⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL5933644 | 0.96 | — | — | |
| SCHEMBL6177956 | 0.89 | — | — | |
| SCHEMBL6175707 | 0.81 | — | — | |
| SCHEMBL5720457 | 0.79 | — | — | |
| SCHEMBL18739357 | 0.76 | ALDH1A1 (0.31) | — | |
| SCHEMBL3150576 | 0.76 | — | — | |
| SCHEMBL10893889 | 0.74 | — | — | |
| SCHEMBL13559095 | 0.73 | — | — | |
| SCHEMBL8738046 | 0.73 | — | — | |
| SCHEMBL21413364 | 0.73 | ALDH1A1 (0.31) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 9 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-0818512-B1 | Quinoline derivative and use of same | MITSUI CHEMICALS INC (JP) | 2002-10-02 | — | — | EP | disclosed |
| US-6407242-B1 | REACTING A PHTHALIMIDE COMPOUND WITH A QUINOLINE COMPOUND;ELECTROLUMINESCENCE | MITSUI CHEMICALS, INC. (JP) | 2002-06-18 | — | — | US | disclosed |
| US-6132640-A | ZINC COMPLEXES OF QUINOLINE | MITSUI CHEMICALS, INC. (JP) | 2000-10-17 | — | — | US | disclosed |
| EP-0818512-A1 | Quinoline derivative and use of same | MITSUI TOATSU CHEMICALS, Inc. (JP) | 1998-01-14 | — | — | EP | disclosed |
| EP-0398713-B1 | Photosensitive resin composition and laminate using the same | HITACHI CHEMICAL CO LTD (JP) | 1994-07-20 | — | — | EP | disclosed |
| US-5140035-A | FUNGICIDAL TRIAZOLYMETHYL-CYCLOPROPYL DERIVATIVES | BAYER AKTIENGESELLSCHAFT (DE) | 1992-08-18 | — | — | US | disclosed |
| US-4980266-A | Excellent stability and resistance to plating | HITACHI CHEMICAL COMPANY, LTD. (JP) | 1990-12-25 | — | — | US | disclosed |
| EP-0398713-A2 | Photosensitive resin composition and laminate using the same | Hitachi Chemical Co., Ltd. (JP) | 1990-11-22 | — | — | EP | disclosed |
| US-4309210-A | HERBICIDE AND SAFENING AGENT | CIBA-GEIGY CORPORATION (US) | 1982-01-05 | — | — | US | disclosed |