SCHEMBL7460824

SCHEMBL7460824

CCN(CC)c1ccc(C(=O)O)c(CCC(C)C)c1

nearest known ligand 0.49

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
MEN1 O00255 6/20 0.49
KMT2A Q03164 6/20 0.49
SMN1; SMN2 Q16637 3/20 0.49
L3MBTL1 Q9Y468 3/20 0.49
ALDH1A1 P00352 6/20 0.45
HPGD P15428 3/20 0.45
KDM4E B2RXH2 3/20 0.45
SLC16A3 O15427 1/20 0.45
ALOX15 P16050 1/20 0.45
SLC16A1 P53985 1/20 0.45
HSD17B10 Q99714 1/20 0.45
MCL1 Q07820 5/20 0.42
CNR2 P34972 1/20 0.40
POLB P06746 4/20 0.39
MAPT P10636 3/20 0.39
GAA P10253 3/20 0.39
THRB P10828 2/20 0.39
PKM P14618 2/20 0.39
MAPK1 P28482 2/20 0.39
MDM2 Q00987 2/20 0.39

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL25187176 0.86 MAPT (0.44) MEN1KMT2ASMN1; SMN2L3MBTL1ALDH1A1
SCHEMBL339042 0.85 MCL1 (0.41) KMT2ASMN1; SMN2L3MBTL1ALDH1A1KDM4E
SCHEMBL5397794 0.85 MEN1 (0.54) MEN1KMT2ASMN1; SMN2L3MBTL1ALDH1A1
SCHEMBL1814072 0.83 MEN1 (0.57) MEN1KMT2ASMN1; SMN2L3MBTL1ALDH1A1
SCHEMBL9161263 0.81 SMN1; SMN2 (0.50) MEN1KMT2ASMN1; SMN2L3MBTL1ALDH1A1
SCHEMBL8050755 0.79 GRIN2D (0.51) SMN1; SMN2L3MBTL1ALDH1A1KDM4EHSD17B10
SCHEMBL11032706 0.77 CA12 (0.47) MEN1KMT2AALDH1A1HSD17B10MCL1
SCHEMBL7586557 0.77 KMT2A (0.42) MEN1KMT2ASMN1; SMN2L3MBTL1ALDH1A1
SCHEMBL4372902 0.76 MEN1 (0.65) MEN1KMT2ASMN1; SMN2L3MBTL1ALDH1A1
SCHEMBL14814152 0.76 GRIN2D (0.41) ALDH1A1KDM4ESLC16A3MCL1BCL2L1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-6482569-B1 Process for forming a polyimide pattern with photosensitive composition for i-line stepper ASAHI KASEI KABUSHIKI KAISHA (JP) 2002-11-19 US disclosed
EP-0718696-B1 Photosensitive polyimide precursor composition ASAHI CHEMICAL IND (JP) 2002-01-16 EP disclosed
US-6162580-A Photosensitive polyimide precursor compositions processable by exposure to short wavelength light ASAHI KASEI KOGYO KABUSHIKI KAISHA (JP) 2000-12-19 US disclosed
EP-0580108-B1 A photosensitive polyimide composition ASAHI CHEMICAL IND (JP) 1997-03-12 EP disclosed
EP-0718696-A2 A photosensitive polyimide composition ASAHI KASEI KOGYO KABUSHIKI KAISHA (JP) 1996-06-26 EP disclosed
EP-0580108-A2 A photosensitive polyimide composition ASAHI KASEI KOGYO KABUSHIKI KAISHA (JP) 1994-01-26 EP disclosed