SCHEMBL7460628

SCHEMBL7460628

CC(I)C=O

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL17283033 1.00
SCHEMBL1400330 0.72
SCHEMBL15789315 0.72
Isobutyraldehyde SCHEMBL788159 0.70 ADH1B (0.38)
Isobutyraldehyde SCHEMBL2635854 0.70 ADH1B (0.38)
SCHEMBL22999280 0.70
Isobutyraldehyde SCHEMBL18287436 0.70
Isobutyraldehyde SCHEMBL2996 0.70
SCHEMBL8985902 0.70
SCHEMBL6414158 0.67

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 17 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
WO-2024020780-A1 STAR-SHAPED POLYMER, PAINT, COATING, AND METHOD FOR PRODUCING STAR-SHAPED POLYMER DIC CORPORATION (JP) 2024-02-01 WO disclosed
US-11572430-B2 Compound, resin, resist composition or radiation-sensitive composition, resist pattern formation method, method for producing amorphous film, underlayer film forming material for lithography, composition for underlayer film formation for lithography, method for forming circuit pattern, and purification method MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2023-02-07 US disclosed
US-11480877-B2 Resist composition, method for forming resist pattern, and polyphenol compound used therein MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2022-10-25 US disclosed
US-11243467-B2 Compound, resin, resist composition or radiation-sensitive composition, resist pattern formation method, method for producing amorphous film, underlayer film forming material for lithography, composition for underlayer film formation for lithography, method for forming circuit pattern, and purification method MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2022-02-08 US disclosed
EP-1784196-B1 CERAMIDE DERIVATIVES AS MODULATORS OF IMMUNITY AND AUTOIMMUNITY ALBERT EINSTEIN COLLEGE MEDICINE YESHIVA UNIV (US) 2016-12-21 EP disclosed
WO-2016102562-A1 FGF21 DERIVATIVES AND USES THEREOF NOVO NORDISK A/S (DK) 2016-06-30 WO disclosed
US-20100226918-A1 PYRROLE DERIVATIVES AS P2Y12 ANTAGONISTS SANOFI-AVENTIS (FR) 2010-09-09 US disclosed
CN-100436456-C Imidazo [4,5-b] pyridiniummethyl-containing cephem compounds having broad antibacterial spectrum SHIONOGI & CO (JP) 2008-11-26 CN disclosed
EP-1905829-A2 Templated molecules and methods for using such molecules Nuevolution A/S (DK) 2008-04-02 EP disclosed
CN-1100165-C Improved regenerated collagen fiber and method of manufacturing the same KANEGAFUCHI CHEMICAL IND (JP) 2003-01-29 CN disclosed
EP-0890663-B1 Improved regenerated collagen fiber and method of manufacturing the same KANEKA CORP (JP) 2002-11-13 EP disclosed
US-6160096-A Regenerated collagen fiber and method of manufacturing the same KANEKA CORPORATION (JP) 2000-12-12 US disclosed
CN-1207422-A Improved regenerated collagen fiber and method of manufacturing the same KANEGAFUCHI CHEMICAL IND (JP) 1999-02-10 CN disclosed
EP-0890663-A2 Improved regenerated collagen fiber and method of manufacturing the same Kaneka Corporation (JP) 1999-01-13 EP disclosed
US-5144067-A Process for the coproduction of alkyl iodides and alpha-iodocarboxylic acids and/or anhydrides thereof EASTMAN KODAK COMPANY (US) 1992-09-01 US disclosed
US-4914206-A ANTIBIOTICS TAKEDA CHEMICAL INDUSTRIES, LTD. (JP) 1990-04-03 US disclosed
EP-0226896-A2 Lankacidin derivatives and production thereof Takeda Chemical Industries, Ltd. (JP) 1987-07-01 EP disclosed