Predicted protein targets (top 4)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | FKBP1A | P62942 | 10/20 | 0.39 |
| ▸ | HMGCR | P04035 | 2/20 | 0.39 |
| ▸ | TP53 | P04637 | 1/20 | 0.37 |
| ▸ | CYP3A4 | P08684 | 1/20 | 0.37 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL2681415 | 0.97 | FKBP1A (0.38) | FKBP1AHMGCRTP53CYP3A4 | |
| SCHEMBL10123436 | 0.96 | FKBP1A (0.37) | FKBP1AHMGCRTP53CYP3A4 | |
| SCHEMBL10123438 | 0.96 | FKBP1A (0.37) | FKBP1AHMGCRTP53CYP3A4 | |
| SCHEMBL15196707 | 0.96 | FKBP1A (0.37) | FKBP1AHMGCRTP53CYP3A4 | |
| SCHEMBL1104059 | 0.94 | FKBP1A (0.43) | FKBP1AHMGCRTP53CYP3A4 | |
| SCHEMBL15197227 | 0.94 | FKBP1A (0.43) | FKBP1AHMGCRTP53CYP3A4 | |
| SCHEMBL1104062 | 0.93 | FKBP1A (0.42) | FKBP1AHMGCRTP53CYP3A4 | |
| SCHEMBL1104041 | 0.89 | HMGCR (0.36) | FKBP1AHMGCRTP53CYP3A4 | |
| SCHEMBL14369242 | 0.88 | FKBP1A (0.39) | FKBP1AHMGCRTP53CYP3A4 | |
| SCHEMBL13921992 | 0.88 | FKBP1A (0.43) | FKBP1AHMGCRTP53CYP3A4 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 296 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-11733435-B2 | Polarizing plate protective film, polarizing plate, and liquid crystal display device | FUJIFILM CORPORATION (JP) | 2023-08-22 | — | — | US | disclosed |
| US-11692050-B2 | Photo-alignment copolymer, binder composition, binder layer, optical laminate, and image display device | FUJIFILM CORPORATION (JP) | 2023-07-04 | — | — | US | disclosed |
| EP-3770225-A1 | AQUEOUS INK COMPOSITION, INK SET, AND IMAGE FORMING METHOD | Fujifilm Corporation (JP) | 2021-01-27 | — | — | EP | disclosed |
| WO-2019181840-A1 | AQUEOUS INK COMPOSITION, INK SET, AND IMAGE FORMING METHOD | 富士フイルム株式会社 | 2019-09-26 | — | — | WO | disclosed |
| US-10025011-B2 | Composition, infrared transmission filter and method for manufacturing the same, and infrared sensor | FUJIFILM CORPORATION (JP) | 2018-07-17 | — | — | US | disclosed |
| EP-1621927-B1 | Positive type resist composition for use in liquid immersion exposure and a method of forming the pattern using the same | FUJIFILM CORP (JP) | 2018-05-23 | — | — | EP | disclosed |
| US-20180120705-A1 | PATTERN FORMING METHOD AND ELECTRONIC DEVICE MANUFACTURING METHOD | FUJIFILM CORPORATION (JP) | 2018-05-03 | — | — | US | disclosed |
| US-9952361-B2 | IR cut filter, method for manufacturing the same, and solid-state imaging device | FUJIFILM CORPORATION (JP) | 2018-04-24 | — | — | US | disclosed |
| US-9926462-B2 | Composition for forming liquid immersion upper layer film, and polymer | JSR CORPORATION (JP) | 2018-03-27 | — | — | US | disclosed |
| US-9879108-B2 | Composition, cured film, color filter, laminate, and pigment dispersant | FUJIFILM CORPORATION (JP) | 2018-01-30 | — | — | US | disclosed |
| US-20070148593-A1 | Polymerizable composition and planographic printing plate precursor using the same | FUJIFILM CORPORATION | 2007-06-28 | — | — | US | disclosed |
| US-20070138139-A1 | METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE, ACID ETCHING RESISTANCE MATERIAL AND COPOLYMER | ASAKAWA KOJI | 2007-06-21 | — | — | US | disclosed |
| US-20070142592-A1 | METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE, ACID ETCHING RESISTANCE MATERIAL AND COPOLYMER | ASAKAWA KOJI | 2007-06-21 | — | — | US | disclosed |
| US-20070122741-A1 | Resist protective coating material and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2007-05-31 | — | — | US | disclosed |
| US-7208334-B2 | Method of manufacturing semiconductor device, acid etching resistance material and copolymer | KABUSHIKI KAISHA TOSHIBA (JP) | 2007-04-24 | — | — | US | disclosed |
| US-20070082290-A1 | Planographic printing plate precursor | FUJI PHOTO FILM CO., LTD. (JP) | 2007-04-12 | — | — | US | disclosed |
| EP-1762894-A1 | Photopolymerizable photosensitive lithographic printing plate | FUJIFILM Corporation (JP) | 2007-03-14 | — | — | EP | disclosed |
| US-20070048663-A1 | Photopolymerizable photosensitive lithographic printing plate | FUJI PHOTO FILM CO., LTD. | 2007-03-01 | — | — | US | disclosed |
| US-20070048663-A1 | Photopolymerizable photosensitive lithographic printing plate | FUJI PHOTO FILM CO., LTD. | 2007-03-01 | — | — | US | disclosed |
| US-20070003867-A1 | Resist protective coating material and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2007-01-04 | — | — | US | disclosed |