLD CYANIDE IN THE PRESENCE OF A CHELATING AGENT WEISBERG ALFRED M 1978-02-14 US claimed
EP-3437730-B1 METHOD FOR MANUFACTURING WATER ABSORBING AGENT NIPPON CATALYTIC CHEM IND (JP) 2024-04-17 EP disclosed
EP-3056268-B1 PARTICULATE WATER ABSORBER COMPRISING WATER-ABSORBING RESIN AS MAIN COMPONENT AND PROCESS FOR MANUFACTURING SAME NIPPON CATALYTIC CHEM IND (JP) 2023-03-22 EP disclosed
US-20220387971-A1 PARTICULATE WATER-ABSORBING AGENT AND METHOD FOR PRODUCING THE SAME NIPPON SHOKUBAI CO., LTD. (JP) 2022-12-08 US disclosed
EP-3437732-B1 PARTICULATE WATER ABSORBING AGENT NIPPON CATALYTIC CHEM IND (JP) 2022-05-11 EP disclosed
US-11224857-B2 Method for manufacturing water absorbing agent NIPPON SHOKUBAI CO., LTD. (JP) 2022-01-18 US disclosed
US-10696895-B2 Acrylic acid crosslinked polymer and use thereof NIPPON SHOKUBAI CO., LTD. (JP) 2020-06-30 US disclosed
US-10562006-B2 Particulate water absorbing agent NIPPON SHOKUBAI CO., LTD. (JP) 2020-02-18 US disclosed
US-20090270538-A1 PARTICULATE WATER-ABSORBENT POLYMER AND PRODUCTION METHOD THEREOF NIPPON SHOKUBAI CO., LTD. (JP) 2009-10-29 US disclosed
EP-2112172-A1 PARTICULATE WATER-ABSORBENT POLYMER AND PROCESS FOR PRODUCTION THEREOF Nippon Shokubai Co., Ltd. (JP) 2009-10-28 EP disclosed
EP-0759482-B1 Electroplating process MEC CO LTD (JP) 2001-06-13 EP disclosed
EP-0759482-A1 Electroplating process MEC CO., Ltd. (JP) 1997-02-26 EP disclosed
EP-0553820-A2 Composition and test strip for measuring peroxidatively active substances EIKEN KAGAKU KABUSHIKI KAISHA (JP) 1993-08-04 EP disclosed
US-4285575-A USING AN ELECTROCHROMIC ELECTROLYTE CONTAINING A CARBOXYLIC-CONTAINING COMPLEXING AGENT, A FERROUS SALT, A METAL SALT, AND A CHROMOGEN; DURABILITY CANON KABUSHIKI KAISHA (JP) 1981-08-25 US disclosed
US-4212518-A ELECTROCHROMIC CELL CANON KABUSHIKI KAISHA (JP) 1980-07-15 US disclosed