Sugi Predict

Sugi Predict / Compounds / SCHEMBL733075

SCHEMBL733075

SCHEMBL733075

SCCc1ccc(-c2cc(-c3ccccn3)nc(-c3ccccn3)c2)cc1

nearest known ligand 0.47

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
▸ CCR1 P32246 3/20 0.47
▸ CCR5 P51681 3/20 0.47
▸ CCR8 P51685 3/20 0.47
▸ KDM4E B2RXH2 5/20 0.46
▸ LMNA P02545 4/20 0.46
▸ SMN1; SMN2 Q16637 4/20 0.46
▸ TP53 P04637 3/20 0.46
▸ ALOX15 P16050 2/20 0.46
▸ HTT P42858 2/20 0.46
▸ TDP1 Q9NUW8 2/20 0.46
▸ L3MBTL1 Q9Y468 2/20 0.46
▸ ALPL P05186 1/20 0.46
▸ HSP90AA1 P07900 1/20 0.46
▸ ALPI P09923 1/20 0.46
▸ ALPG P10696 1/20 0.46
▸ MAPK1 P28482 1/20 0.46
▸ HIF1A Q16665 2/20 0.42
▸ CYP1A2 P05177 1/20 0.42
▸ POLB P06746 1/20 0.42
▸ METAP1 P53582 1/20 0.42

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL15061960 0.88 CCR1 (0.50) CCR1CCR5CCR8KDM4ELMNA
SCHEMBL21929413 0.86 CCR1 (0.49) CCR1CCR5CCR8KDM4ELMNA
SCHEMBL1129824 0.84 CYP1A2 (0.47) CCR1CCR5CCR8KDM4ELMNA
SCHEMBL29660049 0.83 CCR1 (0.64) CCR1CCR5CCR8KDM4ELMNA
SCHEMBL13311187 0.83 CCR1 (0.64) CCR1CCR5CCR8KDM4ELMNA
SCHEMBL2007559 0.83 CCR1 (0.64) CCR1CCR5CCR8KDM4ELMNA
SCHEMBL18489879 0.82 CCR1 (0.62) CCR1CCR5CCR8KDM4ELMNA
SCHEMBL13286613 0.81 CCR1 (0.50) CCR1CCR5CCR8KDM4ELMNA
SCHEMBL4812728 0.81 CCR1 (0.50) CCR1CCR5CCR8KDM4ELMNA
SCHEMBL9228056 0.81 CCR1 (0.50) CCR1CCR5CCR8KDM4ELMNA

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 24 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20120308933-A1 RADIATION SENSITIVE SELF-ASSEMBLED MONOLAYERS AND USES THEREOF INTERNATIONAL BUSINESS MACHINES CORPORATION (US) 2012-12-06 — — US disclosed
US-20120308933-A1 RADIATION SENSITIVE SELF-ASSEMBLED MONOLAYERS AND USES THEREOF INTERNATIONAL BUSINESS MACHINES CORPORATION (US) 2012-12-06 — — US disclosed
US-8273886-B2 Attaching radiation sensitive compounds to substrate; exposing to e-beam radiation; complexing metal binding group of radiation sensitive compounds with metal, metal compound, or metal or metal-oxide; attaching ligand, complexing; 4-[N-(3-triethoxysilyl)propyl]-carbamoyl-2-nitrobenzyl isonicotinate INTERNATIONAL BUSINESS MACHINES CORPORATION (US) 2012-09-25 — — US disclosed
US-8273886-B2 Attaching radiation sensitive compounds to substrate; exposing to e-beam radiation; complexing metal binding group of radiation sensitive compounds with metal, metal compound, or metal or metal-oxide; attaching ligand, complexing; 4-[N-(3-triethoxysilyl)propyl]-carbamoyl-2-nitrobenzyl isonicotinate INTERNATIONAL BUSINESS MACHINES CORPORATION (US) 2012-09-25 — — US disclosed
US-8138492-B2 Formation of carbon and semiconductor nanomaterials using molecular assemblies INTERNATIONAL BUSINESS MACHINES CORPORATION (US) 2012-03-20 — — US disclosed
US-8138492-B2 Formation of carbon and semiconductor nanomaterials using molecular assemblies INTERNATIONAL BUSINESS MACHINES CORPORATION (US) 2012-03-20 — — US disclosed
US-20110204318-A1 FORMATION OF CARBON AND SEMICONDUCTOR NANOMATERIALS USING MOLECULAR ASSEMBLIES INTERNATIONAL BUSINESS MACHINES CORPORATION (US) 2011-08-25 — — US disclosed
US-20110204318-A1 FORMATION OF CARBON AND SEMICONDUCTOR NANOMATERIALS USING MOLECULAR ASSEMBLIES INTERNATIONAL BUSINESS MACHINES CORPORATION (US) 2011-08-25 — — US disclosed
US-7855133-B2 Formation of carbon and semiconductor nanomaterials using molecular assemblies INTERNATIONAL BUSINESS MACHINES CORPORATION (US) 2010-12-21 — — US disclosed
US-7855133-B2 Formation of carbon and semiconductor nanomaterials using molecular assemblies INTERNATIONAL BUSINESS MACHINES CORPORATION (US) 2010-12-21 — — US disclosed
US-20090087972-A1 FORMATION OF CARBON AND SEMICONDUCTOR NANOMATERIALS USING MOLECULAR ASSEMBLIES INTERNATIONAL BUSINESS MACHINES CORPORATION (US) 2009-04-02 — — US disclosed
US-20090087972-A1 FORMATION OF CARBON AND SEMICONDUCTOR NANOMATERIALS USING MOLECULAR ASSEMBLIES INTERNATIONAL BUSINESS MACHINES CORPORATION (US) 2009-04-02 — — US disclosed
US-20080318157-A1 RADIATION SENSITIVE SELF-ASSEMBLED MONOLAYERS AND USES THEREOF INTERNATIONAL BUSINESS MACHINES CORPORATION (US) 2008-12-25 — — US disclosed
US-20080318157-A1 RADIATION SENSITIVE SELF-ASSEMBLED MONOLAYERS AND USES THEREOF INTERNATIONAL BUSINESS MACHINES CORPORATION (US) 2008-12-25 — — US disclosed
WO-2008066947-A2 FORMATION OF CARBON AND SEMICONDUCTOR NANOMATERIALS USING MOLECULAR ASSEMBLIES INTERNATIONAL BUSINESS MACHINES CORPORATION (US) 2008-06-05 — — WO disclosed
WO-2008060678-A2 FORMATION OF CARBON AND SEMICONDUCTOR NANOMATERIALS USING MOLECULAR ASSEMBLIES INTERNATIONAL BUSINESS MACHINES CORPORATION (US) 2008-05-22 — — WO disclosed
US-20070278179-A1 Radiation sensitive self-assembled monolayers and uses thereof INTERNATIONAL BUSINESS MACHINES CORPORATION (US) 2007-12-06 — — US disclosed
US-20070278179-A1 Radiation sensitive self-assembled monolayers and uses thereof INTERNATIONAL BUSINESS MACHINES CORPORATION (US) 2007-12-06 — — US disclosed
US-20070264764-A1 Formation of carbon and semiconductor nanomaterials using molecular assemblies INTERNATIONAL BUSINESS MACHINES CORPORATION (US) 2007-11-15 — — US disclosed
US-20070264764-A1 Formation of carbon and semiconductor nanomaterials using molecular assemblies INTERNATIONAL BUSINESS MACHINES CORPORATION (US) 2007-11-15 — — US disclosed