SCHEMBL74598

SCHEMBL74598

C[C]1CCCCO1

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL9935005 0.97
SCHEMBL73036 0.90
SCHEMBL24697790 0.77
SCHEMBL322386 0.75
SCHEMBL7737903 0.67
SCHEMBL20375571 0.67
SCHEMBL434759 0.67 CA1 (0.50)
SCHEMBL12796573 0.67 CA1 (0.50)
SCHEMBL2737148 0.67
SCHEMBL20371017 0.66 CA1 (0.37)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1056 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
WO-2011092671-A1 PROLINE DERIVATIVES FOR USE IN THE TREATMENT OF DIABETES RANBAXY LABORATORIES LIMITED (IN) 2011-08-04 WO claimed
US-7838201-B2 Method for manufacturing a semiconductor device HYNIX SEMICONDUCTOR INC. (KR) 2010-11-23 US claimed
US-7534548-B2 Polymer for immersion lithography and photoresist composition HYNIX SEMICONDUCTOR INC. (KR) 2009-05-19 US claimed
US-7361447-B2 Photoresist polymer and photoresist composition containing the same HYNIX SEMICONDUCTOR INC. (KR) 2008-04-22 US claimed
US-20060275695-A1 Polymer for immersion lithography, photoresist composition containing the same, method of manufacturing a semiconductor device, and semiconductor device HYNIX SEMICONDUCTOR INC. (KR) 2006-12-07 US claimed
US-7083893-B2 Photoresist polymer and photoresist composition containing the same HYNIX SEMICONDUCTOR INC. (KR) 2006-08-01 US claimed
US-7026091-B2 Positive photoresist composition and patterning process using the same INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE (TW) 2006-04-11 US claimed
US-6921622-B2 Photoresist monomers, polymers thereof and photoresist compositions containing the same HYNIX SEMICONDUCTOR INC. (KR) 2005-07-26 US claimed
US-20050069807-A1 Photoresist composition HYNIX SEMICONDUCTOR INC. (KR) 2005-03-31 US claimed
US-6858371-B2 Maleimide-photoresist monomers containing halogen, polymers thereof and photoresist compositions comprising the same HYNIX SEMICONDUCTOR INC. (KR) 2005-02-22 US claimed
EP-0284071-B1 Metal-radionuclide-labeled proteins and glycoproteins for diagnosis and therapy NEORX CORP (US) 1994-06-08 EP claimed
US-5202451-A ANCHIMERIC RADIOMETAL CHELATING COMPOUNDS NEORX CORPORATION (US) 1993-04-13 US claimed
US-5021556-A Method of radiolabeling chelating compounds comprising sulfur atoms with metal radionuclides NEORX CORPORATION (US) 1991-06-04 US claimed
EP-0199982-B1 AZOLE DERIVATIVES, PROCESS FOR THEIR PREPARATION AND PLANT GROWTH-REGULATING COMPOSITIONS BASF Aktiengesellschaft (DE) 1991-04-03 EP claimed
EP-0229642-B1 AZOLE DERIVATIVES, FUNGICIDES AND GROWTH REGULATORS CONTAINING THEM BASF Aktiengesellschaft (DE) 1990-07-11 EP claimed
EP-0284071-A2 Metal-radionuclide-labeled proteins and glycoproteins for diagnosis and therapy NEORX CORPORATION (US) 1988-09-28 EP claimed
EP-0253767-A1 Parasiticide and insecticide CIBA-GEIGY AG (CH) 1988-01-20 EP claimed
EP-0230268-A2 Halogenated azole compounds and fungicides containing them BASF Aktiengesellschaft (DE) 1987-07-29 EP claimed
EP-0229642-A2 Azole derivatives, fungicides and growth regulators containing them BASF Aktiengesellschaft (DE) 1987-07-22 EP claimed
EP-0199982-A2 Azole derivatives, process for their preparation and plant growth-regulating compositions BASF Aktiengesellschaft (DE) 1986-11-05 EP claimed