Predicted protein targets (top 5)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | MEN1 | O00255 | 1/20 | 0.36 |
| ▸ | NPC1 | O15118 | 1/20 | 0.36 |
| ▸ | RAB9A | P51151 | 1/20 | 0.36 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.36 |
| ▸ | POLB | P06746 | 1/20 | 0.31 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL23011610 | 0.85 | MEN1 (0.36) | MEN1NPC1RAB9AKMT2APOLB | |
| SCHEMBL14479563 | 0.85 | MEN1 (0.36) | MEN1NPC1RAB9AKMT2APOLB | |
| SCHEMBL14632271 | 0.85 | MEN1 (0.36) | MEN1NPC1RAB9AKMT2APOLB | |
| SCHEMBL18409740 | 0.85 | MEN1 (0.36) | MEN1NPC1RAB9AKMT2APOLB | |
| SCHEMBL75232 | 0.85 | MEN1 (0.36) | MEN1NPC1RAB9AKMT2APOLB | |
| SCHEMBL75028 | 0.81 | MEN1 (0.34) | MEN1NPC1RAB9AKMT2A | |
| SCHEMBL15216393 | 0.81 | MEN1 (0.36) | MEN1NPC1RAB9AKMT2APOLB | |
| SCHEMBL20858564 | 0.79 | MEN1 (0.36) | MEN1NPC1RAB9AKMT2APOLB | |
| SCHEMBL6853758 | 0.79 | MEN1 (0.33) | MEN1NPC1RAB9AKMT2A | |
| SCHEMBL2735050 | 0.79 | MEN1 (0.33) | MEN1NPC1RAB9AKMT2A |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-9244345-B1 | Non-ionic photo-acid generating polymers for resist applications | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2016-01-26 | — | — | US | disclosed |
| US-7608382-B2 | Method of controlling the differential dissolution rate of photoresist compositions, polycyclic olefin polymers and monomers used for making such polymers | PROMERUS LLC (US) | 2009-10-27 | — | — | US | disclosed |
| US-20080124651-A1 | Method of controlling the differential dissolution rate of photoresist compositions, polycyclic olefin polymers and monomers used for making such polymers | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2008-05-29 | — | — | US | disclosed |
| US-7341816-B2 | Method of controlling the differential dissolution rate of photoresist compositions, polycyclic olefin polymers and monomers used for making such polymers | PROMERUS, LLC (US) | 2008-03-11 | — | — | US | disclosed |