SCHEMBL75093

SCHEMBL75093

C=COC1CC2CC1C1COC(=O)C21

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL18634184 1.00
SCHEMBL5404648 0.88
SCHEMBL4686387 0.86
SCHEMBL1960714 0.80
SCHEMBL23963459 0.80
SCHEMBL13481214 0.79 CYP3A4 (0.33)
SCHEMBL5192078 0.78
SCHEMBL12749210 0.75 ALDH1A1 (0.31)
SCHEMBL24997093 0.75
SCHEMBL5191446 0.74

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 464 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-3486067-B1 METHOD FOR PRODUCING ANTIFOULING FILM SHARP KK (JP) 2022-09-28 EP disclosed
US-20210341839-A1 FLUOROCARBOXYLIC ACID-CONTAINING MONOMER, FLUOROCARBOXYLIC ACID-CONTAINING POLYMER, RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2021-11-04 US disclosed
US-20210333712-A1 IODIZED AROMATIC CARBOXYLIC ACID TYPE PENDANT-CONTAINING POLYMER, RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2021-10-28 US disclosed
US-11142653-B2 Method for producing antifouling film SHARP KABUSHIKI KAISHA (JP) 2021-10-12 US disclosed
US-11142617-B2 Method for producing antifouling film SHARP KABUSHIKI KAISHA (JP) 2021-10-12 US disclosed
EP-3485986-B1 METHOD FOR PRODUCING ANTIFOULING FILM SHARP KK (JP) 2020-05-20 EP disclosed
US-10509314-B2 Resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2019-12-17 US disclosed
US-10457761-B2 Polymer, resist composition, and pattern forming process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2019-10-29 US disclosed
US-20190300666-A1 METHOD FOR PRODUCING ANTIFOULING FILM SHARP KABUSHIKI KAISHA (JP) 2019-10-03 US disclosed
US-20190233656-A1 METHOD FOR PRODUCING ANTIFOULING FILM DAIKIN INDUSTRIES, LTD. (JP) 2019-08-01 US disclosed
US-20070072115-A1 Positive resist compositions and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2007-03-29 US disclosed
US-20070072115-A1 Positive resist compositions and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2007-03-29 US disclosed
US-7189493-B2 Polymer, positive resist composition, and patterning process using the same SHIN-ETSU CHEMICAL CO., LTD. (JP) 2007-03-13 US disclosed
US-7189493-B2 Polymer, positive resist composition, and patterning process using the same SHIN-ETSU CHEMICAL CO., LTD. (JP) 2007-03-13 US disclosed
US-20060205957-A1 Process for producing vinyl ether compounds ISHII YASUTAKA 2006-09-14 US disclosed
US-7074970-B2 Process for producing vinyl ether compounds DAICEL CHEMICAL INDUSTRIES, LTD. (JP) 2006-07-11 US disclosed
US-20060058480-A1 Polymerizable monomer polymeric compound resin compositions for photoresist and method for producing semiconductor DAICEL CHEMICAL INDUSTRIES, LTD. (JP) 2006-03-16 US disclosed
US-20050282985-A1 FLUORINE-ATOM-CONTAINING POLYMERIZABLE UNSATURATED-MONOMER, FLUORINE-ATOM-CONTAINING POLYMERIC COMPOUND AND PHOTORESIST RESIN COMPOSITION DAICEL CHEMICAL INDUSTRIES, LTD. (JP) 2005-12-22 US disclosed
US-20030083529-A1 Process for producing vinyl ether compounds DAICEL CHEMICAL INDUSTRIES, LTD. (JP) 2003-05-01 US disclosed
EP-1288186-A2 Vinyl ether compounds and preparation process thereof Daicel Chemical Industries, Ltd. (JP) 2003-03-05 EP disclosed