SCHEMBL75088

SCHEMBL75088

CCOCCc1ccccc1

nearest known ligand 0.54

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
RAB9A P51151 2/20 0.53
SMN1; SMN2 Q16637 2/20 0.53
TP53 P04637 1/20 0.46
CA1 P00915 1/20 0.45
CA2 P00918 1/20 0.45
CA9 Q16790 1/20 0.45
IDO1 P14902 1/20 0.45
TSHR P16473 1/20 0.44
ALDH1A1 P00352 1/20 0.44
HPGD P15428 1/20 0.44
ALOX15 P16050 1/20 0.44
ALOX12 P18054 1/20 0.44
CASP1 P29466 1/20 0.44
HSD17B10 Q99714 1/20 0.44
NPC1 O15118 1/20 0.44
TAAR1 Q96RJ0 3/20 0.43
ATM Q13315 1/20 0.43
TDP1 Q9NUW8 2/20 0.42
CYP2A6 P11509 1/20 0.42
HTR2A P28223 1/20 0.42

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Hydrochloric Acid SCHEMBL29004382 0.96 RAB9A (0.50) RAB9ASMN1; SMN2TP53CA1CA2
SCHEMBL755823 0.96 RAB9A (0.50) RAB9ASMN1; SMN2TP53CA1CA2
SCHEMBL29038937 0.89 RAB9A (0.45) RAB9ASMN1; SMN2TP53CA1CA2
SCHEMBL1338721 0.87 KCNH2 (0.41) RAB9ASMN1; SMN2TSHRALDH1A1HPGD
SCHEMBL11126543 0.87 KCNH2 (0.46) RAB9ASMN1; SMN2IDO1TAAR1
SCHEMBL90733 0.86 RAB9A (0.58) RAB9ASMN1; SMN2IDO1TDP1MEN1
Ether SCHEMBL2780317 0.85 TP53 (0.50) RAB9ASMN1; SMN2TP53TSHRALDH1A1
SCHEMBL198134 0.85 TSHR (0.52) RAB9ASMN1; SMN2CA1CA2CA9
SCHEMBL14030598 0.85 RAB9A (0.57) RAB9ASMN1; SMN2IDO1TDP1MEN1
SCHEMBL148130 0.84 TP53 (0.44) RAB9ATP53CA1CA2CA9

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 483 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
WO-2020018087-A1 POLYURETHANE FOAM ADDITIVES TO IMPROVE FOAM ADHESION TO ORGANIC POLYMERS EVONIK DEGUSSA GMBH (DE) 2020-01-23 WO claimed
WO-2018145219-A1 PHARMACEUTICAL COMPOSITION FOR PREVENTING AND TREATING ADDICTIONS BY MEANS OF AVERSIVE COUNTERCONDITIONING SERANI MOSTAZAL JORGE (CL) 2018-08-16 WO claimed
US-8426115-B2 Patterning process and resist composition SHIN-ETSU CHEMICAL CO., LTD. (JP) 2013-04-23 US claimed
EP-2072083-B1 Utilisation of 2.4'-dimethyl-propiophenon as an aroma SYMRISE AG (DE) 2012-02-15 EP claimed
US-20110033803-A1 PATTERNING PROCESS AND RESIST COMPOSITION SHIN-ETSU CHEMICAL CO., LTD. (JP) 2011-02-10 US claimed
US-20100159392-A1 PATTERNING PROCESS AND RESIST COMPOSITION SHIN-ETSU CHEMICAL CO., LTD. (JP) 2010-06-24 US claimed
EP-2072083-A1 Utilisation of 2.4'-dimethyl-propiophenon as an aroma Symrise GmbH & Co. KG (DE) 2009-06-24 EP claimed
US-20060166857-A1 4,8-Dimethyl-7-nonen-2-one and 4,8-dimethylnonan-2-one used as perfumes SYMRISE GMBH & CO. KG (DE) 2006-07-27 US claimed
EP-1682230-A1 4,8-DIMETHYL-7-NONEN-2-ONE AND 4,8-DIMETHYLNONAN-2-ONE USED AS PERFUMES Symrise GmbH & Co. KG (DE) 2006-07-26 EP claimed
WO-2005004825-A1 4,8-DIMETHYL-7-NONEN-2-ONE AND 4,8-DIMETHYLNONAN-2-ONE USED AS PERFUMES SYMRISE GMBH & CO. KG (DE) 2005-01-20 WO claimed
EP-0101023-A1 Process for preparing 2-carbamoyloxyalkyl-1,4-dihydropyridine derivatives and intermediates useful for the process BANYU PHARMACEUTICAL CO., LTD. (JP) 1984-02-22 EP claimed
US-4159943-A Froth flotation of ores using hydrocarbyl bicarbonates PETROVICH VOJISLAV 1979-07-03 US claimed
CN-119684245-A Triaryl pyrylium salt or triaryl thiopyranium salt for photocatalytic degradation of polyurethane plastics, and preparation method and application thereof 东华大学 2025-03-25 CN disclosed
CN-119059880-A Method for recovering beta-phenethyl alcohol from epoxypropane/styrene production waste liquid 万华化学集团股份有限公司 2024-12-03 CN disclosed
CN-118955244-A Method for preparing primary alcohol by homogeneously catalyzing and reducing carboxylic acid derivative by using N-heterocyclic carbene copper complex 延安大学 2024-11-15 CN disclosed
US-11892773-B2 Photosensitive resin composition, patterning process, method for forming cured film, interlayer insulation film, surface protective film, and electronic component SHIN-ETSU CHEMICAL CO., LTD. (JP) 2024-02-06 US disclosed
EP-0005298-A1 Esters of substituted 8-hydroxy-1-phenyl-2,3,4,5-tetrahydro-1H-3-benzazepines, process for the preparation thereof, and pharmaceutical compositions containing them Technobiotic Ltd. (CH) 1979-11-14 EP disclosed
EP-0005299-A1 Substituted 1-phenyl-2,3,4,5-tetrahydro-1H-3-benzazepines, process for the preparation thereof, and pharmaceutical compositions containing them Technobiotic Ltd. (CH) 1979-11-14 EP disclosed
US-4159943-A Froth flotation of ores using hydrocarbyl bicarbonates PETROVICH VOJISLAV 1979-07-03 US disclosed
US-4148696-A Electrochemical oxidation of activated alkyl aromatic compounds UOP INC. (US) 1979-04-10 US disclosed