SCHEMBL7515697

SCHEMBL7515697

CCc1ccc2c(c1C(=O)[O-])Cc1ccccc1O2.[Rb+]

nearest known ligand 0.42

Predicted protein targets (top 18)

geneUniProtsupporting neighboursconfidence
MAOA P21397 1/20 0.42
MAOB P27338 1/20 0.42
ACSL1 P33121 1/20 0.34
MAPKAPK2 P49137 1/20 0.33
HTT P42858 1/20 0.33
MAPT P10636 2/20 0.33
KMT2A Q03164 3/20 0.32
MEN1 O00255 2/20 0.32
USP2 O75604 1/20 0.32
KDM4E B2RXH2 1/20 0.32
POLB P06746 1/20 0.32
THRB P10828 1/20 0.32
PKM P14618 1/20 0.32
RECQL P46063 1/20 0.32
BLM P54132 1/20 0.32
TDP1 Q9NUW8 1/20 0.32
L3MBTL1 Q9Y468 1/20 0.32
PTGER1 P34995 1/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL152831 0.99 MAOA (0.43) MAOAMAOBACSL1MAPKAPK2HTT
Lithium Ion SCHEMBL3888152 0.97 MAOA (0.42) MAOAMAOBACSL1MAPKAPK2HTT
SCHEMBL640834 0.97 MAOA (0.42) MAOAMAOBACSL1MAPKAPK2HTT
Zinc Ion SCHEMBL180631 0.97 MAOA (0.42) MAOAMAOBACSL1MAPKAPK2HTT
SCHEMBL672014 0.97 MAOA (0.42) MAOAMAOBACSL1MAPKAPK2HTT
SCHEMBL673532 0.97 MAOA (0.42) MAOAMAOBACSL1MAPKAPK2HTT
SCHEMBL9340083 0.97 MAOA (0.42) MAOAMAOBACSL1MAPKAPK2HTT
SCHEMBL16414620 0.97 MAOA (0.42) MAOAMAOBACSL1MAPKAPK2HTT
SCHEMBL11323633 0.97 MAOA (0.42) MAOAMAOBACSL1MAPKAPK2HTT
SCHEMBL672730 0.97 MAOA (0.42) MAOAMAOBACSL1MAPKAPK2HTT

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-6472079-B2 PRODUCT OF HYDROLYSIS AND CONDENSATION OF AN ORGANOSILICON COMPOUND; 1A OR 2A COMPOUND, ESPECIALLY CARBOXYLIC SALT; SOLVENT; EXCELLENT CRACKING RESISTANCE AFTER A PCT (PRESSURE COOKER TEST). JSR CORPORATION (JP) 2002-10-29 US disclosed
US-20020045693-A1 Composition for film formation, method of film formation and silica-based film JSR CORPORATION (JP) 2002-04-18 US disclosed
EP-1148105-A2 Composition for film formation, method of film formation, and silica-based film JSR Corporation (JP) 2001-10-24 EP disclosed