Methacrylic Acid

Methacrylic Acid

SCHEMBL730809

C=C(C)C(=O)O.C=C(C)C(=O)O.CCCCCCCCC(O)CO

nearest known ligand 0.55

Full drug profile on Sugi Atlas →

Predicted protein targets (top 16)

geneUniProtsupporting neighboursconfidence
GPR84 Q9NQS5 8/20 0.55
FFAR1 O14842 2/20 0.53
FFAR4 Q5NUL3 1/20 0.53
PLA2G2C Q5R387 1/20 0.44
FAAH O00519 1/20 0.44
LMNA P02545 1/20 0.44
PSMD14 O00487 2/20 0.44
PLA2G1B P04054 2/20 0.44
MMP2 P08253 2/20 0.44
ATG4B Q9Y4P1 2/20 0.44
HSP90AA1 P07900 1/20 0.44
KDM4E B2RXH2 1/20 0.44
DUSP3 P51452 1/20 0.44
MEN1 O00255 1/20 0.44
KMT2A Q03164 1/20 0.44
RAD52 P43351 1/20 0.44

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Methacrylic Acid SCHEMBL28845707 1.00 GPR84 (0.55) GPR84FFAR1FFAR4PLA2G2CFAAH
Methacrylic Acid SCHEMBL28608663 1.00 GPR84 (0.55) GPR84FFAR1FFAR4PLA2G2CFAAH
Methacrylic Acid SCHEMBL730545 1.00 GPR84 (0.55) GPR84FFAR1FFAR4PLA2G2CFAAH
Methacrylic Acid SCHEMBL28434621 1.00 GPR84 (0.55) GPR84FFAR1FFAR4PLA2G2CFAAH
Methacrylic Acid SCHEMBL10428247 1.00 GPR84 (0.55) GPR84FFAR1FFAR4PLA2G2CFAAH
Methacrylic Acid SCHEMBL27653643 1.00 GPR84 (0.55) GPR84FFAR1FFAR4PLA2G2CFAAH
Methacrylic Acid SCHEMBL4100782 0.98 GPR84 (0.52) GPR84FFAR1FFAR4PLA2G2CFAAH
Methacrylic Acid SCHEMBL18526885 0.93 GPR84 (0.44) GPR84FFAR1FFAR4PLA2G2CLMNA
Methacrylic Acid SCHEMBL730446 0.93 GPR84 (0.44) GPR84FFAR1FFAR4PLA2G2CLMNA
Methacrylic Acid SCHEMBL9779338 0.93 GPR84 (0.44) GPR84FFAR1FFAR4PLA2G2CLMNA

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 25 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20250155808-A1 RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN ZEON CORPORATION (JP) 2025-05-15 US disclosed
WO-2024143072-A1 COMPOSITION AND CURED PRODUCT 株式会社ADEKA 2024-07-04 WO disclosed
WO-2024070672-A1 RESIST COMPOSITION AND METHOD FOR FORMING RESIST PATTERN 日本ゼオン株式会社 2024-04-04 WO disclosed
WO-2023189969-A1 RESIST COMPOSITION AND METHOD FOR FORMING RESIST PATTERN 日本ゼオン株式会社 2023-10-05 WO disclosed
EP-3932906-B1 NOVEL COMPOUND, COMPOSITION CONTAINING SAID COMPOUND, AND CURED OBJECT ADEKA CORP (JP) 2023-07-12 EP disclosed
US-11667609-B2 Compound, composition containing said compound, self-healing material, surface coating agent, paint, adhesive, material for battery and cured product ADEKA CORPORATION (JP) 2023-06-06 US disclosed
CN-113544120-B Novel compound, composition containing same, self-repairing material, surface coating agent, paint, adhesive, battery material, and cured product 株式会社ADEKA 2023-05-02 CN disclosed
US-20220153698-A1 NOVEL COMPOUND, COMPOSITION CONTAINING SAID COMPOUND, SELF-HEALING MATERIAL, SURFACE COATING AGENT, PAINT, ADHESIVE, MATERIAL FOR BATTERY AND CURED PRODUCT ADEKA CORPORATION (JP) 2022-05-19 US disclosed
EP-3932906-A1 NOVEL COMPOUND, COMPOSITION CONTAINING SAID COMPOUND, AND CURED OBJECT ADEKA CORPORATION (JP) 2022-01-05 EP disclosed
CN-113544120-A Novel compound, composition containing same, and cured product 株式会社ADEKA 2021-10-22 CN disclosed
CN-102498146-A Polymer compositions and methods of making and using the same POLYMERIGHT INC 2012-06-13 CN disclosed
US-20120130040-A1 Polymer Compositions and Methods of Making and Using Same POLYMERIGHT, INC. (US) 2012-05-24 US disclosed
EP-2448990-A1 POLYMER COMPOSITIONS AND METHODS OF MAKING AND USING SAME Polymeright Inc. (US) 2012-05-09 EP disclosed
US-8138278-B2 Polymer compositions and methods of making and using same POLYMERIGHT, INC. (US) 2012-03-20 US disclosed
US-20110152492-A1 Polymer Compositions and Methods of Making and Using Same POLYMERIGHT, INC. (US) 2011-06-23 US disclosed
WO-2011008480-A1 POLYMER COMPOSITIONS AND METHODS OF MAKING AND USING SAME POLYMERIGHT, INC. (US) 2011-01-20 WO disclosed
US-7585932-B2 Polymer compositions and processes for making and using same CHEVRON PHILLIPS CHEMICAL COMPANY LP (US) 2009-09-08 US disclosed
EP-1940917-A2 POLYMER COMPOSITIONS AND PROCESSES FOR MAKING AND USING SAME Chevron Phillips Chemical Company LP (US) 2008-07-09 EP disclosed
US-20070055033-A1 POLYMER COMPOSITIONS AND PROCESSES FOR MAKING AND USING SAME CHEVRON PHILLIPS CHEMICAL COMPANY, LP 2007-03-08 US disclosed
WO-2007021960-A2 POLYMER COMPOSITIONS AND PROCESSES FOR MAKING AND USING SAME CHEVRON PHILLIPS CHEMICAL COMPANY LP (US) 2007-02-22 WO disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (2 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-11667609-B2 Compound, composition containing said compound, self-healing material, surface coating agent, paint, adhesive, material for battery and cured product H1-0, H1-10, RAD51 GPR84 301/4885FFAR1 1159/4885FFAR4 2804/4885
US-20220153698-A1 NOVEL COMPOUND, COMPOSITION CONTAINING SAID COMPOUND, SELF-HEALING MATERIAL, SURFACE COATING AGENT, PAINT, ADHESIVE, MATERIAL FOR BATTERY AND CURED PRODUCT H1-0, H1-10, RAD51 GPR84 208/4885FFAR1 1156/4885FFAR4 2517/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.