Predicted protein targets (top 4)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | MEN1 | O00255 | 2/20 | 0.34 |
| ▸ | KMT2A | Q03164 | 2/20 | 0.34 |
| ▸ | NPC1 | O15118 | 1/20 | 0.34 |
| ▸ | RAB9A | P51151 | 1/20 | 0.34 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL9610630 | 0.91 | — | — | |
| SCHEMBL15216393 | 0.85 | MEN1 (0.36) | MEN1KMT2ANPC1RAB9A | |
| SCHEMBL6860489 | 0.83 | MEN1 (0.33) | MEN1KMT2ANPC1RAB9A | |
| SCHEMBL6853758 | 0.83 | MEN1 (0.33) | MEN1KMT2ANPC1RAB9A | |
| SCHEMBL23011610 | 0.81 | MEN1 (0.36) | MEN1KMT2ANPC1RAB9A | |
| SCHEMBL12577684 | 0.81 | MEN1 (0.36) | MEN1KMT2ANPC1RAB9A | |
| SCHEMBL13657461 | 0.81 | MEN1 (0.36) | MEN1KMT2ANPC1RAB9A | |
| SCHEMBL14632271 | 0.81 | MEN1 (0.36) | MEN1KMT2ANPC1RAB9A | |
| SCHEMBL18409740 | 0.81 | MEN1 (0.36) | MEN1KMT2ANPC1RAB9A | |
| SCHEMBL13294530 | 0.81 | MEN1 (0.34) | MEN1KMT2ANPC1RAB9A |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 730 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-6794110-B2 | DEVELOPMENT OF LATENT IMAGES | INTERNATIONAL BUSINESS MACHINES CORPORATION | 2004-09-21 | — | — | US | claimed |
| US-12036025-B2 | Bio-electrode, method for manufacturing bio-electrode, and method for measuring biological signal | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2024-07-16 | — | — | US | disclosed |
| US-20240215890-A1 | Bio-Electrode, Bio-Electrode Composition, And Method For Manufacturing Bio-Electrode | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2024-07-04 | — | — | US | disclosed |
| US-20240215891-A1 | Bio-Electrode Composition, Bio-Electrode, And Method For Manufacturing Bio-Electrode | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2024-07-04 | — | — | US | disclosed |
| US-20240210830-A1 | RESIST COMPOSITION AND PATTERN FORMING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2024-06-27 | — | — | US | disclosed |
| US-11914291-B2 | Resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2024-02-27 | — | — | US | disclosed |
| US-11914294-B2 | Positive resist composition and pattern forming process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2024-02-27 | — | — | US | disclosed |
| US-20240027903-A1 | Resist Material And Patterning Process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2024-01-25 | — | — | US | disclosed |
| US-20240027909-A1 | POSITIVE RESIST COMPOSITION AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2024-01-25 | — | — | US | disclosed |
| US-20240027902-A1 | CHEMICALLY AMPLIFIED RESIST COMPOSITION AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2024-01-25 | — | — | US | disclosed |
| US-20080038664-A1 | Silsesquioxane compound mixture, method of making, resist composition, and patterning process | SHIN-ETSU CHEMICAL CO. LTD. (JP) | 2008-02-14 | — | — | US | disclosed |
| US-20080038664-A1 | Silsesquioxane compound mixture, method of making, resist composition, and patterning process | SHIN-ETSU CHEMICAL CO. LTD. (JP) | 2008-02-14 | — | — | US | disclosed |
| US-20070207408-A1 | Polymers, positive resist compositions and patterning process | SHIN-ETSU CHEMICAL CO., LTD. | 2007-09-06 | — | — | US | disclosed |
| US-20070207408-A1 | Polymers, positive resist compositions and patterning process | SHIN-ETSU CHEMICAL CO., LTD. | 2007-09-06 | — | — | US | disclosed |
| US-7265234-B2 | Silsesquioxane compound mixture, method of making, resist composition, and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2007-09-04 | — | — | US | disclosed |
| US-7265234-B2 | Silsesquioxane compound mixture, method of making, resist composition, and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2007-09-04 | — | — | US | disclosed |
| US-20070072115-A1 | Positive resist compositions and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2007-03-29 | — | — | US | disclosed |
| US-20070072115-A1 | Positive resist compositions and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2007-03-29 | — | — | US | disclosed |
| US-6794110-B2 | DEVELOPMENT OF LATENT IMAGES | INTERNATIONAL BUSINESS MACHINES CORPORATION | 2004-09-21 | — | — | US | disclosed |
| US-20030171490-A1 | Polymer blend and associated methods of preparation and use | GLOBALFOUNDRIES U.S. INC. | 2003-09-11 | — | — | US | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20240027903-A1 | Resist Material And Patterning Process | LBR, HNRNPU, EWSR1 | MEN1 4565/4885KMT2A 882/4885NPC1 4500/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.