SCHEMBL732934

SCHEMBL732934

C=CC(=O)NCc1ccc(CNC(=O)C=C)cc1

nearest known ligand 0.81

Predicted protein targets (top 16)

geneUniProtsupporting neighboursconfidence
TGM2 P21980 2/20 0.81
ALDH1A1 P00352 4/20 0.52
TSHR P16473 1/20 0.52
MAPK1 P28482 1/20 0.52
TDP1 Q9NUW8 1/20 0.52
LMNA P02545 2/20 0.50
CYP2C19 P33261 2/20 0.50
CYP2D6 P10635 1/20 0.50
MMP1 P03956 2/20 0.47
MMP2 P08253 2/20 0.47
MMP9 P14780 2/20 0.47
KMT2A Q03164 2/20 0.47
MEN1 O00255 1/20 0.47
CYP2C9 P11712 2/20 0.46
TPSAB1 Q15661 2/20 0.45
CDK13 Q14004 1/20 0.42

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL2452377 0.92 TGM2 (0.71) TGM2ALDH1A1TSHRMAPK1TDP1
SCHEMBL124217 0.92 TGM2 (0.71) TGM2ALDH1A1TSHRMAPK1TDP1
SCHEMBL5071229 0.90 TGM2 (0.69) TGM2ALDH1A1LMNACYP2C19KMT2A
SCHEMBL4927519 0.90 TGM2 (0.69) TGM2ALDH1A1TDP1LMNACYP2C19
SCHEMBL2723387 0.90 TGM2 (0.69) TGM2ALDH1A1TSHRMAPK1TDP1
SCHEMBL3298245 0.90 TGM2 (0.69) TGM2ALDH1A1TSHRMAPK1TDP1
SCHEMBL9179038 0.90 TGM2 (0.69) TGM2ALDH1A1TSHRMAPK1TDP1
SCHEMBL2722983 0.90 TGM2 (0.74) TGM2ALDH1A1TSHRMAPK1TDP1
SCHEMBL8966436 0.90 TGM2 (1.00) TGM2ALDH1A1TSHRMAPK1TDP1
SCHEMBL959540 0.90 TGM2 (0.69) TGM2ALDH1A1LMNAKMT2AMEN1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 23 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-3063210-A2 METHOD OF THIOPHENOL REMOVAL FROM POLY(ARYLENE SULFIDE) POLYMER COMPOSITIONS SOLVAY SA (BE) 2016-09-07 EP disclosed
US-9388282-B2 Method of thiophenol removal from poly(arylene sulfide) polymer compositions SOLVAY SPECIALTY POLYMERS USA, LLC. (US) 2016-07-12 US disclosed
WO-2015065906-A2 METHOD OF THIOPHENOL REMOVAL FROM POLY(ARYLENE SULFIDE) POLYMER COMPOSITIONS CHEVRON PHILLIPS CHEMICAL COMPANY LP (US) 2015-05-07 WO disclosed
US-20150119550-A1 Method of Thiophenol Removal from Poly(Arylene Sulfide) Polymer Compositions CHEVRON PHILLIPS CHEMICAL COMPANY LP (US) 2015-04-30 US disclosed
US-8889802-B2 Polymer compositions and methods of making and using same POLYMERIGHT, INC. (US) 2014-11-18 US disclosed
US-20120130040-A1 Polymer Compositions and Methods of Making and Using Same POLYMERIGHT, INC. (US) 2012-05-24 US disclosed
EP-2448990-A1 POLYMER COMPOSITIONS AND METHODS OF MAKING AND USING SAME Polymeright Inc. (US) 2012-05-09 EP disclosed
US-8138278-B2 Polymer compositions and methods of making and using same POLYMERIGHT, INC. (US) 2012-03-20 US disclosed
US-20110152492-A1 Polymer Compositions and Methods of Making and Using Same POLYMERIGHT, INC. (US) 2011-06-23 US disclosed
WO-2011008480-A1 POLYMER COMPOSITIONS AND METHODS OF MAKING AND USING SAME POLYMERIGHT, INC. (US) 2011-01-20 WO disclosed
WO-2007021960-A2 POLYMER COMPOSITIONS AND PROCESSES FOR MAKING AND USING SAME CHEVRON PHILLIPS CHEMICAL COMPANY LP (US) 2007-02-22 WO disclosed
EP-0510246-B1 Use of fine particulate crosslinked type n-vinylamide resin microgel SHOWA DENKO KK (JP) 1996-09-25 EP disclosed
US-5338815-A Used in thickeners, dispersion stabilizers and lubricants SHOWA DENKO K.K. (JP) 1994-08-16 US disclosed
US-5280095-A N-vinylcarboxylic acid amine resin SHOWA DENKO K.K. (JP) 1994-01-18 US disclosed
EP-0510246-A1 Use of fine particulate crosslinked type n-vinylamide resin microgel SHOWA DENKO KABUSHIKI KAISHA (JP) 1992-10-28 EP disclosed
US-4446222-A Method of preparing printing surface formed of polymeric resin containing polyamide and dicarboxylic acid diester MATRIX UNLIMITED, INC. (US) 1984-05-01 US disclosed
EP-0053260-B1 PHOTOSENSIBLE MULTILAYER MATERIAL AND PROCESS FOR ITS PRODUCTION BASF Aktiengesellschaft (DE) 1984-02-01 EP disclosed
US-4345022-A Process of recovering unpolymerized photopolymer from printing plates MATRIX UNLIMITED, INC. (US) 1982-08-17 US disclosed
EP-0053260-A1 Photosensible multilayer material and process for its production BASF Aktiengesellschaft (DE) 1982-06-09 EP disclosed
US-4269930-A ALONG WITH A PHOTOSENSITIZER AND POLYMERIZATION INHIBITOR; HARD, TOUGH GRAVURE PRINTING PLATES MATRIX UNLIMITED, INC. (US) 1981-05-26 US disclosed